JP2012514242A5 - - Google Patents
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- Publication number
- JP2012514242A5 JP2012514242A5 JP2011544577A JP2011544577A JP2012514242A5 JP 2012514242 A5 JP2012514242 A5 JP 2012514242A5 JP 2011544577 A JP2011544577 A JP 2011544577A JP 2011544577 A JP2011544577 A JP 2011544577A JP 2012514242 A5 JP2012514242 A5 JP 2012514242A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cylindrical electrode
- nanoscale
- anisotropic
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- 238000005530 etching Methods 0.000 claims 4
- 239000002086 nanomaterial Substances 0.000 claims 4
- 238000011437 continuous method Methods 0.000 claims 2
- 230000006837 decompression Effects 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002121 nanofiber Substances 0.000 claims 1
- 239000002105 nanoparticle Substances 0.000 claims 1
- 239000002061 nanopillar Substances 0.000 claims 1
- 239000002071 nanotube Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14153108P | 2008-12-30 | 2008-12-30 | |
| US61/141,531 | 2008-12-30 | ||
| PCT/US2009/069662 WO2010078306A2 (en) | 2008-12-30 | 2009-12-29 | Method for making nanostructured surfaces |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012514242A JP2012514242A (ja) | 2012-06-21 |
| JP2012514242A5 true JP2012514242A5 (https=) | 2013-01-24 |
| JP5788807B2 JP5788807B2 (ja) | 2015-10-07 |
Family
ID=42310578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011544577A Active JP5788807B2 (ja) | 2008-12-30 | 2009-12-29 | ナノ構造化表面を製造する方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8460568B2 (https=) |
| EP (2) | EP2379442A4 (https=) |
| JP (1) | JP5788807B2 (https=) |
| KR (1) | KR101615787B1 (https=) |
| CN (1) | CN102325718B (https=) |
| SG (1) | SG172428A1 (https=) |
| WO (1) | WO2010078306A2 (https=) |
Families Citing this family (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010078306A2 (en) | 2008-12-30 | 2010-07-08 | 3M Innovative Properties Company | Method for making nanostructured surfaces |
| CN102325719A (zh) | 2008-12-30 | 2012-01-18 | 3M创新有限公司 | 纳米结构化制品和制备纳米结构化制品的方法 |
| WO2011109287A1 (en) * | 2010-03-03 | 2011-09-09 | 3M Innovative Properties Company | Coated polarizer with nanostructured surface and method for making the same. |
| EP2542616A1 (en) * | 2010-03-03 | 2013-01-09 | 3M Innovative Properties Company | Composite multilayered structure with nanostructured surface |
| SG185394A1 (en) | 2010-05-03 | 2012-12-28 | 3M Innovative Properties Co | Method of making a nanostructure |
| CN103097098B (zh) * | 2010-09-30 | 2015-11-25 | 三菱丽阳株式会社 | 表面具有微细凹凸构造的模具、表面具有微细凹凸构造的物品制造方法、物品用途、体现色彩差异的层积体以及面发光体 |
| US8691104B2 (en) * | 2011-01-14 | 2014-04-08 | California Institute Of Technology | Nanotextured surfaces and related methods, systems, and uses |
| CN103329246B (zh) * | 2011-01-19 | 2016-08-10 | 日产化学工业株式会社 | 含有氨基甲酸酯化合物的高耐擦伤性压印材料 |
| BR112013023128A2 (pt) | 2011-03-14 | 2019-09-24 | 3M Innovative Properties Co | artigos nanoestruturados |
| JP6199864B2 (ja) * | 2011-08-17 | 2017-09-20 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造物品及びそれを製造するための方法 |
| CN104335078B (zh) * | 2012-03-26 | 2017-08-08 | 3M创新有限公司 | 纳米结构化材料及其制造方法 |
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| KR20210151999A (ko) * | 2013-07-26 | 2021-12-14 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 나노구조체의 제조 방법 및 나노구조화 물품 |
| JP6030542B2 (ja) * | 2013-12-26 | 2016-11-24 | エステック株式会社 | プラズマ処理装置 |
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| WO2017083482A1 (en) | 2015-11-13 | 2017-05-18 | 3M Innovative Properties Company | Anti-microbial articles and methods of using same |
| TWI580084B (zh) * | 2015-12-31 | 2017-04-21 | 綠點高新科技股份有限公司 | 發光組件及其製作方法 |
| WO2017136771A1 (en) | 2016-02-05 | 2017-08-10 | Havi Global Solutions, Llc | Micro-structured surface with improved insulation and condensation resistance |
| US10687642B2 (en) | 2016-02-05 | 2020-06-23 | Havi Global Solutions, Llc | Microstructured packaging surfaces for enhanced grip |
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| WO2017155687A1 (en) | 2016-03-07 | 2017-09-14 | 3M Innovative Properties Company | Vacuum glazing pillars for insulated glass units and insulated glass units therefrom |
| US10752415B2 (en) | 2016-04-07 | 2020-08-25 | Havi Global Solutions, Llc | Fluid pouch with inner microstructure |
| KR102330028B1 (ko) | 2016-05-27 | 2021-11-24 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 개선된 색 균일도를 갖는 oled 디스플레이 |
| SG11201900362PA (en) | 2016-07-22 | 2019-02-27 | 3M Innovative Properties Co | Structured film and articles thereof |
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| EP3646396A1 (en) | 2017-06-26 | 2020-05-06 | 3M Innovative Properties Company | Structured film and articles thereof |
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| US12038592B2 (en) | 2018-01-05 | 2024-07-16 | 3M Innovative Properties Company | Stray light absorbing film |
| KR20200133803A (ko) | 2018-04-18 | 2020-11-30 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 색보정 구성요소를 갖는 유기 발광 다이오드 디스플레이 및 이의 제조 방법 |
| WO2020003207A1 (en) | 2018-06-28 | 2020-01-02 | 3M Innovative Properties Company | Methods of making metal patterns on flexible substrate |
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| CN113966357B (zh) | 2019-05-08 | 2023-12-22 | 3M创新有限公司 | 纳米结构化制品 |
| JP6611113B1 (ja) * | 2019-06-11 | 2019-11-27 | ナルックス株式会社 | 表面に微細凹凸構造を備えたプラスチック素子の製造方法 |
| WO2020250180A1 (en) | 2019-06-12 | 2020-12-17 | 3M Innovative Properties Company | High transmission light control films with asymmetric light output |
| CN113994241A (zh) | 2019-06-12 | 2022-01-28 | 3M创新有限公司 | 包括导电粒子和有机聚合物的干燥含水分散体的涂覆基板 |
| TWI706012B (zh) * | 2019-09-12 | 2020-10-01 | 明基材料股份有限公司 | 高硬度可撓硬塗層膜 |
| CN114391188A (zh) | 2019-09-18 | 2022-04-22 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品及其制备方法 |
| CN114600007B (zh) | 2019-11-08 | 2024-12-17 | 3M创新有限公司 | 包括光控膜和菲涅耳透镜的光学系统 |
| US12386103B2 (en) | 2019-11-08 | 2025-08-12 | 3M Innovative Properties Company | Optical film and method of making |
| US12306419B2 (en) | 2019-11-08 | 2025-05-20 | 3M Innovative Properties Company | Optical film |
| CN114846369B (zh) | 2019-12-23 | 2024-10-25 | 3M创新有限公司 | 高透射率光控膜 |
| CN115956405A (zh) | 2020-08-28 | 2023-04-11 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品、其制备方法和光学元件 |
| WO2022090833A1 (en) | 2020-11-02 | 2022-05-05 | 3M Innovative Properties Company | An isolator for protecting dissimilar substrates from galvanic corrosion |
| US20240002684A1 (en) | 2020-12-04 | 2024-01-04 | 3M Innovative Properties Company | Method of transferring particles to a coating surface |
| JP2024502733A (ja) | 2020-12-18 | 2024-01-23 | スリーエム イノベイティブ プロパティズ カンパニー | 構造化フィルム及び構造化フィルムを含む光学物品 |
| US20240043989A1 (en) | 2020-12-31 | 2024-02-08 | 3M Innovative Properties Company | Metallic Nanohole Arrays on Nanowells with Controlled Depth and Methods of Making the Same |
| CN116762007A (zh) | 2020-12-31 | 2023-09-15 | 3M创新有限公司 | 具有图案化表面化学成分的纳米图案化膜 |
| WO2022234533A1 (en) | 2021-05-06 | 2022-11-10 | 3M Innovative Properties Company | Metallic nanohole array on nanowell sensing element |
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| WO2023119008A1 (en) | 2021-12-23 | 2023-06-29 | 3M Innovative Properties Company | Articles including a multilayer optical film and fluoropolymer layers, transfer articles, and methods of making same |
| JP2026503218A (ja) | 2022-12-21 | 2026-01-28 | スリーエム イノベイティブ プロパティズ カンパニー | 構造化転写物品および物品、ならびに構造化物品の製造方法 |
| WO2025012837A1 (en) | 2023-07-12 | 2025-01-16 | 3M Innovative Properties Company | Light control film and method of making same |
| CN121713095A (zh) | 2023-08-25 | 2026-03-20 | 3M创新有限公司 | 具有粘合剂填充的微结构的光控膜 |
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| WO2025133865A1 (en) | 2023-12-20 | 2025-06-26 | 3M Innovative Properties Company | Light control film with asymmetric transmission profile including light transmissive layer |
| WO2025219767A1 (en) | 2024-04-18 | 2025-10-23 | 3M Innovative Properties Company | Method of reactive ion etching silicon and articles thereof |
| WO2025248504A1 (en) | 2024-05-31 | 2025-12-04 | 3M Innovative Properties Company | Articles including a multilayer optical film and a nanostructured layer and methods of making the same |
| WO2026027952A1 (en) | 2024-07-31 | 2026-02-05 | 3M Innovative Properties Company | A high particle loaded thin film for use as a reactive ion etching mask and methods thereof |
| WO2026027951A1 (en) | 2024-07-31 | 2026-02-05 | 3M Innovative Properties Company | Nanoparticle-filled masks for reactive ion etching silicon and methods thereof |
| WO2026047440A1 (en) | 2024-08-28 | 2026-03-05 | 3M Innovative Properties Company | Multilayer composite membranes |
| WO2026053027A1 (en) | 2024-09-05 | 2026-03-12 | 3M Innovative Properties Company | Methods of making nanostructured surfaces and articles made by the method |
Family Cites Families (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2064987B (en) | 1979-11-14 | 1983-11-30 | Toray Industries | Process for producing transparent shaped article having enhanced anti-reflective effect |
| JPH0244855B2 (ja) * | 1985-05-27 | 1990-10-05 | Hiraoka Shokusen | Shiitojobutsunopurazumashorisochi |
| JPS62274080A (ja) * | 1986-05-21 | 1987-11-28 | Hitachi Ltd | プラズマ処理方法 |
| US5104929A (en) | 1988-04-11 | 1992-04-14 | Minnesota Mining And Manufacturing Company | Abrasion resistant coatings comprising silicon dioxide dispersions |
| JPH0352937A (ja) * | 1989-07-19 | 1991-03-07 | Nisshin Steel Co Ltd | 連続式プラズマ処理装置 |
| US5304279A (en) | 1990-08-10 | 1994-04-19 | International Business Machines Corporation | Radio frequency induction/multipole plasma processing tool |
| JP3360898B2 (ja) * | 1993-10-05 | 2003-01-07 | 日東電工株式会社 | 反射防止部材の製造方法及び偏光板 |
| US5909314A (en) | 1994-02-15 | 1999-06-01 | Dai Nippon Printing Co., Ltd. | Optical functional materials and process for producing the same |
| JP3175894B2 (ja) * | 1994-03-25 | 2001-06-11 | 株式会社半導体エネルギー研究所 | プラズマ処理装置及びプラズマ処理方法 |
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| US5888594A (en) | 1996-11-05 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Process for depositing a carbon-rich coating on a moving substrate |
| US5948166A (en) * | 1996-11-05 | 1999-09-07 | 3M Innovative Properties Company | Process and apparatus for depositing a carbon-rich coating on a moving substrate |
| JP4274696B2 (ja) | 1998-01-13 | 2009-06-10 | スリーエム カンパニー | 変性コポリエステルおよび改善された多層反射フィルム |
| US6238808B1 (en) * | 1998-01-23 | 2001-05-29 | Canon Kabushiki Kaisha | Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device |
| US6890448B2 (en) | 1999-06-11 | 2005-05-10 | Shipley Company, L.L.C. | Antireflective hard mask compositions |
| US6811867B1 (en) | 2000-02-10 | 2004-11-02 | 3M Innovative Properties Company | Color stable pigmented polymeric films |
| US6483635B1 (en) | 2000-06-07 | 2002-11-19 | Cirrex Corp. | Apparatus for light amplification |
| JP2002122702A (ja) * | 2000-10-17 | 2002-04-26 | Matsushita Electric Ind Co Ltd | 光学フィルム、及び表示素子 |
| DE10241708B4 (de) | 2002-09-09 | 2005-09-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Reduzierung der Grenzflächenreflexion von Kunststoffsubstraten sowie derart modifiziertes Substrat und dessen Verwendung |
| EP2233564A3 (en) | 2002-10-30 | 2012-11-21 | Hitachi, Ltd. | Cell culture sheet comprising a functional substrate with a group of columnar micro-pillars and its manufacturing method |
| JP4104485B2 (ja) * | 2003-04-28 | 2008-06-18 | 積水化学工業株式会社 | プラズマ処理装置 |
| JP2005011021A (ja) | 2003-06-18 | 2005-01-13 | Alps Electric Co Ltd | タブレット及び液晶表示装置 |
| US7030008B2 (en) | 2003-09-12 | 2006-04-18 | International Business Machines Corporation | Techniques for patterning features in semiconductor devices |
| US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| JP2005247944A (ja) * | 2004-03-03 | 2005-09-15 | Matsushita Electric Ind Co Ltd | プラスチックフィルム製造装置及びその製造方法 |
| JP4425774B2 (ja) * | 2004-03-11 | 2010-03-03 | 三星モバイルディスプレイ株式會社 | 垂直電界効果トランジスタ、それによる垂直電界効果トランジスタの製造方法及びそれを備える平板ディスプレイ装置 |
| JP4068074B2 (ja) * | 2004-03-29 | 2008-03-26 | 株式会社東芝 | 凸凹パターンの形成方法および凸凹パターン形成用部材 |
| JP2005331868A (ja) * | 2004-05-21 | 2005-12-02 | Canon Inc | 反射防止構造を有する光学素子およびその製造方法 |
| US7170666B2 (en) | 2004-07-27 | 2007-01-30 | Hewlett-Packard Development Company, L.P. | Nanostructure antireflection surfaces |
| US7264872B2 (en) | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
| US20070118939A1 (en) | 2005-11-10 | 2007-05-24 | C.R.F. Societa Consortile Per Azioni | Anti-reflection nano-metric structure based on porous alumina and method for production thereof |
| JP2007178873A (ja) * | 2005-12-28 | 2007-07-12 | Nikon Corp | 光学素子 |
| US7848021B2 (en) | 2006-02-17 | 2010-12-07 | Fujifilm Corporation | Optical film, antireflection film, polarizing plate and image display device |
| JP4794351B2 (ja) * | 2006-05-15 | 2011-10-19 | パナソニック株式会社 | 反射防止構造体及びそれを備えた光学装置 |
| JP5252811B2 (ja) | 2006-05-16 | 2013-07-31 | 日東電工株式会社 | 防眩性ハードコートフィルム、偏光板および画像表示装置 |
| EP1998193A1 (en) * | 2006-05-31 | 2008-12-03 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Nano-structured Zero-order diffractive filter |
| DE102006046131B4 (de) * | 2006-09-28 | 2020-06-25 | X-Fab Semiconductor Foundries Ag | Verfahren zur Herstellung einer optischen Schnittstelle für integrierte Optikanwendungen |
| DE102006056578A1 (de) * | 2006-11-30 | 2008-06-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche |
| WO2008072498A1 (ja) * | 2006-12-13 | 2008-06-19 | National Institute Of Advanced Industrial Science And Technology | ナノ構造体を有する光学素子用成形型、ナノ構造体用成形型、その製造方法および光学素子 |
| US7839570B2 (en) | 2007-01-22 | 2010-11-23 | Dai Nippon Printing Co., Ltd. | Optical layered body, polarizer and image display device |
| JP4155337B1 (ja) | 2007-02-21 | 2008-09-24 | ソニー株式会社 | 防眩性フィルムおよびその製造方法、ならびに表示装置 |
| US7604381B2 (en) | 2007-04-16 | 2009-10-20 | 3M Innovative Properties Company | Optical article and method of making |
| DE102008018866A1 (de) | 2008-04-15 | 2009-10-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Reflexionsminderndes Interferenzschichtsystem und Verfahren zu dessen Herstellung |
| US20090316060A1 (en) | 2008-06-18 | 2009-12-24 | 3M Innovative Properties Company | Conducting film or electrode with improved optical and electrical performance |
| WO2010078306A2 (en) | 2008-12-30 | 2010-07-08 | 3M Innovative Properties Company | Method for making nanostructured surfaces |
| CN102325719A (zh) * | 2008-12-30 | 2012-01-18 | 3M创新有限公司 | 纳米结构化制品和制备纳米结构化制品的方法 |
-
2009
- 2009-12-29 WO PCT/US2009/069662 patent/WO2010078306A2/en not_active Ceased
- 2009-12-29 CN CN2009801573421A patent/CN102325718B/zh active Active
- 2009-12-29 KR KR1020117017686A patent/KR101615787B1/ko active Active
- 2009-12-29 SG SG2011047826A patent/SG172428A1/en unknown
- 2009-12-29 EP EP09837102.4A patent/EP2379442A4/en not_active Withdrawn
- 2009-12-29 US US13/142,441 patent/US8460568B2/en active Active
- 2009-12-29 JP JP2011544577A patent/JP5788807B2/ja active Active
- 2009-12-29 EP EP16176780.1A patent/EP3115334B1/en active Active
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