JP2018508994A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2018508994A5 JP2018508994A5 JP2017542411A JP2017542411A JP2018508994A5 JP 2018508994 A5 JP2018508994 A5 JP 2018508994A5 JP 2017542411 A JP2017542411 A JP 2017542411A JP 2017542411 A JP2017542411 A JP 2017542411A JP 2018508994 A5 JP2018508994 A5 JP 2018508994A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate support
- disposed
- substrate
- heater
- conductive element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 29
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 229910052790 beryllium Inorganic materials 0.000 claims 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 239000007789 gas Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562116218P | 2015-02-13 | 2015-02-13 | |
| US62/116,218 | 2015-02-13 | ||
| US15/019,573 | 2016-02-09 | ||
| US15/019,573 US10134615B2 (en) | 2015-02-13 | 2016-02-09 | Substrate support with improved RF return |
| PCT/US2016/017452 WO2016130744A1 (en) | 2015-02-13 | 2016-02-11 | Substrate support with improved rf return |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018508994A JP2018508994A (ja) | 2018-03-29 |
| JP2018508994A5 true JP2018508994A5 (cg-RX-API-DMAC7.html) | 2019-03-28 |
| JP6843752B2 JP6843752B2 (ja) | 2021-03-17 |
Family
ID=56615690
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017542411A Active JP6843752B2 (ja) | 2015-02-13 | 2016-02-11 | Ｒｆリターンを改善した基板支持体 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10134615B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6843752B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102537310B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN107210180B (cg-RX-API-DMAC7.html) |
| SG (1) | SG11201706020QA (cg-RX-API-DMAC7.html) |
| TW (1) | TWI691014B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2016130744A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10325790B2 (en) * | 2016-04-29 | 2019-06-18 | Applied Materials, Inc. | Methods and apparatus for correcting substrate deformity |
| JP6683575B2 (ja) * | 2016-09-01 | 2020-04-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP6762184B2 (ja) * | 2016-09-26 | 2020-09-30 | 株式会社Ｓｃｒｅｅｎホールディングス | 回収配管洗浄方法および基板処理装置 |
| CN111326387B (zh) * | 2018-12-17 | 2023-04-21 | 中微半导体设备(上海)股份有限公司 | 一种电容耦合等离子体刻蚀设备 |
| CN111326389B (zh) * | 2018-12-17 | 2023-06-16 | 中微半导体设备(上海)股份有限公司 | 一种电容耦合等离子体刻蚀设备 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020022403A1 (en) * | 1999-08-06 | 2002-02-21 | Wing L. Cheng | Connectors for an eletrostatic chuck |
| JP3718093B2 (ja) * | 2000-01-20 | 2005-11-16 | ローム株式会社 | 半導体製造装置 |
| US7534301B2 (en) * | 2004-09-21 | 2009-05-19 | Applied Materials, Inc. | RF grounding of cathode in process chamber |
| US7354288B2 (en) * | 2005-06-03 | 2008-04-08 | Applied Materials, Inc. | Substrate support with clamping electrical connector |
| US20080179011A1 (en) * | 2007-01-30 | 2008-07-31 | Collins Kenneth S | Plasma reactor with wide process window employing plural vhf sources |
| KR101006848B1 (ko) * | 2008-05-28 | 2011-01-14 | 주식회사 코미코 | 기판 지지 장치 및 이를 포함하는 기판 처리 장치 |
| US20100000684A1 (en) | 2008-07-03 | 2010-01-07 | Jong Yong Choi | Dry etching apparatus |
| KR20100004857A (ko) * | 2008-07-03 | 2010-01-13 | 주성엔지니어링(주) | 건식 에칭 장치 |
| KR20180049208A (ko) * | 2009-08-31 | 2018-05-10 | 램 리써치 코포레이션 | 무선 주파수 (ｒｆ) 접지 복귀 장치들 |
| KR101843609B1 (ko) | 2011-03-04 | 2018-05-14 | 노벨러스 시스템즈, 인코포레이티드 | 하이브리드 세라믹 샤워헤드 |
| JP2012234951A (ja) * | 2011-04-28 | 2012-11-29 | Mitsubishi Heavy Ind Ltd | 真空処理装置およびその電極面間隔調整方法 |
| US8618446B2 (en) * | 2011-06-30 | 2013-12-31 | Applied Materials, Inc. | Substrate support with substrate heater and symmetric RF return |
| US10224182B2 (en) | 2011-10-17 | 2019-03-05 | Novellus Systems, Inc. | Mechanical suppression of parasitic plasma in substrate processing chamber |
| US9340866B2 (en) * | 2012-03-30 | 2016-05-17 | Applied Materials, Inc. | Substrate support with radio frequency (RF) return path |
| US9404176B2 (en) | 2012-06-05 | 2016-08-02 | Applied Materials, Inc. | Substrate support with radio frequency (RF) return path |
-
2016
- 2016-02-09 US US15/019,573 patent/US10134615B2/en active Active
- 2016-02-11 JP JP2017542411A patent/JP6843752B2/ja active Active
- 2016-02-11 WO PCT/US2016/017452 patent/WO2016130744A1/en not_active Ceased
- 2016-02-11 KR KR1020177025702A patent/KR102537310B1/ko active Active
- 2016-02-11 SG SG11201706020QA patent/SG11201706020QA/en unknown
- 2016-02-11 CN CN201680009239.2A patent/CN107210180B/zh active Active
- 2016-02-15 TW TW105104312A patent/TWI691014B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6330087B2 (ja) | 対称給電構造を有する基板サポート | |
| US10692703B2 (en) | Ceramic heater with enhanced RF power delivery | |
| KR102553118B1 (ko) | 플라즈마 처리 시스템을 위한 저온 척 | |
| JP2018508994A5 (cg-RX-API-DMAC7.html) | ||
| KR102515038B1 (ko) | 플라즈마 처리 시스템을 위한 고온 척 | |
| TWI688668B (zh) | 具有可拆卸式氣體分配板之噴淋頭 | |
| CN101978475B (zh) | 屏蔽性盖加热器组件 | |
| KR102019492B1 (ko) | Ｒｆ 접지의 신뢰성을 개선하기 위한 장치 및 방법들 | |
| US10515786B2 (en) | Mounting table and plasma processing apparatus | |
| JP6796066B2 (ja) | 高温ｒｆ用途のための静電チャック | |
| US20160198528A1 (en) | Mounting table and substrate processing apparatus | |
| JP2015517225A5 (cg-RX-API-DMAC7.html) | ||
| JP2013514669A5 (cg-RX-API-DMAC7.html) | ||
| KR20200067241A (ko) | 웨이퍼 지지대 | |
| JP2019102638A (ja) | 支持アセンブリ及び支持アセンブリの組立方法 | |
| KR20090068117A (ko) | 기판 온도 조정 및 고정 장치 | |
| TW201931955A (zh) | 具有可拆卸高電阻率氣體分配板的噴淋頭 | |
| CN107004629A (zh) | 静电吸盘及晶片处理装置 | |
| JP2016529652A (ja) | プラズマリアクタ用の強化されたプラズマ源 | |
| CN107210180B (zh) | 具有改善的rf返回的基板支撑件 | |
| US10392703B2 (en) | Plasma CVD apparatus | |
| KR20140124598A (ko) | 스테인리스 후막형 히터의 패턴구조 | |
| KR101297984B1 (ko) | 열처리장치용 커넥터 | |
| US10727092B2 (en) | Heated substrate support ring | |
| CN107004628A (zh) | 用于高温rf应用的静电吸盘 |