JP2012525503A5 - - Google Patents

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Publication number
JP2012525503A5
JP2012525503A5 JP2012508539A JP2012508539A JP2012525503A5 JP 2012525503 A5 JP2012525503 A5 JP 2012525503A5 JP 2012508539 A JP2012508539 A JP 2012508539A JP 2012508539 A JP2012508539 A JP 2012508539A JP 2012525503 A5 JP2012525503 A5 JP 2012525503A5
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JP
Japan
Prior art keywords
dome
shaped
axis
central
orbiting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012508539A
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English (en)
Japanese (ja)
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JP5774579B2 (ja
JP2012525503A (ja
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Priority claimed from PCT/US2010/031986 external-priority patent/WO2010129180A2/en
Publication of JP2012525503A publication Critical patent/JP2012525503A/ja
Publication of JP2012525503A5 publication Critical patent/JP2012525503A5/ja
Application granted granted Critical
Publication of JP5774579B2 publication Critical patent/JP5774579B2/ja
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JP2012508539A 2009-04-28 2010-04-22 円錐型蒸着チャンバにおける密度最適化のためのｈｕｌａ基板ホルダを特徴とする、リフトオフ蒸着システム Active JP5774579B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US21480009P 2009-04-28 2009-04-28
US61/214,800 2009-04-28
US21609309P 2009-05-13 2009-05-13
US61/216,093 2009-05-13
PCT/US2010/031986 WO2010129180A2 (en) 2009-04-28 2010-04-22 Lift-off deposition system featuring a density optimized hula substrate holder in a conical dep0sition chamber

Publications (3)

Publication Number Publication Date
JP2012525503A JP2012525503A (ja) 2012-10-22
JP2012525503A5 true JP2012525503A5 (enExample) 2013-06-06
JP5774579B2 JP5774579B2 (ja) 2015-09-09

Family

ID=42992382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012508539A Active JP5774579B2 (ja) 2009-04-28 2010-04-22 円錐型蒸着チャンバにおける密度最適化のためのｈｕｌａ基板ホルダを特徴とする、リフトオフ蒸着システム

Country Status (11)

Country Link
US (1) US8926755B2 (enExample)
EP (1) EP2425033B1 (enExample)
JP (1) JP5774579B2 (enExample)
KR (1) KR101235539B1 (enExample)
CN (1) CN102405302B (enExample)
CA (1) CA2757872C (enExample)
MY (1) MY160386A (enExample)
RU (1) RU2538064C2 (enExample)
SG (1) SG175247A1 (enExample)
TW (1) TWI503432B (enExample)
WO (1) WO2010129180A2 (enExample)

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USD664172S1 (en) * 2009-11-16 2012-07-24 Applied Materials, Inc. Dome assembly for a deposition chamber
US8647437B2 (en) * 2010-05-31 2014-02-11 Ci Systems (Israel) Ltd. Apparatus, tool and methods for depositing annular or circular wedge coatings
US9920418B1 (en) * 2010-09-27 2018-03-20 James Stabile Physical vapor deposition apparatus having a tapered chamber
TW201215694A (en) * 2010-10-11 2012-04-16 Hon Hai Prec Ind Co Ltd Correction plate for coating and coating device using same
KR20120096788A (ko) * 2011-02-23 2012-08-31 삼성전자주식회사 외관 기구물의 표면 코팅 방법 및 표면 코팅 장치
CN103014617B (zh) * 2011-09-22 2014-05-14 株式会社新柯隆 薄膜形成装置
US9281231B2 (en) 2011-10-12 2016-03-08 Ferrotec (Usa) Corporation Non-contact magnetic drive assembly with mechanical stop elements
US9373534B2 (en) 2012-09-05 2016-06-21 Industrial Technology Research Institute Rotary positioning apparatus with dome carrier, automatic pick-and-place system, and operating method thereof
US9082801B2 (en) * 2012-09-05 2015-07-14 Industrial Technology Research Institute Rotatable locating apparatus with dome carrier and operating method thereof
CN104532194B (zh) * 2014-12-29 2017-05-10 深圳大学 激光沉积薄膜制备装置
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
FR3058424B1 (fr) * 2016-11-10 2022-06-10 Bnl Eurolens Installation de depot par evaporation d'un revetement sur des articles
EP3366805B1 (en) * 2017-02-24 2022-01-12 Satisloh AG Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses, and heating device for it
WO2019105671A1 (en) * 2017-11-30 2019-06-06 Evatec Ag Evaporation chamber and system
US10109517B1 (en) * 2018-01-10 2018-10-23 Lam Research Corporation Rotational indexer with additional rotational axes
CN110760809B (zh) * 2019-11-13 2020-07-28 北京航空航天大学 一种用于电子束物理气相沉积制备热障涂层的夹持装置
CN116364614A (zh) * 2021-12-27 2023-06-30 南昌中微半导体设备有限公司 一种晶圆传输装置、气相沉积系统及使用方法
TWI876706B (zh) * 2023-11-27 2025-03-11 江蘇智芯達科技有限公司 半導體封裝的電磁波遮罩膜蒸鍍裝置

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JPH04318932A (ja) 1991-04-17 1992-11-10 Clarion Co Ltd 金属パターン形成方法
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JP2836518B2 (ja) 1995-02-28 1998-12-14 日本電気株式会社 蒸着装置
FR2733253B1 (fr) 1995-04-24 1997-06-13 Commissariat Energie Atomique Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface
JPH108242A (ja) 1996-06-17 1998-01-13 Toshiba Corp 真空蒸着装置
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US6547939B2 (en) * 2001-03-29 2003-04-15 Super Light Wave Corp. Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate
TW591202B (en) * 2001-10-26 2004-06-11 Hermosa Thin Film Co Ltd Dynamic film thickness control device/method and ITS coating method
US20030180462A1 (en) * 2002-03-19 2003-09-25 Temescal, A Unit Of The Boc Group, Inc. Planetary lift-off vapor deposition system
CN2716283Y (zh) * 2004-07-21 2005-08-10 范维海 高效式真空镀膜旋转支架
RU2308538C1 (ru) * 2006-06-19 2007-10-20 Общество с ограниченной ответственностью научно-производственная фирма "ЭЛАН-ПРАКТИК" Установка для нанесения многослойных покрытий с периодической структурой методом магнетронного распыления

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