JP2012525684A5 - - Google Patents
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- Publication number
- JP2012525684A5 JP2012525684A5 JP2012508591A JP2012508591A JP2012525684A5 JP 2012525684 A5 JP2012525684 A5 JP 2012525684A5 JP 2012508591 A JP2012508591 A JP 2012508591A JP 2012508591 A JP2012508591 A JP 2012508591A JP 2012525684 A5 JP2012525684 A5 JP 2012525684A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- strip
- substrate
- plasma generator
- generator array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 21
- 238000000034 method Methods 0.000 claims 14
- 239000012530 fluid Substances 0.000 claims 3
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 1
- 230000001939 inductive effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000002715 modification method Methods 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17333409P | 2009-04-28 | 2009-04-28 | |
| US61/173,334 | 2009-04-28 | ||
| PCT/US2010/032571 WO2010129277A2 (en) | 2009-04-28 | 2010-04-27 | Microplasma generator and methods therefor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012525684A JP2012525684A (ja) | 2012-10-22 |
| JP2012525684A5 true JP2012525684A5 (cg-RX-API-DMAC7.html) | 2013-06-20 |
| JP5746147B2 JP5746147B2 (ja) | 2015-07-08 |
Family
ID=43050726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012508591A Active JP5746147B2 (ja) | 2009-04-28 | 2010-04-27 | プラズマ発生器、プラズマ発生器アレイ、当該アレイを用いた変性方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9006972B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2425459A4 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5746147B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20120023030A (cg-RX-API-DMAC7.html) |
| AU (1) | AU2010245048B2 (cg-RX-API-DMAC7.html) |
| CA (1) | CA2797497A1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2010129277A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8785881B2 (en) | 2008-05-06 | 2014-07-22 | Massachusetts Institute Of Technology | Method and apparatus for a porous electrospray emitter |
| US10125052B2 (en) | 2008-05-06 | 2018-11-13 | Massachusetts Institute Of Technology | Method of fabricating electrically conductive aerogels |
| US10308377B2 (en) | 2011-05-03 | 2019-06-04 | Massachusetts Institute Of Technology | Propellant tank and loading for electrospray thruster |
| US9460884B2 (en) | 2011-07-28 | 2016-10-04 | Trustees Of Tufts College | Microplasma generating array |
| WO2014026001A2 (en) * | 2012-08-08 | 2014-02-13 | Massachusetts Institute Of Technology | Microplasma generation devices and associated systems and methods |
| US9669416B2 (en) | 2013-05-28 | 2017-06-06 | Massachusetts Institute Of Technology | Electrospraying systems and associated methods |
| US9330889B2 (en) * | 2013-07-11 | 2016-05-03 | Agilent Technologies Inc. | Plasma generation device with microstrip resonator |
| US9647414B2 (en) | 2014-01-30 | 2017-05-09 | Physical Sciences, Inc. | Optically pumped micro-plasma |
| WO2015183915A1 (en) * | 2014-05-27 | 2015-12-03 | The University Of Florida Research Foundation, Inc. | Glass interposer integrated high quality electronic components and systems |
| TWI569690B (zh) * | 2015-01-23 | 2017-02-01 | 國立臺灣大學 | 一種電漿產生裝置與其製備方法 |
| US9736920B2 (en) | 2015-02-06 | 2017-08-15 | Mks Instruments, Inc. | Apparatus and method for plasma ignition with a self-resonating device |
| CN104955259B (zh) * | 2015-04-27 | 2018-03-23 | 华东师范大学 | 一种平面小功率微波微等离子体圆环形阵列源 |
| US10497541B2 (en) | 2016-05-19 | 2019-12-03 | Nedal Saleh | Apparatus and method for programmable spatially selective nanoscale surface functionalization |
| JP6316920B1 (ja) * | 2016-12-07 | 2018-04-25 | 國家中山科學研究院 | ガラス基板のセレン化及び硫化工程に用いる設備 |
| US10141855B2 (en) | 2017-04-12 | 2018-11-27 | Accion Systems, Inc. | System and method for power conversion |
| US11355317B2 (en) * | 2017-12-14 | 2022-06-07 | Applied Materials, Inc. | Methods and apparatus for dynamical control of radial uniformity in microwave chambers |
| JP7239134B2 (ja) * | 2018-05-18 | 2023-03-14 | 国立大学法人大阪大学 | 樹脂材と金属材との接合体およびその製造方法 |
| WO2019229873A1 (ja) * | 2018-05-30 | 2019-12-05 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
| CN110049614B (zh) * | 2019-04-28 | 2021-12-03 | 中国科学院微电子研究所 | 微波等离子体装置及等离子体激发方法 |
| WO2020236961A1 (en) | 2019-05-21 | 2020-11-26 | Accion Systems, Inc. | Apparatus for electrospray emission |
| CN113170567B (zh) | 2019-11-12 | 2023-11-28 | 东芝三菱电机产业系统株式会社 | 活性气体生成装置 |
| KR102524433B1 (ko) | 2019-11-27 | 2023-04-24 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 활성 가스 생성 장치 |
| FI129609B (en) | 2020-01-10 | 2022-05-31 | Picosun Oy | Substrate processing apparatus |
| WO2022046721A2 (en) | 2020-08-24 | 2022-03-03 | Accion Systems, Inc. | Propellant apparatus |
| WO2022125745A1 (en) * | 2020-12-11 | 2022-06-16 | Inficon, Inc. | Htcc antenna for generation of plasma |
| FR3131378B1 (fr) * | 2021-12-29 | 2024-05-31 | Centre Nat Etd Spatiales | Dispositif de déclenchement de décharge électrostatique et procédé d’utilisation associé. |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3830249A1 (de) | 1988-09-06 | 1990-03-15 | Schott Glaswerke | Plasmaverfahren zum beschichten ebener substrate |
| US5938854A (en) * | 1993-05-28 | 1999-08-17 | The University Of Tennessee Research Corporation | Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| AU2003195A (en) | 1994-06-21 | 1996-01-04 | Boc Group, Inc., The | Improved power distribution for multiple electrode plasma systems using quarter wavelength transmission lines |
| DE19943953A1 (de) * | 1999-09-14 | 2001-04-12 | Bosch Gmbh Robert | Vorrichtung und Verfahren zur Erzeugung eines lokalen Plasmas durch Mikrostrukturelektrodenentladungen mit Mikrowellen |
| KR100345543B1 (ko) | 2000-08-11 | 2002-07-26 | 최대규 | 플라즈마 세정 장치 |
| JP4013570B2 (ja) * | 2002-02-06 | 2007-11-28 | 松下電器産業株式会社 | プラズマ加工方法及び装置 |
| JP2004128159A (ja) * | 2002-10-01 | 2004-04-22 | Mitsubishi Heavy Ind Ltd | 高周波プラズマ発生装置および高周波プラズマ発生方法 |
| US6917165B2 (en) * | 2002-12-30 | 2005-07-12 | Northeastern University | Low power plasma generator |
| JP3858093B2 (ja) | 2003-01-15 | 2006-12-13 | 国立大学法人埼玉大学 | マイクロプラズマ生成装置、プラズマアレイ顕微鏡、及びマイクロプラズマ生成方法 |
| US7806077B2 (en) | 2004-07-30 | 2010-10-05 | Amarante Technologies, Inc. | Plasma nozzle array for providing uniform scalable microwave plasma generation |
| JP4631046B2 (ja) * | 2004-10-01 | 2011-02-16 | 国立大学法人 東京大学 | マイクロ波励起プラズマ装置及びシステム |
| US20070170996A1 (en) * | 2006-01-20 | 2007-07-26 | Dutton David T | Plasma generating devices having alternative ground geometry and methods for using the same |
| JP4916776B2 (ja) * | 2006-05-01 | 2012-04-18 | 国立大学法人 東京大学 | 吹き出し形マイクロ波励起プラズマ処理装置 |
| JP5161086B2 (ja) | 2006-07-28 | 2013-03-13 | 東京エレクトロン株式会社 | マイクロ波プラズマ源およびプラズマ処理装置 |
| JP4787104B2 (ja) | 2006-07-31 | 2011-10-05 | 株式会社新川 | ボンディング装置 |
| AU2006348506B2 (en) | 2006-09-20 | 2013-02-21 | Imagineering, Inc. | Ignition device, internal combustion engine, ignition plug, plasma apparatus, exhaust gas decomposition apparatus, ozone generation/sterilization/disinfection apparatus, and deodorization apparatus |
| KR101353684B1 (ko) | 2006-11-14 | 2014-01-20 | 엘지전자 주식회사 | 플라즈마 발생장치 및 방법 |
| WO2008090617A1 (ja) * | 2007-01-25 | 2008-07-31 | Nissin Inc. | 大気圧プラズマガス流の発生方法 |
| US20090065177A1 (en) | 2007-09-10 | 2009-03-12 | Chien Ouyang | Cooling with microwave excited micro-plasma and ions |
-
2010
- 2010-04-27 CA CA2797497A patent/CA2797497A1/en not_active Abandoned
- 2010-04-27 WO PCT/US2010/032571 patent/WO2010129277A2/en not_active Ceased
- 2010-04-27 EP EP10772520.2A patent/EP2425459A4/en not_active Withdrawn
- 2010-04-27 AU AU2010245048A patent/AU2010245048B2/en not_active Expired - Fee Related
- 2010-04-27 US US13/266,396 patent/US9006972B2/en active Active
- 2010-04-27 JP JP2012508591A patent/JP5746147B2/ja active Active
- 2010-04-27 KR KR20117028361A patent/KR20120023030A/ko not_active Withdrawn
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