JP2012043955A5 - - Google Patents
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- Publication number
- JP2012043955A5 JP2012043955A5 JP2010183398A JP2010183398A JP2012043955A5 JP 2012043955 A5 JP2012043955 A5 JP 2012043955A5 JP 2010183398 A JP2010183398 A JP 2010183398A JP 2010183398 A JP2010183398 A JP 2010183398A JP 2012043955 A5 JP2012043955 A5 JP 2012043955A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor region
- region
- conductivity type
- semiconductor
- extending
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 claims description 53
- 239000012535 impurity Substances 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 230000005684 electric field Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010183398A JP2012043955A (ja) | 2010-08-18 | 2010-08-18 | 半導体装置及びその製造方法 |
| CN2011100519452A CN102376764A (zh) | 2010-08-18 | 2011-03-03 | 半导体装置及其制造方法 |
| EP11159170A EP2421047A1 (en) | 2010-08-18 | 2011-03-22 | Semiconductor device and method for manufacturing same |
| US13/053,452 US20120043606A1 (en) | 2010-08-18 | 2011-03-22 | Semiconductor device and method for manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010183398A JP2012043955A (ja) | 2010-08-18 | 2010-08-18 | 半導体装置及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012043955A JP2012043955A (ja) | 2012-03-01 |
| JP2012043955A5 true JP2012043955A5 (enExample) | 2012-10-11 |
Family
ID=44262919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010183398A Abandoned JP2012043955A (ja) | 2010-08-18 | 2010-08-18 | 半導体装置及びその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20120043606A1 (enExample) |
| EP (1) | EP2421047A1 (enExample) |
| JP (1) | JP2012043955A (enExample) |
| CN (1) | CN102376764A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015177914A1 (ja) * | 2014-05-23 | 2015-11-26 | 株式会社日立製作所 | 半導体装置、半導体装置の製造方法、電力変換装置、3相モータシステム、自動車、および鉄道車両 |
| JP2016096307A (ja) * | 2014-11-17 | 2016-05-26 | トヨタ自動車株式会社 | 半導体装置 |
| DE112015005397B4 (de) * | 2015-01-19 | 2022-06-09 | Hitachi, Ltd. | Halbleitervorrichtung, Verfahren zum Herstellen derselben, Leistungsumsetzer, Dreiphasenmotorsystem, Kraftfahrzeug und Eisenbahnfahrzeug |
| DE112015004751B4 (de) | 2015-02-12 | 2020-07-09 | Hitachi, Ltd. | Halbleitervorrichtung und verfahren zu deren herstellung, leistungsumsetzervorrichtung, dreiphasenmotorsystem, kraftfahrzeug und eisenbahnwagen |
| US10903163B2 (en) | 2015-10-19 | 2021-01-26 | Vishay-Siliconix, LLC | Trench MOSFET with self-aligned body contact with spacer |
| JP7075876B2 (ja) | 2018-12-25 | 2022-05-26 | 株式会社日立製作所 | 炭化ケイ素半導体装置、電力変換装置、3相モータシステム、自動車および鉄道車両 |
| US11961903B2 (en) * | 2020-05-26 | 2024-04-16 | Hyundai Mobis Co., Ltd. | Power semiconductor device and method of fabricating the same |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3356162B2 (ja) * | 1999-10-19 | 2002-12-09 | 株式会社デンソー | 半導体装置及びその製造方法 |
| US6642577B2 (en) * | 2000-03-16 | 2003-11-04 | Denso Corporation | Semiconductor device including power MOSFET and peripheral device and method for manufacturing the same |
| JP2002231945A (ja) * | 2001-02-06 | 2002-08-16 | Denso Corp | 半導体装置の製造方法 |
| JP3534084B2 (ja) * | 2001-04-18 | 2004-06-07 | 株式会社デンソー | 半導体装置およびその製造方法 |
| US7161208B2 (en) * | 2002-05-14 | 2007-01-09 | International Rectifier Corporation | Trench mosfet with field relief feature |
| JP2007221024A (ja) * | 2006-02-20 | 2007-08-30 | Toshiba Corp | 半導体装置 |
| US8004051B2 (en) * | 2009-02-06 | 2011-08-23 | Texas Instruments Incorporated | Lateral trench MOSFET having a field plate |
-
2010
- 2010-08-18 JP JP2010183398A patent/JP2012043955A/ja not_active Abandoned
-
2011
- 2011-03-03 CN CN2011100519452A patent/CN102376764A/zh active Pending
- 2011-03-22 EP EP11159170A patent/EP2421047A1/en not_active Withdrawn
- 2011-03-22 US US13/053,452 patent/US20120043606A1/en not_active Abandoned
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