JP2012503199A - 放出電流およびバイアス電圧を制御する電離真空計 - Google Patents
放出電流およびバイアス電圧を制御する電離真空計 Download PDFInfo
- Publication number
- JP2012503199A JP2012503199A JP2011527884A JP2011527884A JP2012503199A JP 2012503199 A JP2012503199 A JP 2012503199A JP 2011527884 A JP2011527884 A JP 2011527884A JP 2011527884 A JP2011527884 A JP 2011527884A JP 2012503199 A JP2012503199 A JP 2012503199A
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- Prior art keywords
- pressure
- ionization
- cathode
- emission current
- electron source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims abstract description 51
- 150000002500 ions Chemical class 0.000 claims abstract description 33
- 238000009530 blood pressure measurement Methods 0.000 claims abstract description 18
- 230000004044 response Effects 0.000 claims abstract description 9
- 230000008569 process Effects 0.000 claims description 23
- 230000008859 change Effects 0.000 claims description 19
- 230000006870 function Effects 0.000 claims description 11
- 239000013626 chemical specie Substances 0.000 claims description 8
- 238000012545 processing Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 19
- 238000001514 detection method Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 35
- 238000010438 heat treatment Methods 0.000 description 12
- 230000005284 excitation Effects 0.000 description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 8
- 229910052721 tungsten Inorganic materials 0.000 description 8
- 239000010937 tungsten Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000000177 wavelength dispersive X-ray spectroscopy Methods 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/30—Vacuum gauges by making use of ionisation effects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/30—Vacuum gauges by making use of ionisation effects
- G01L21/32—Vacuum gauges by making use of ionisation effects using electric discharge tubes with thermionic cathodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/60—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrostatic variables, e.g. electrographic flaw testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Immunology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Measuring Fluid Pressure (AREA)
- Solid Thermionic Cathode (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US19268408P | 2008-09-19 | 2008-09-19 | |
| US61/192,684 | 2008-09-19 | ||
| PCT/US2009/056612 WO2010033427A1 (en) | 2008-09-19 | 2009-09-11 | Ionization gauge with emission current and bias potential control |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014266942A Division JP6031502B2 (ja) | 2008-09-19 | 2014-12-29 | 電離真空計および圧力測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012503199A true JP2012503199A (ja) | 2012-02-02 |
| JP2012503199A5 JP2012503199A5 (https=) | 2012-10-25 |
Family
ID=42039815
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011527884A Pending JP2012503199A (ja) | 2008-09-19 | 2009-09-11 | 放出電流およびバイアス電圧を制御する電離真空計 |
| JP2014266942A Active JP6031502B2 (ja) | 2008-09-19 | 2014-12-29 | 電離真空計および圧力測定方法 |
| JP2016207564A Active JP6341970B2 (ja) | 2008-09-19 | 2016-10-24 | 電離真空計および圧力測定方法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014266942A Active JP6031502B2 (ja) | 2008-09-19 | 2014-12-29 | 電離真空計および圧力測定方法 |
| JP2016207564A Active JP6341970B2 (ja) | 2008-09-19 | 2016-10-24 | 電離真空計および圧力測定方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8947098B2 (https=) |
| EP (2) | EP2326931B1 (https=) |
| JP (3) | JP2012503199A (https=) |
| CN (2) | CN102159929A (https=) |
| DK (2) | DK3517921T3 (https=) |
| WO (1) | WO2010033427A1 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140127859A (ko) * | 2012-02-08 | 2014-11-04 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 고압 작동용 이온화 게이지 |
| KR20170129919A (ko) * | 2015-03-23 | 2017-11-27 | 가부시키가이샤 알박 | 삼극관형 전리 진공계 |
| WO2018225853A1 (ja) * | 2017-06-09 | 2018-12-13 | アズビル株式会社 | 静電容量型圧力センサ |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2929208B2 (ja) | 1989-11-10 | 1999-08-03 | 株式会社平和 | カード式パチンコ機 |
| KR101541273B1 (ko) * | 2007-12-19 | 2015-08-03 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 전자 멀티플라이어 냉 방출 소스를 갖는 이온화 게이지 |
| CN102159929A (zh) | 2008-09-19 | 2011-08-17 | 布鲁克机械公司 | 具有发射电流及偏压电位控制的电离计 |
| JP5901142B2 (ja) * | 2011-05-18 | 2016-04-06 | 株式会社アルバック | 水素またはヘリウム用の検出計及び水素またはヘリウムの検出方法並びにリークディテクタ |
| WO2013016551A1 (en) * | 2011-07-26 | 2013-01-31 | Mks Instruments, Inc. | Cold cathode gauge fast response signal circuit |
| US9588004B2 (en) | 2014-11-07 | 2017-03-07 | Mks Instruments, Inc. | Long lifetime cold cathode ionization vacuum gauge design |
| TWI739300B (zh) | 2015-01-15 | 2021-09-11 | 美商Mks儀器公司 | 離子化計及其製造方法 |
| US9726566B2 (en) * | 2015-04-29 | 2017-08-08 | Honeywell International Inc. | Vacuum pressure gauge |
| US9927317B2 (en) | 2015-07-09 | 2018-03-27 | Mks Instruments, Inc. | Ionization pressure gauge with bias voltage and emission current control and measurement |
| US10242855B1 (en) * | 2016-09-21 | 2019-03-26 | The United States of America as requested by the Secretary of the Air Force | Detector, system and method for droplet and/or cluster beam spectroscopy |
| US10928265B2 (en) * | 2018-05-29 | 2021-02-23 | Mks Instruments, Inc. | Gas analysis with an inverted magnetron source |
| JP7314000B2 (ja) * | 2019-09-19 | 2023-07-25 | キヤノンアネルバ株式会社 | 電子発生装置および電離真空計 |
| JP2025515982A (ja) | 2021-12-16 | 2025-05-23 | インフィコン インコーポレイティド | 複数の楕円形フィラメントを備えたイオン源アセンブリ |
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2009
- 2009-09-11 CN CN2009801370982A patent/CN102159929A/zh active Pending
- 2009-09-11 DK DK19158590.0T patent/DK3517921T3/da active
- 2009-09-11 CN CN201610282044.7A patent/CN106404277A/zh active Pending
- 2009-09-11 DK DK09815009.7T patent/DK2326931T3/da active
- 2009-09-11 EP EP09815009.7A patent/EP2326931B1/en active Active
- 2009-09-11 EP EP19158590.0A patent/EP3517921B1/en active Active
- 2009-09-11 WO PCT/US2009/056612 patent/WO2010033427A1/en not_active Ceased
- 2009-09-11 JP JP2011527884A patent/JP2012503199A/ja active Pending
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2011
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2014
- 2014-12-24 US US14/582,750 patent/US9383286B2/en active Active
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2016
- 2016-10-24 JP JP2016207564A patent/JP6341970B2/ja active Active
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140127859A (ko) * | 2012-02-08 | 2014-11-04 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 고압 작동용 이온화 게이지 |
| JP2015507203A (ja) * | 2012-02-08 | 2015-03-05 | エム ケー エス インストルメンツインコーポレーテッドMks Instruments,Incorporated | 高圧力で作動する電離真空計 |
| KR102082168B1 (ko) * | 2012-02-08 | 2020-02-27 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 압력을 측정하는 이온화 게이지 및 이를 이용한 압력 측정 방법 |
| KR20170129919A (ko) * | 2015-03-23 | 2017-11-27 | 가부시키가이샤 알박 | 삼극관형 전리 진공계 |
| KR101982606B1 (ko) * | 2015-03-23 | 2019-05-27 | 가부시키가이샤 알박 | 삼극관형 전리 진공계 |
| WO2018225853A1 (ja) * | 2017-06-09 | 2018-12-13 | アズビル株式会社 | 静電容量型圧力センサ |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6341970B2 (ja) | 2018-06-13 |
| US9383286B2 (en) | 2016-07-05 |
| JP2015062035A (ja) | 2015-04-02 |
| JP6031502B2 (ja) | 2016-11-24 |
| EP2326931A1 (en) | 2011-06-01 |
| CN106404277A (zh) | 2017-02-15 |
| EP2326931A4 (en) | 2012-08-08 |
| CN102159929A (zh) | 2011-08-17 |
| EP2326931B1 (en) | 2019-04-24 |
| JP2017015738A (ja) | 2017-01-19 |
| EP3517921B1 (en) | 2020-11-04 |
| US20110163754A1 (en) | 2011-07-07 |
| WO2010033427A1 (en) | 2010-03-25 |
| US20150108993A1 (en) | 2015-04-23 |
| EP3517921A1 (en) | 2019-07-31 |
| DK2326931T3 (da) | 2019-07-22 |
| DK3517921T3 (da) | 2021-01-18 |
| US8947098B2 (en) | 2015-02-03 |
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