JP2012059906A5 - - Google Patents
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- JP2012059906A5 JP2012059906A5 JP2010201526A JP2010201526A JP2012059906A5 JP 2012059906 A5 JP2012059906 A5 JP 2012059906A5 JP 2010201526 A JP2010201526 A JP 2010201526A JP 2010201526 A JP2010201526 A JP 2010201526A JP 2012059906 A5 JP2012059906 A5 JP 2012059906A5
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- JP
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- Prior art keywords
- magnetization
- thermal stability
- layer
- composition
- storage layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000005415 magnetization Effects 0.000 description 33
- 239000000203 mixture Substances 0.000 description 15
- 229910000521 B alloy Inorganic materials 0.000 description 11
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 230000005291 magnetic effect Effects 0.000 description 5
- 229910003321 CoFe Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000003302 ferromagnetic material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010201526A JP2012059906A (ja) | 2010-09-09 | 2010-09-09 | 記憶素子、メモリ装置 |
| US13/219,875 US9025362B2 (en) | 2010-09-09 | 2011-08-29 | Memory element and memory device |
| CN201110259029.8A CN102403027B (zh) | 2010-09-09 | 2011-09-02 | 存储元件和存储装置 |
| US14/590,339 US9735343B2 (en) | 2010-09-09 | 2015-01-06 | Magnetic memory device and element |
| US15/646,544 US10374146B2 (en) | 2010-09-09 | 2017-07-11 | Memory element and memory device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010201526A JP2012059906A (ja) | 2010-09-09 | 2010-09-09 | 記憶素子、メモリ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012059906A JP2012059906A (ja) | 2012-03-22 |
| JP2012059906A5 true JP2012059906A5 (enExample) | 2013-10-10 |
Family
ID=45806599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010201526A Pending JP2012059906A (ja) | 2010-09-09 | 2010-09-09 | 記憶素子、メモリ装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (3) | US9025362B2 (enExample) |
| JP (1) | JP2012059906A (enExample) |
| CN (1) | CN102403027B (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8907436B2 (en) | 2010-08-24 | 2014-12-09 | Samsung Electronics Co., Ltd. | Magnetic devices having perpendicular magnetic tunnel junction |
| US9299923B2 (en) | 2010-08-24 | 2016-03-29 | Samsung Electronics Co., Ltd. | Magnetic devices having perpendicular magnetic tunnel junction |
| JP5786341B2 (ja) | 2010-09-06 | 2015-09-30 | ソニー株式会社 | 記憶素子、メモリ装置 |
| JP5742142B2 (ja) * | 2010-09-08 | 2015-07-01 | ソニー株式会社 | 記憶素子、メモリ装置 |
| JP2012059906A (ja) | 2010-09-09 | 2012-03-22 | Sony Corp | 記憶素子、メモリ装置 |
| JP2012064623A (ja) * | 2010-09-14 | 2012-03-29 | Sony Corp | 記憶素子、メモリ装置 |
| US9647202B2 (en) * | 2011-02-16 | 2017-05-09 | Avalanche Technology, Inc. | Magnetic random access memory with perpendicular enhancement layer |
| US9337417B2 (en) * | 2010-12-10 | 2016-05-10 | Avalanche Technology, Inc. | Magnetic random access memory with perpendicular interfacial anisotropy |
| EP2851943B1 (en) * | 2012-05-16 | 2020-01-01 | Sony Corporation | Storage device, storage element |
| JP6244617B2 (ja) * | 2012-09-28 | 2017-12-13 | ソニー株式会社 | 記憶素子、記憶装置、磁気ヘッド |
| JP6182993B2 (ja) | 2013-06-17 | 2017-08-23 | ソニー株式会社 | 記憶素子、記憶装置、記憶素子の製造方法、磁気ヘッド |
| WO2016022107A1 (en) * | 2014-08-05 | 2016-02-11 | Intel Corporation | Configurations and techniques to increase interfacial anisotropy of magnetic tunnel junctions |
| US9385307B2 (en) | 2014-10-01 | 2016-07-05 | Kabushiki Kaisha Toshiba | Magnetoresistive element and method of manufacturing the same |
| US10672420B2 (en) * | 2015-03-05 | 2020-06-02 | Sony Corporation | Storage device, storage apparatus, magnetic head, and electronic apparatus |
| CN107564931A (zh) * | 2016-07-06 | 2018-01-09 | 中电海康集团有限公司 | 一种基于共源电阻技术的磁性随机存取存储器及其共源结构制造工艺 |
| US9934798B1 (en) * | 2016-09-28 | 2018-04-03 | Seagate Technology Llc | Lateral spin valve reader with vertically-integrated two-dimensional semiconducting channel |
| CN108008326B (zh) * | 2016-10-31 | 2020-11-24 | 南京大学 | 一种调控mram材料阻尼因子的方法 |
| WO2019049244A1 (ja) * | 2017-09-06 | 2019-03-14 | Tdk株式会社 | トンネル磁気抵抗効果素子及び磁気メモリ |
| US10381403B1 (en) * | 2018-06-21 | 2019-08-13 | Globalfoundries Singapore Pte. Ltd. | MRAM device with improved seal ring and method for producing the same |
| US10892299B2 (en) * | 2018-07-31 | 2021-01-12 | International Business Machines Corporation | Magnetic field controlled transistor |
| JP2020043134A (ja) | 2018-09-06 | 2020-03-19 | キオクシア株式会社 | 磁気記憶装置 |
| CN114068613B (zh) * | 2020-08-05 | 2025-11-25 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
| JP2023042247A (ja) | 2021-09-14 | 2023-03-27 | キオクシア株式会社 | メモリデバイス |
| CN115188882A (zh) * | 2022-07-08 | 2022-10-14 | 中国科学技术大学 | 一种用于调控金属性铁磁体磁性的器件、制备方法及其应用 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6130814A (en) | 1998-07-28 | 2000-10-10 | International Business Machines Corporation | Current-induced magnetic switching device and memory including the same |
| JP2002329905A (ja) * | 2001-05-02 | 2002-11-15 | Fujitsu Ltd | Cpp構造磁気抵抗効果素子およびその製造方法 |
| JP2003017782A (ja) | 2001-07-04 | 2003-01-17 | Rikogaku Shinkokai | キャリヤスピン注入磁化反転型磁気抵抗効果膜と該膜を用いた不揮発性メモリー素子及び該素子を用いたメモリー装置 |
| US7135552B2 (en) * | 2002-02-28 | 2006-11-14 | Meji Seika Kaisha, Ltd. | Mite galectin |
| JP4100025B2 (ja) | 2002-04-09 | 2008-06-11 | ソニー株式会社 | 磁気抵抗効果素子及び磁気メモリ装置 |
| US6654278B1 (en) * | 2002-07-31 | 2003-11-25 | Motorola, Inc. | Magnetoresistance random access memory |
| EP2264725B1 (en) * | 2002-12-13 | 2016-11-23 | Japan Science and Technology Agency | Magnetic apparatus with magnetic thin film |
| US7075822B2 (en) * | 2002-12-31 | 2006-07-11 | Intel Corporation | High bandwidth datapath load and test of multi-level memory cells |
| US6845038B1 (en) * | 2003-02-01 | 2005-01-18 | Alla Mikhailovna Shukh | Magnetic tunnel junction memory device |
| ATE368903T1 (de) * | 2004-01-26 | 2007-08-15 | Nimblegen Systems Inc | Computersoftware zur unterstützung der identifikation von snps mit microarrays |
| US7242045B2 (en) | 2004-02-19 | 2007-07-10 | Grandis, Inc. | Spin transfer magnetic element having low saturation magnetization free layers |
| US7576956B2 (en) * | 2004-07-26 | 2009-08-18 | Grandis Inc. | Magnetic tunnel junction having diffusion stop layer |
| US7241631B2 (en) * | 2004-12-29 | 2007-07-10 | Grandis, Inc. | MTJ elements with high spin polarization layers configured for spin-transfer switching and spintronics devices using the magnetic elements |
| US7289356B2 (en) * | 2005-06-08 | 2007-10-30 | Grandis, Inc. | Fast magnetic memory devices utilizing spin transfer and magnetic elements used therein |
| TWI304586B (en) * | 2006-03-20 | 2008-12-21 | Univ Nat Yunlin Sci & Tech | System for reducing critical current of magnetic random access memory |
| JP2007299880A (ja) * | 2006-04-28 | 2007-11-15 | Toshiba Corp | 磁気抵抗効果素子,および磁気抵抗効果素子の製造方法 |
| ATE527527T1 (de) * | 2006-05-30 | 2011-10-15 | Acreo Ab | Vorrichtung, kit und verfahren zur überwachung einer parameterhistorie |
| JP2008085208A (ja) * | 2006-09-28 | 2008-04-10 | Fujitsu Ltd | トンネル磁気抵抗素子、磁気ヘッドおよび磁気メモリ |
| US7848059B2 (en) * | 2006-09-29 | 2010-12-07 | Kabushiki Kaisha Toshiba | Magnetoresistive effect device and magnetic random access memory using the same |
| JP2008109118A (ja) * | 2006-09-29 | 2008-05-08 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| JP2008130807A (ja) * | 2006-11-21 | 2008-06-05 | Toshiba Corp | 磁気ランダムアクセスメモリ及びその製造方法 |
| US7598579B2 (en) * | 2007-01-30 | 2009-10-06 | Magic Technologies, Inc. | Magnetic tunnel junction (MTJ) to reduce spin transfer magnetization switching current |
| JP4682998B2 (ja) * | 2007-03-15 | 2011-05-11 | ソニー株式会社 | 記憶素子及びメモリ |
| JP2009081315A (ja) * | 2007-09-26 | 2009-04-16 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| US20090122450A1 (en) * | 2007-11-08 | 2009-05-14 | Headway Technologies, Inc. | TMR device with low magnetostriction free layer |
| US20110049659A1 (en) * | 2008-05-02 | 2011-03-03 | Yoshishige Suzuki | Magnetization control method, information storage method, information storage element, and magnetic function element |
| JP4952725B2 (ja) | 2009-01-14 | 2012-06-13 | ソニー株式会社 | 不揮発性磁気メモリ装置 |
| JP5600344B2 (ja) * | 2010-03-10 | 2014-10-01 | 株式会社日立製作所 | 磁気抵抗効果素子及び磁気メモリ |
| JP5725735B2 (ja) * | 2010-06-04 | 2015-05-27 | 株式会社日立製作所 | 磁気抵抗効果素子及び磁気メモリ |
| US8604572B2 (en) * | 2010-06-14 | 2013-12-10 | Regents Of The University Of Minnesota | Magnetic tunnel junction device |
| JP2012059906A (ja) * | 2010-09-09 | 2012-03-22 | Sony Corp | 記憶素子、メモリ装置 |
| JP5740878B2 (ja) * | 2010-09-14 | 2015-07-01 | ソニー株式会社 | 記憶素子、メモリ装置 |
-
2010
- 2010-09-09 JP JP2010201526A patent/JP2012059906A/ja active Pending
-
2011
- 2011-08-29 US US13/219,875 patent/US9025362B2/en active Active
- 2011-09-02 CN CN201110259029.8A patent/CN102403027B/zh active Active
-
2015
- 2015-01-06 US US14/590,339 patent/US9735343B2/en active Active
-
2017
- 2017-07-11 US US15/646,544 patent/US10374146B2/en active Active
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