JP2012518897A5 - - Google Patents

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Publication number
JP2012518897A5
JP2012518897A5 JP2011550551A JP2011550551A JP2012518897A5 JP 2012518897 A5 JP2012518897 A5 JP 2012518897A5 JP 2011550551 A JP2011550551 A JP 2011550551A JP 2011550551 A JP2011550551 A JP 2011550551A JP 2012518897 A5 JP2012518897 A5 JP 2012518897A5
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JP
Japan
Prior art keywords
charged particle
source
vacuum chamber
chamber
wafer
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JP2011550551A
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English (en)
Japanese (ja)
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JP2012518897A (ja
JP5680557B2 (ja
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Priority claimed from PCT/EP2010/052004 external-priority patent/WO2010094719A1/en
Publication of JP2012518897A publication Critical patent/JP2012518897A/ja
Publication of JP2012518897A5 publication Critical patent/JP2012518897A5/ja
Application granted granted Critical
Publication of JP5680557B2 publication Critical patent/JP5680557B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011550551A 2009-02-22 2010-02-17 荷電粒子リソグラフィ装置 Expired - Fee Related JP5680557B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15441509P 2009-02-22 2009-02-22
US61/154,415 2009-02-22
PCT/EP2010/052004 WO2010094719A1 (en) 2009-02-22 2010-02-17 Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber

Publications (3)

Publication Number Publication Date
JP2012518897A JP2012518897A (ja) 2012-08-16
JP2012518897A5 true JP2012518897A5 (https=) 2013-04-04
JP5680557B2 JP5680557B2 (ja) 2015-03-04

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ID=42025730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550551A Expired - Fee Related JP5680557B2 (ja) 2009-02-22 2010-02-17 荷電粒子リソグラフィ装置

Country Status (7)

Country Link
US (1) US20110042579A1 (https=)
EP (1) EP2399270B1 (https=)
JP (1) JP5680557B2 (https=)
KR (1) KR101545193B1 (https=)
CN (1) CN102422380A (https=)
TW (1) TWI510863B (https=)
WO (1) WO2010094719A1 (https=)

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