JP2012514242A5 - - Google Patents
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- Publication number
- JP2012514242A5 JP2012514242A5 JP2011544577A JP2011544577A JP2012514242A5 JP 2012514242 A5 JP2012514242 A5 JP 2012514242A5 JP 2011544577 A JP2011544577 A JP 2011544577A JP 2011544577 A JP2011544577 A JP 2011544577A JP 2012514242 A5 JP2012514242 A5 JP 2012514242A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cylindrical electrode
- nanoscale
- anisotropic
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- 238000005530 etching Methods 0.000 claims 4
- 239000002086 nanomaterial Substances 0.000 claims 4
- 238000011437 continuous method Methods 0.000 claims 2
- 230000006837 decompression Effects 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002121 nanofiber Substances 0.000 claims 1
- 239000002105 nanoparticle Substances 0.000 claims 1
- 239000002061 nanopillar Substances 0.000 claims 1
- 239000002071 nanotube Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14153108P | 2008-12-30 | 2008-12-30 | |
| US61/141,531 | 2008-12-30 | ||
| PCT/US2009/069662 WO2010078306A2 (en) | 2008-12-30 | 2009-12-29 | Method for making nanostructured surfaces |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012514242A JP2012514242A (ja) | 2012-06-21 |
| JP2012514242A5 true JP2012514242A5 (enExample) | 2013-01-24 |
| JP5788807B2 JP5788807B2 (ja) | 2015-10-07 |
Family
ID=42310578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011544577A Active JP5788807B2 (ja) | 2008-12-30 | 2009-12-29 | ナノ構造化表面を製造する方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8460568B2 (enExample) |
| EP (2) | EP2379442A4 (enExample) |
| JP (1) | JP5788807B2 (enExample) |
| KR (1) | KR101615787B1 (enExample) |
| CN (1) | CN102325718B (enExample) |
| SG (1) | SG172428A1 (enExample) |
| WO (1) | WO2010078306A2 (enExample) |
Families Citing this family (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8460568B2 (en) | 2008-12-30 | 2013-06-11 | 3M Innovative Properties Company | Method for making nanostructured surfaces |
| EP2379443B1 (en) | 2008-12-30 | 2018-07-11 | 3M Innovative Properties Company | Nanostructured articles and methods of making nanostructured articles |
| WO2011109287A1 (en) * | 2010-03-03 | 2011-09-09 | 3M Innovative Properties Company | Coated polarizer with nanostructured surface and method for making the same. |
| KR20130037668A (ko) * | 2010-03-03 | 2013-04-16 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노구조 표면을 갖는 복합 다층 구조체 |
| JP5438245B2 (ja) | 2010-05-03 | 2014-03-12 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造の作製方法 |
| KR20130114642A (ko) * | 2010-09-30 | 2013-10-17 | 미쯔비시 레이온 가부시끼가이샤 | 미세 요철 구조를 표면에 갖는 몰드, 미세 요철 구조를 표면에 갖는 물품의 제조 방법, 물품의 용도, 홍채색을 발현하는 적층체 및 면발광체 |
| US8691104B2 (en) * | 2011-01-14 | 2014-04-08 | California Institute Of Technology | Nanotextured surfaces and related methods, systems, and uses |
| JP5884988B2 (ja) * | 2011-01-19 | 2016-03-15 | 日産化学工業株式会社 | ウレタン化合物を含む高耐擦傷性インプリント材料 |
| CN103443211B (zh) * | 2011-03-14 | 2016-12-14 | 3M创新有限公司 | 纳米结构化制品 |
| CN103732669B (zh) * | 2011-08-17 | 2015-09-23 | 3M创新有限公司 | 纳米结构化制品及其制备方法 |
| KR102047392B1 (ko) | 2012-03-26 | 2019-11-21 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 나노구조화된 재료 및 그의 제조방법 |
| KR20140147857A (ko) | 2012-03-26 | 2014-12-30 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 물품 및 그의 제조 방법 |
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| JP6030542B2 (ja) * | 2013-12-26 | 2016-11-24 | エステック株式会社 | プラズマ処理装置 |
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| WO2017083166A1 (en) | 2015-11-13 | 2017-05-18 | 3M Innovative Properties Company | Anti-microbial articles and methods of using same |
| US10639395B2 (en) | 2015-11-13 | 2020-05-05 | 3M Innovative Properties Company | Anti-microbial articles and methods of using same |
| TWI580084B (zh) * | 2015-12-31 | 2017-04-21 | 綠點高新科技股份有限公司 | 發光組件及其製作方法 |
| RU2688736C1 (ru) | 2016-02-05 | 2019-05-22 | Хави Глобал Солюшенз, Ллк | Поверхность с микроструктурами, обладающая улучшенными изоляционными свойствами и сопротивлением конденсации |
| US10687642B2 (en) | 2016-02-05 | 2020-06-23 | Havi Global Solutions, Llc | Microstructured packaging surfaces for enhanced grip |
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| WO2017177058A1 (en) | 2016-04-07 | 2017-10-12 | Havi Global Solutions, Llc | Fluid pouch with inner microstructure |
| CN109196682B (zh) | 2016-05-27 | 2021-03-05 | 3M创新有限公司 | 具有改善的颜色均匀性的oled显示器 |
| SG11201900362PA (en) | 2016-07-22 | 2019-02-27 | 3M Innovative Properties Co | Structured film and articles thereof |
| KR102402862B1 (ko) | 2016-10-28 | 2022-05-27 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노구조화된 물품 |
| US20200216950A1 (en) | 2017-06-26 | 2020-07-09 | 3M Innovative Properties Company | Structured film and articles thereof |
| CN111465894A (zh) | 2017-12-13 | 2020-07-28 | 3M创新有限公司 | 高透射率光控膜 |
| JP7358356B2 (ja) | 2017-12-13 | 2023-10-10 | スリーエム イノベイティブ プロパティズ カンパニー | 高透過率の光制御フィルム |
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| WO2020212777A1 (en) | 2019-04-18 | 2020-10-22 | 3M Innovative Properties Company | Organic light emitting diode display with color-correction component |
| EP3966276A1 (en) | 2019-05-08 | 2022-03-16 | 3M Innovative Properties Company | Nanostructured article |
| CN113727827B (zh) | 2019-06-11 | 2024-12-13 | 纳卢克斯株式会社 | 在表面具备微细凹凸结构的塑料元件的制造方法 |
| EP3983836A4 (en) | 2019-06-12 | 2023-06-28 | 3M Innovative Properties Company | High transmission light control films with asymmetric light output |
| CN113994241A (zh) | 2019-06-12 | 2022-01-28 | 3M创新有限公司 | 包括导电粒子和有机聚合物的干燥含水分散体的涂覆基板 |
| TWI706012B (zh) * | 2019-09-12 | 2020-10-01 | 明基材料股份有限公司 | 高硬度可撓硬塗層膜 |
| CN114391188A (zh) | 2019-09-18 | 2022-04-22 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品及其制备方法 |
| JP2023500690A (ja) | 2019-11-08 | 2023-01-10 | スリーエム イノベイティブ プロパティズ カンパニー | 光学フィルム及びその製造方法 |
| EP4055422B1 (en) | 2019-11-08 | 2025-12-24 | 3M Innovative Properties Company | Optical system including light control film and fresnel lens |
| WO2021090130A1 (en) | 2019-11-08 | 2021-05-14 | 3M Innovative Properties Company | Optical film |
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| WO2022043787A1 (en) | 2020-08-28 | 2022-03-03 | 3M Innovative Properties Company | Articles including nanostructured surfaces and enclosed voids, methods of making same, and optical elements |
| EP4237503A1 (en) | 2020-11-02 | 2023-09-06 | 3M Innovative Properties Company | An isolator for protecting dissimilar substrates from galvanic corrosion |
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| CN116762007A (zh) | 2020-12-31 | 2023-09-15 | 3M创新有限公司 | 具有图案化表面化学成分的纳米图案化膜 |
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| US20250237793A1 (en) | 2021-12-09 | 2025-07-24 | 3M Innovative Properties Company | Coated microstructured films and methods of making same |
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Family Cites Families (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2064987B (en) | 1979-11-14 | 1983-11-30 | Toray Industries | Process for producing transparent shaped article having enhanced anti-reflective effect |
| JPH0244855B2 (ja) * | 1985-05-27 | 1990-10-05 | Hiraoka Shokusen | Shiitojobutsunopurazumashorisochi |
| JPS62274080A (ja) * | 1986-05-21 | 1987-11-28 | Hitachi Ltd | プラズマ処理方法 |
| US5104929A (en) | 1988-04-11 | 1992-04-14 | Minnesota Mining And Manufacturing Company | Abrasion resistant coatings comprising silicon dioxide dispersions |
| JPH0352937A (ja) * | 1989-07-19 | 1991-03-07 | Nisshin Steel Co Ltd | 連続式プラズマ処理装置 |
| US5304279A (en) * | 1990-08-10 | 1994-04-19 | International Business Machines Corporation | Radio frequency induction/multipole plasma processing tool |
| JP3360898B2 (ja) * | 1993-10-05 | 2003-01-07 | 日東電工株式会社 | 反射防止部材の製造方法及び偏光板 |
| US5909314A (en) | 1994-02-15 | 1999-06-01 | Dai Nippon Printing Co., Ltd. | Optical functional materials and process for producing the same |
| JP3175894B2 (ja) * | 1994-03-25 | 2001-06-11 | 株式会社半導体エネルギー研究所 | プラズマ処理装置及びプラズマ処理方法 |
| US5888413A (en) * | 1995-06-06 | 1999-03-30 | Matsushita Electric Industrial Co., Ltd. | Plasma processing method and apparatus |
| US5948166A (en) * | 1996-11-05 | 1999-09-07 | 3M Innovative Properties Company | Process and apparatus for depositing a carbon-rich coating on a moving substrate |
| US5888594A (en) | 1996-11-05 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Process for depositing a carbon-rich coating on a moving substrate |
| CN1104325C (zh) | 1998-01-13 | 2003-04-02 | 美国3M公司 | 改性共聚聚酯和改进的多层反射薄膜 |
| US6238808B1 (en) * | 1998-01-23 | 2001-05-29 | Canon Kabushiki Kaisha | Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device |
| US6890448B2 (en) | 1999-06-11 | 2005-05-10 | Shipley Company, L.L.C. | Antireflective hard mask compositions |
| US6811867B1 (en) | 2000-02-10 | 2004-11-02 | 3M Innovative Properties Company | Color stable pigmented polymeric films |
| US6483635B1 (en) | 2000-06-07 | 2002-11-19 | Cirrex Corp. | Apparatus for light amplification |
| JP2002122702A (ja) * | 2000-10-17 | 2002-04-26 | Matsushita Electric Ind Co Ltd | 光学フィルム、及び表示素子 |
| DE10241708B4 (de) | 2002-09-09 | 2005-09-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Reduzierung der Grenzflächenreflexion von Kunststoffsubstraten sowie derart modifiziertes Substrat und dessen Verwendung |
| DE60333715D1 (de) | 2002-10-30 | 2010-09-23 | Hitachi Ltd | Verfahren zur Herstellung funktioneller Substrate, die kolumnare Mikrosäulen aufweisen |
| JP4104485B2 (ja) * | 2003-04-28 | 2008-06-18 | 積水化学工業株式会社 | プラズマ処理装置 |
| JP2005011021A (ja) | 2003-06-18 | 2005-01-13 | Alps Electric Co Ltd | タブレット及び液晶表示装置 |
| US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| US7030008B2 (en) | 2003-09-12 | 2006-04-18 | International Business Machines Corporation | Techniques for patterning features in semiconductor devices |
| JP2005247944A (ja) * | 2004-03-03 | 2005-09-15 | Matsushita Electric Ind Co Ltd | プラスチックフィルム製造装置及びその製造方法 |
| JP4425774B2 (ja) * | 2004-03-11 | 2010-03-03 | 三星モバイルディスプレイ株式會社 | 垂直電界効果トランジスタ、それによる垂直電界効果トランジスタの製造方法及びそれを備える平板ディスプレイ装置 |
| JP4068074B2 (ja) * | 2004-03-29 | 2008-03-26 | 株式会社東芝 | 凸凹パターンの形成方法および凸凹パターン形成用部材 |
| JP2005331868A (ja) * | 2004-05-21 | 2005-12-02 | Canon Inc | 反射防止構造を有する光学素子およびその製造方法 |
| US7170666B2 (en) | 2004-07-27 | 2007-01-30 | Hewlett-Packard Development Company, L.P. | Nanostructure antireflection surfaces |
| US7264872B2 (en) | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
| US20070118939A1 (en) | 2005-11-10 | 2007-05-24 | C.R.F. Societa Consortile Per Azioni | Anti-reflection nano-metric structure based on porous alumina and method for production thereof |
| JP2007178873A (ja) * | 2005-12-28 | 2007-07-12 | Nikon Corp | 光学素子 |
| US7848021B2 (en) | 2006-02-17 | 2010-12-07 | Fujifilm Corporation | Optical film, antireflection film, polarizing plate and image display device |
| JP4794351B2 (ja) * | 2006-05-15 | 2011-10-19 | パナソニック株式会社 | 反射防止構造体及びそれを備えた光学装置 |
| JP5252811B2 (ja) | 2006-05-16 | 2013-07-31 | 日東電工株式会社 | 防眩性ハードコートフィルム、偏光板および画像表示装置 |
| DE602007000707D1 (de) * | 2006-05-31 | 2009-04-30 | Suisse Electronique Microtech | Nanostrukturierter Diffraktionsfilter nullter Ordnung |
| DE102006046131B4 (de) * | 2006-09-28 | 2020-06-25 | X-Fab Semiconductor Foundries Ag | Verfahren zur Herstellung einer optischen Schnittstelle für integrierte Optikanwendungen |
| DE102006056578A1 (de) | 2006-11-30 | 2008-06-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche |
| WO2008072498A1 (ja) * | 2006-12-13 | 2008-06-19 | National Institute Of Advanced Industrial Science And Technology | ナノ構造体を有する光学素子用成形型、ナノ構造体用成形型、その製造方法および光学素子 |
| US7839570B2 (en) | 2007-01-22 | 2010-11-23 | Dai Nippon Printing Co., Ltd. | Optical layered body, polarizer and image display device |
| JP4155337B1 (ja) | 2007-02-21 | 2008-09-24 | ソニー株式会社 | 防眩性フィルムおよびその製造方法、ならびに表示装置 |
| US7604381B2 (en) | 2007-04-16 | 2009-10-20 | 3M Innovative Properties Company | Optical article and method of making |
| DE102008018866A1 (de) | 2008-04-15 | 2009-10-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Reflexionsminderndes Interferenzschichtsystem und Verfahren zu dessen Herstellung |
| US20090316060A1 (en) | 2008-06-18 | 2009-12-24 | 3M Innovative Properties Company | Conducting film or electrode with improved optical and electrical performance |
| EP2379443B1 (en) * | 2008-12-30 | 2018-07-11 | 3M Innovative Properties Company | Nanostructured articles and methods of making nanostructured articles |
| US8460568B2 (en) | 2008-12-30 | 2013-06-11 | 3M Innovative Properties Company | Method for making nanostructured surfaces |
-
2009
- 2009-12-29 US US13/142,441 patent/US8460568B2/en active Active
- 2009-12-29 KR KR1020117017686A patent/KR101615787B1/ko active Active
- 2009-12-29 SG SG2011047826A patent/SG172428A1/en unknown
- 2009-12-29 EP EP09837102.4A patent/EP2379442A4/en not_active Withdrawn
- 2009-12-29 CN CN2009801573421A patent/CN102325718B/zh active Active
- 2009-12-29 WO PCT/US2009/069662 patent/WO2010078306A2/en not_active Ceased
- 2009-12-29 EP EP16176780.1A patent/EP3115334B1/en active Active
- 2009-12-29 JP JP2011544577A patent/JP5788807B2/ja active Active
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