JP2012236724A - Sn合金めっき液へのSn成分補給用酸化第一錫粉末及びその製造方法 - Google Patents
Sn合金めっき液へのSn成分補給用酸化第一錫粉末及びその製造方法 Download PDFInfo
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- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical compound [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 title claims abstract description 115
- 239000000843 powder Substances 0.000 title claims abstract description 109
- 238000007747 plating Methods 0.000 title claims abstract description 76
- 229910001128 Sn alloy Inorganic materials 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 title abstract description 22
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title abstract description 6
- 239000000243 solution Substances 0.000 claims abstract description 77
- 239000002253 acid Substances 0.000 claims abstract description 27
- 230000002378 acidificating effect Effects 0.000 claims abstract description 26
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 25
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 25
- 239000007864 aqueous solution Substances 0.000 claims abstract description 25
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims description 38
- 239000002002 slurry Substances 0.000 claims description 26
- 229910000085 borane Inorganic materials 0.000 claims description 19
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 14
- CVNKFOIOZXAFBO-UHFFFAOYSA-J tin(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Sn+4] CVNKFOIOZXAFBO-UHFFFAOYSA-J 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000004090 dissolution Methods 0.000 claims description 11
- 239000012279 sodium borohydride Substances 0.000 claims description 11
- 229910000033 sodium borohydride Inorganic materials 0.000 claims description 11
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 8
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 8
- MNQZXJOMYWMBOU-VKHMYHEASA-N D-glyceraldehyde Chemical compound OC[C@@H](O)C=O MNQZXJOMYWMBOU-VKHMYHEASA-N 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 6
- 239000012448 Lithium borohydride Substances 0.000 claims description 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- HKOOXMFOFWEVGF-UHFFFAOYSA-N phenylhydrazine Chemical compound NNC1=CC=CC=C1 HKOOXMFOFWEVGF-UHFFFAOYSA-N 0.000 claims description 5
- 229940067157 phenylhydrazine Drugs 0.000 claims description 5
- 229910052700 potassium Inorganic materials 0.000 claims description 5
- 239000011591 potassium Substances 0.000 claims description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 4
- 238000001291 vacuum drying Methods 0.000 claims description 3
- 230000003472 neutralizing effect Effects 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 7
- -1 alkyl sulfonic acid Chemical compound 0.000 abstract 1
- CJGYQECZUAUFSN-UHFFFAOYSA-N oxygen(2-);tin(2+) Chemical compound [O-2].[Sn+2] CJGYQECZUAUFSN-UHFFFAOYSA-N 0.000 description 82
- 239000002245 particle Substances 0.000 description 13
- 229910045601 alloy Inorganic materials 0.000 description 12
- 239000000956 alloy Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000006386 neutralization reaction Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 7
- 229910020836 Sn-Ag Inorganic materials 0.000 description 7
- 229910020988 Sn—Ag Inorganic materials 0.000 description 7
- 235000011114 ammonium hydroxide Nutrition 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 229910020220 Pb—Sn Inorganic materials 0.000 description 6
- 238000006297 dehydration reaction Methods 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000010802 sludge Substances 0.000 description 4
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 3
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 3
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- 230000005260 alpha ray Effects 0.000 description 3
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 3
- 239000001099 ammonium carbonate Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000009469 supplementation Effects 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 230000003064 anti-oxidating effect Effects 0.000 description 2
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- OWICADGFGLJBFZ-UHFFFAOYSA-N B.N(c1ccccc1)c1ccccc1 Chemical compound B.N(c1ccccc1)c1ccccc1 OWICADGFGLJBFZ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- UWTDFICHZKXYAC-UHFFFAOYSA-N boron;oxolane Chemical compound [B].C1CCOC1 UWTDFICHZKXYAC-UHFFFAOYSA-N 0.000 description 1
- NNTOJPXOCKCMKR-UHFFFAOYSA-N boron;pyridine Chemical compound [B].C1=CC=NC=C1 NNTOJPXOCKCMKR-UHFFFAOYSA-N 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
- C01G19/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
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Abstract
【解決手段】Sn合金めっき液へのSn成分補給用酸化第一錫粉末であって、酸化防止剤が粉末中に質量比で100〜5000ppm含まれ、温度25℃の100g/Lアルキルスルホン酸水溶液100mlに酸化第一錫粉末0.1gを添加して攪拌したとき、180秒以内で溶解する溶解速度を有することを特徴とする。
【選択図】図1
Description
先ず、α線放出量が0.05cph/cm2以下の0.0007cph/cm2である金属Sn粉末500gを、濃度35質量%、温度80℃の塩酸1000gに24時間かけて溶解し、酸性水溶液を調製した。続いて、窒素ガスを充填させたタンク内で、この酸性水溶液に、液温30℃、pH6を維持するように濃度30質量%のアンモニア水をアルカリ水溶液として添加し、攪拌して、水酸化第一錫のスラリーを得た。
酸化防止剤として水素化ホウ素ナトリウム(純度92%以上、粒径10〜30μm)を用意し、実施例1と同様にして得られた黒色の酸化第一錫粉末536gに水素化ホウ素ナトリウム0.054gを混合したこと以外は、実施例1と同様に、Sn成分補給用酸化第一錫粉末を得た。
実施例1と同様にして得られた黒色の酸化第一錫粉末529gにグリセルアルデヒド2.65gを混合したこと以外は、実施例1と同様に、Sn成分補給用酸化第一錫粉末を得た。
実施例1と同様にして得られた黒色の酸化第一錫粉末532gに実施例1と同様に用意したジメチルアミン・ボラン錯体2.66gを混合したこと以外は、実施例1と同様に、Sn成分補給用酸化第一錫粉末を得た。
酸化防止剤として水素化ホウ素ナトリウム(純度92%以上、粒径10〜30μm)を用意し、実施例1と同様にして得られた黒色の酸化第一錫粉末530gに水素化ホウ素ナトリウム2.65gを混合したこと以外は、実施例1と同様に、Sn成分補給用酸化第一錫粉末を得た。
酸化防止剤を混合せず、実施例1と同様にして得られた黒色の酸化第一錫粉末536gをSn成分補給用酸化第一錫粉末とした。
実施例1と同様にして得られた黒色の酸化第一錫粉末528gにジメチルアミン・ボラン錯体0.042gを混合したこと以外は、実施例1と同様に、Sn成分補給用酸化第一錫粉末を得た。
酸化防止剤として水素化ホウ素ナトリウム(純度92%以上、粒径10〜30μm)を用意し、実施例1と同様にして得られた黒色の酸化第一錫粉末531gに水素化ホウ素ナトリウム0.042gを混合したこと以外は、実施例1と同様に、Sn成分補給用酸化第一錫粉末を得た。
実施例1〜5及び比較例1〜3で得られたSn成分補給用酸化第一錫粉末について、粉末の平均粒径(D50)、比表面積及びタップ密度を測定した。これらの結果を以下の表1に示す。
実施例1〜5及び比較例1〜3の酸化第一錫粉末について100g/Lアルキルスルホン酸に対する溶解速度を測定した。具体的には、実施例1〜5及び比較例1〜3の酸化第一錫粉末について、その日に製造した粉末と、製造後40℃の温度で3日間、大気中で保存した後の粉末の2種類をそれぞれ用意し、これらの粉末について、以下に示す手順で溶解速度を測定した。
Claims (3)
- Sn合金めっき液へのSn成分補給用酸化第一錫粉末であって、
前記酸化防止剤が粉末中に質量比で100〜5000ppm含まれ、
温度25℃の100g/Lアルキルスルホン酸水溶液100mlに酸化第一錫粉末0.1gを添加して攪拌したとき、180秒以内で溶解する溶解速度を有することを特徴とするSn合金めっき液へのSn成分補給用酸化第一錫粉末。 - 前記酸化防止剤がグリセルアルデヒド、フェニルヒドラジン、水素化ホウ素ナトリウム、水素化ホウ素カリウム、水素化ホウ素リチウム、テトラヒドロフラン・ボラン錯体、ジメチルアミン・ボラン錯体、ジフェニルアミン・ボラン錯体及びピリジン・ボラン錯体からなる群より選ばれた1種又は2種以上である請求項1記載のSn合金めっき液へのSn成分補給用酸化第一錫粉末。
- Sn2+イオンを含む酸性水溶液を調製する工程(11)と、
前記酸性水溶液にアルカリ水溶液を添加して中和させ、水酸化第一錫のスラリーを調製する工程(12)と、
前記調製したスラリーを脱水させ、酸化第一錫のスラリーを得る工程(13)と、
前記酸化第一錫のスラリーを固液分離し、酸化第一錫を得る工程(14)と、
前記酸化第一錫を真空乾燥する工程(15)と、
前記酸化第一錫に酸化防止剤粉末を混合する工程(16)と
を含む請求項1又は2記載のSn合金めっき液へのSn成分補給用酸化第一錫粉末の製造方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011104953A JP5807377B2 (ja) | 2011-05-10 | 2011-05-10 | Sn合金めっき液へのSn成分補給用酸化第一錫粉末及びその製造方法 |
TW101114527A TWI511928B (zh) | 2011-05-10 | 2012-04-24 | One of the tin oxide powders for the Sn component is supplied to the Sn alloy plating solution and a method for producing the same |
CN201280012025.2A CN103429535B (zh) | 2011-05-10 | 2012-05-08 | 用于向Sn合金镀液补给Sn成分的氧化亚锡粉末及其制造法 |
KR1020137030200A KR101902601B1 (ko) | 2011-05-10 | 2012-05-08 | Sn 합금 도금액에 대한 Sn 성분 보급용 산화 제 1 주석 분말 및 그 제조 방법 |
EP12782858.0A EP2708512B1 (en) | 2011-05-10 | 2012-05-08 | Tin(ii) oxide powder for replenishing tin component of tin-alloy plating solution and method for manufacturing said powder |
PCT/JP2012/061703 WO2012153716A1 (ja) | 2011-05-10 | 2012-05-08 | Sn合金めっき液へのSn成分補給用酸化第一錫粉末及びその製造方法 |
US14/115,366 US9108861B2 (en) | 2011-05-10 | 2012-05-08 | Tin(II) oxide powder for replenishing tin component of tin-alloy plating solution and method for manufacturing said powder |
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WO2020021782A1 (ja) * | 2018-07-25 | 2020-01-30 | Jx金属株式会社 | 酸化第一錫粉末 |
US11981581B2 (en) | 2018-03-05 | 2024-05-14 | Jx Metals Corporation | Stannous oxide powder |
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JP6157825B2 (ja) * | 2011-10-31 | 2017-07-05 | ダウ グローバル テクノロジーズ エルエルシー | SnOを製造する方法 |
JP6569237B2 (ja) | 2014-03-06 | 2019-09-04 | 三菱マテリアル株式会社 | 酸化第一錫の製造方法、Snめっき液の製造方法 |
EP3712114A4 (en) * | 2017-11-15 | 2021-01-13 | JX Nippon Mining & Metals Corporation | TIN OXIDE AND METHOD FOR MANUFACTURING IT |
JP7112854B2 (ja) * | 2018-02-19 | 2022-08-04 | 住友化学株式会社 | 酸化錫粉末 |
JP7314658B2 (ja) * | 2018-07-30 | 2023-07-26 | 三菱マテリアル株式会社 | 低α線放出量の酸化第一錫の製造方法 |
US11525187B2 (en) | 2019-02-28 | 2022-12-13 | Mitsubishi Materials Corporation | High-concentration tin sulfonate aqueous solution and method for producing same |
CN113060758B (zh) * | 2021-05-07 | 2023-03-24 | 云南锡业研究院有限公司 | 一种利用锡铜渣制备二氧化锡和锡酸盐的方法 |
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