JP2012505544A5 - - Google Patents

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Publication number
JP2012505544A5
JP2012505544A5 JP2011531011A JP2011531011A JP2012505544A5 JP 2012505544 A5 JP2012505544 A5 JP 2012505544A5 JP 2011531011 A JP2011531011 A JP 2011531011A JP 2011531011 A JP2011531011 A JP 2011531011A JP 2012505544 A5 JP2012505544 A5 JP 2012505544A5
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JP
Japan
Prior art keywords
energy
substrate
energy source
polymerizable material
elements
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JP2011531011A
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English (en)
Japanese (ja)
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JP5802557B2 (ja
JP2012505544A (ja
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Priority claimed from US12/511,593 external-priority patent/US8237133B2/en
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Publication of JP2012505544A5 publication Critical patent/JP2012505544A5/ja
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JP2011531011A 2008-10-10 2009-08-04 インプリント・リソグラフィ・システムでの硬化用のエネルギー源 Active JP5802557B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10433108P 2008-10-10 2008-10-10
US61/104,331 2008-10-10
US12/511,593 2009-07-29
US12/511,593 US8237133B2 (en) 2008-10-10 2009-07-29 Energy sources for curing in an imprint lithography system
PCT/US2009/004454 WO2010042141A2 (en) 2008-10-10 2009-08-04 Energy sources for curing in an imprint lithography system

Publications (3)

Publication Number Publication Date
JP2012505544A JP2012505544A (ja) 2012-03-01
JP2012505544A5 true JP2012505544A5 (enExample) 2012-08-23
JP5802557B2 JP5802557B2 (ja) 2015-10-28

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ID=42098033

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JP2011531011A Active JP5802557B2 (ja) 2008-10-10 2009-08-04 インプリント・リソグラフィ・システムでの硬化用のエネルギー源

Country Status (6)

Country Link
US (1) US8237133B2 (enExample)
JP (1) JP5802557B2 (enExample)
KR (1) KR101707898B1 (enExample)
MY (1) MY155087A (enExample)
TW (1) TWI426353B (enExample)
WO (1) WO2010042141A2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005003802A1 (de) * 2004-12-10 2006-06-14 Nütro Maschinen- und Anlagenbau GmbH & Co. KG Strahlungsgerät sowie Pulverauftragsstation und Anordnung zur Beschichtung von temperatursensiblen Materialien und Verfahren hierzu
NL2005254A (en) * 2009-09-22 2011-03-23 Asml Netherlands Bv Imprint lithography method and apparatus.
JP5366735B2 (ja) * 2009-09-24 2013-12-11 東芝機械株式会社 転写装置および転写方法
JP5535164B2 (ja) * 2011-09-22 2014-07-02 株式会社東芝 インプリント方法およびインプリント装置
JP6263930B2 (ja) * 2013-09-30 2018-01-24 大日本印刷株式会社 インプリント装置及びインプリント方法
JP6611450B2 (ja) * 2015-03-31 2019-11-27 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
US10180248B2 (en) 2015-09-02 2019-01-15 ProPhotonix Limited LED lamp with sensing capabilities
KR102743032B1 (ko) * 2016-10-14 2024-12-17 삼성디스플레이 주식회사 임프린트용 가압 롤러 및 이를 이용한 임프린트 방법
JP2018125377A (ja) * 2017-01-31 2018-08-09 東芝メモリ株式会社 インプリント装置および半導体装置の製造方法
KR102463923B1 (ko) 2017-09-18 2022-11-07 에스케이하이닉스 주식회사 임프린트 패턴 형성 방법 및 임프린트 장치
US10754078B2 (en) 2018-12-20 2020-08-25 Canon Kabushiki Kaisha Light source, a shaping system using the light source and an article manufacturing method
US11972976B2 (en) 2021-04-29 2024-04-30 Canon Kabushiki Kaisha Planarization system, planarization process, and method of manufacturing an article
US12027373B2 (en) 2021-05-28 2024-07-02 Canon Kabushiki Kaisha Planarization process, planarization system, and method of manufacturing an article
JP7746784B2 (ja) * 2021-10-06 2025-10-01 ウシオ電機株式会社 光加熱装置、加熱処理方法
JP7750154B2 (ja) * 2022-03-28 2025-10-07 ウシオ電機株式会社 光加熱装置、加熱処理方法
JP7750120B2 (ja) * 2022-01-26 2025-10-07 ウシオ電機株式会社 光加熱装置

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6112588A (en) 1996-10-25 2000-09-05 Speedline Technologies, Inc. Method and apparatus for measuring the size of drops of a viscous material dispensed from a dispensing system
TW520457B (en) 1997-09-30 2003-02-11 Toshiba Corp Display panel and position adjusting method for the display panel
US5897195A (en) * 1997-12-09 1999-04-27 Optical Gaging, Products, Inc. Oblique led illuminator device
EP1203264A4 (en) * 1999-07-01 2004-09-15 DEVICE AND METHOD FOR IMPROVING IMAGE BY SPATIAL FILTERING
US6462818B1 (en) 2000-06-22 2002-10-08 Kla-Tencor Corporation Overlay alignment mark design
EP2264522A3 (en) 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Method of forming a pattern on a substrate
EP1309897A2 (en) 2000-08-01 2003-05-14 Board Of Regents, The University Of Texas System Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US7317531B2 (en) * 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
CA2332190A1 (en) * 2001-01-25 2002-07-25 Efos Inc. Addressable semiconductor array light source for localized radiation delivery
JP4203553B2 (ja) * 2002-03-26 2009-01-07 東芝ライテック株式会社 フラッドライト
US6871558B2 (en) * 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
GB0304761D0 (en) * 2003-03-01 2003-04-02 Integration Technology Ltd Ultraviolet curing
SG147288A1 (en) 2003-04-29 2008-11-28 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and angular encoder
JP2004335808A (ja) * 2003-05-08 2004-11-25 Sony Corp パターン転写装置、パターン転写方法およびプログラム
JP4481698B2 (ja) * 2004-03-29 2010-06-16 キヤノン株式会社 加工装置
US7309225B2 (en) 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7630067B2 (en) * 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US7292326B2 (en) 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
US20070231421A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
JP2006244710A (ja) * 2005-02-28 2006-09-14 Sharp Corp 照明装置
JP4773729B2 (ja) * 2005-02-28 2011-09-14 キヤノン株式会社 転写装置およびデバイス製造方法
KR101352360B1 (ko) * 2005-04-27 2014-01-15 오브듀캇 아베 물체에 패턴을 전사하기 위한 수단
JP4515413B2 (ja) * 2005-05-27 2010-07-28 エーエスエムエル ネザーランズ ビー．ブイ． インプリントリソグラフィ
US7470921B2 (en) * 2005-09-20 2008-12-30 Summit Business Products, Inc. Light-emitting diode device
US7677877B2 (en) * 2005-11-04 2010-03-16 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
JP2007266308A (ja) * 2006-03-28 2007-10-11 Toshiba Corp パターン転写方法、パターン転写装置及び電子デバイスの製造方法
JP4795300B2 (ja) 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法
JP4928963B2 (ja) * 2007-01-30 2012-05-09 東芝機械株式会社 転写方法及び装置
JP2008194838A (ja) * 2007-02-08 2008-08-28 Sii Nanotechnology Inc ナノインプリントリソグラフィーのモールド検査方法及び樹脂残渣除去方法
US7841741B2 (en) * 2007-04-02 2010-11-30 Endicott Interconnect Technologies, Inc. LED lighting assembly and lamp utilizing same
JP4810496B2 (ja) * 2007-04-25 2011-11-09 株式会社東芝 パターン形成装置、パターン形成方法及びテンプレート
US8389203B2 (en) * 2007-05-08 2013-03-05 Esko-Graphics Imaging Gmbh Exposing printing plates using light emitting diodes
JP2010533077A (ja) * 2007-07-03 2010-10-21 スリーエム イノベイティブ プロパティズ カンパニー 複合光学フィルムを形成する方法
JP2009266901A (ja) * 2008-04-22 2009-11-12 Sharp Corp 転写装置、ウエハ状光学装置の製造方法、電子素子ウエハモジュール、センサウエハモジュール、電子素子モジュール、センサモジュールおよび電子情報機器
JP4695679B2 (ja) * 2008-08-21 2011-06-08 株式会社東芝 テンプレートの洗浄方法及びパターン形成方法
JP4892025B2 (ja) * 2008-09-26 2012-03-07 株式会社東芝 インプリント方法

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