SG176661A1 - Polishing composition for nickel-phosphorous memory disks - Google Patents

Polishing composition for nickel-phosphorous memory disks Download PDF

Info

Publication number
SG176661A1
SG176661A1 SG2011089638A SG2011089638A SG176661A1 SG 176661 A1 SG176661 A1 SG 176661A1 SG 2011089638 A SG2011089638 A SG 2011089638A SG 2011089638 A SG2011089638 A SG 2011089638A SG 176661 A1 SG176661 A1 SG 176661A1
Authority
SG
Singapore
Prior art keywords
nickel
polishing composition
memory disks
phosphorous
phosphorous memory
Prior art date
Application number
SG2011089638A
Other languages
English (en)
Inventor
Chinnathambi Selvaraj Palanisamy
Haresh Siriwardane
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of SG176661A1 publication Critical patent/SG176661A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
    • G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SG2011089638A 2009-06-04 2010-06-03 Polishing composition for nickel-phosphorous memory disks SG176661A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/455,631 US9330703B2 (en) 2009-06-04 2009-06-04 Polishing composition for nickel-phosphorous memory disks
PCT/US2010/037158 WO2010141652A2 (en) 2009-06-04 2010-06-03 Polishing composition for nickel-phosphorous memory disks

Publications (1)

Publication Number Publication Date
SG176661A1 true SG176661A1 (en) 2012-01-30

Family

ID=43298492

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011089638A SG176661A1 (en) 2009-06-04 2010-06-03 Polishing composition for nickel-phosphorous memory disks

Country Status (7)

Country Link
US (1) US9330703B2 (enExample)
JP (2) JP5684801B2 (enExample)
CN (1) CN102804345B (enExample)
MY (1) MY158719A (enExample)
SG (1) SG176661A1 (enExample)
TW (2) TWI481680B (enExample)
WO (1) WO2010141652A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8623766B2 (en) * 2011-09-20 2014-01-07 Cabot Microelectronics Corporation Composition and method for polishing aluminum semiconductor substrates
US9039914B2 (en) * 2012-05-23 2015-05-26 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous-coated memory disks
US8518135B1 (en) * 2012-08-27 2013-08-27 Cabot Microelectronics Corporation Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks
WO2015057433A1 (en) 2013-10-18 2015-04-23 Cabot Microelectronics Corporation Polishing composition and method for nickel-phosphorous coated memory disks
US10358579B2 (en) * 2013-12-03 2019-07-23 Cabot Microelectronics Corporation CMP compositions and methods for polishing nickel phosphorous surfaces
US9401104B2 (en) 2014-05-05 2016-07-26 Cabot Microelectronics Corporation Polishing composition for edge roll-off improvement
JP6495095B2 (ja) * 2014-05-20 2019-04-03 花王株式会社 磁気ディスク基板用研磨液組成物
SG11201702051VA (en) * 2014-10-14 2017-04-27 Cabot Microelectronics Corp Nickel phosphorous cmp compositions and methods
US9481811B2 (en) 2015-02-20 2016-11-01 Cabot Microelectronics Corporation Composition and method for polishing memory hard disks exhibiting reduced edge roll-off
MY201421A (en) 2019-01-11 2024-02-21 Cmc Mat Llc Dual additive composition for polishing memory hard disks exhibiting edge roll off
JP7666904B2 (ja) * 2020-09-30 2025-04-22 株式会社フジミインコーポレーテッド 研磨用組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5885362A (en) * 1995-07-27 1999-03-23 Mitsubishi Chemical Corporation Method for treating surface of substrate
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
JP2000340532A (ja) * 1999-05-31 2000-12-08 Mitsubishi Materials Corp 研磨用スラリー及びこれを用いた研磨方法
AU6537000A (en) * 1999-08-13 2001-03-13 Cabot Microelectronics Corporation Polishing system with stopping compound and method of its use
US6471884B1 (en) * 2000-04-04 2002-10-29 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with an amino acid-containing composition
US6623355B2 (en) * 2000-11-07 2003-09-23 Micell Technologies, Inc. Methods, apparatus and slurries for chemical mechanical planarization
US20040232379A1 (en) * 2003-05-20 2004-11-25 Ameen Joseph G. Multi-oxidizer-based slurry for nickel hard disk planarization
US20050045852A1 (en) * 2003-08-29 2005-03-03 Ameen Joseph G. Particle-free polishing fluid for nickel-based coating planarization
US7524347B2 (en) * 2004-10-28 2009-04-28 Cabot Microelectronics Corporation CMP composition comprising surfactant
JP2006282755A (ja) * 2005-03-31 2006-10-19 Dainippon Ink & Chem Inc 有機無機ハイブリッド粒子水性分散体及びそれから得られる研磨スラリー
JP2007031594A (ja) * 2005-07-27 2007-02-08 Nippon Shokubai Co Ltd ３−ヒドロキシ−２，２′−イミノジコハク酸塩類含有固体組成物及びその製造方法
JP5142594B2 (ja) * 2007-06-11 2013-02-13 花王株式会社 ハードディスク基板の製造方法
JP2008307676A (ja) * 2007-06-18 2008-12-25 Kao Corp ハードディスク基板用研磨液組成物
JP5192953B2 (ja) * 2007-09-14 2013-05-08 三洋化成工業株式会社 磁気ディスク用ガラス基板洗浄剤

Also Published As

Publication number Publication date
JP2015017259A (ja) 2015-01-29
JP2012529133A (ja) 2012-11-15
WO2010141652A2 (en) 2010-12-09
MY158719A (en) 2016-11-15
TWI596202B (zh) 2017-08-21
CN102804345B (zh) 2016-01-20
CN102804345A (zh) 2012-11-28
US9330703B2 (en) 2016-05-03
TWI481680B (zh) 2015-04-21
TW201105759A (en) 2011-02-16
JP5856256B2 (ja) 2016-02-09
US20100308016A1 (en) 2010-12-09
TW201504417A (zh) 2015-02-01
JP5684801B2 (ja) 2015-03-18
WO2010141652A3 (en) 2011-03-10

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