JP2012032164A5 - - Google Patents

Download PDF

Info

Publication number
JP2012032164A5
JP2012032164A5 JP2010169338A JP2010169338A JP2012032164A5 JP 2012032164 A5 JP2012032164 A5 JP 2012032164A5 JP 2010169338 A JP2010169338 A JP 2010169338A JP 2010169338 A JP2010169338 A JP 2010169338A JP 2012032164 A5 JP2012032164 A5 JP 2012032164A5
Authority
JP
Japan
Prior art keywords
rays
ray
diffracted
sample
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010169338A
Other languages
English (en)
Japanese (ja)
Other versions
JP5788153B2 (ja
JP2012032164A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2010169338A external-priority patent/JP5788153B2/ja
Priority to JP2010169338A priority Critical patent/JP5788153B2/ja
Priority to GB1301244.8A priority patent/GB2495260B/en
Priority to US13/812,556 priority patent/US9518940B2/en
Priority to DE112011102492T priority patent/DE112011102492T5/de
Priority to CN201180036808.XA priority patent/CN103026215B/zh
Priority to PCT/JP2011/067278 priority patent/WO2012014982A1/ja
Publication of JP2012032164A publication Critical patent/JP2012032164A/ja
Publication of JP2012032164A5 publication Critical patent/JP2012032164A5/ja
Publication of JP5788153B2 publication Critical patent/JP5788153B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

JP2010169338A 2010-07-28 2010-07-28 X線回折方法及びそれを用いた可搬型x線回折装置 Expired - Fee Related JP5788153B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2010169338A JP5788153B2 (ja) 2010-07-28 2010-07-28 X線回折方法及びそれを用いた可搬型x線回折装置
CN201180036808.XA CN103026215B (zh) 2010-07-28 2011-07-28 X射线衍射方法以及使用该方法的便携式x射线衍射装置
US13/812,556 US9518940B2 (en) 2010-07-28 2011-07-28 X-ray diffraction method and portable X-ray diffraction apparatus using same
DE112011102492T DE112011102492T5 (de) 2010-07-28 2011-07-28 Röntgenbeugungsverfahren und tragbares Röntgenbeugungsgerät, das dieses verwendet
GB1301244.8A GB2495260B (en) 2010-07-28 2011-07-28 X-ray diffraction method and portable x-ray diffraction apparatus using same
PCT/JP2011/067278 WO2012014982A1 (ja) 2010-07-28 2011-07-28 X線回折方法及びそれを用いた可搬型x線回折装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010169338A JP5788153B2 (ja) 2010-07-28 2010-07-28 X線回折方法及びそれを用いた可搬型x線回折装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015001667A Division JP6084993B2 (ja) 2015-01-07 2015-01-07 X線回折方法及びそれを用いた可搬型x線回折装置

Publications (3)

Publication Number Publication Date
JP2012032164A JP2012032164A (ja) 2012-02-16
JP2012032164A5 true JP2012032164A5 (enExample) 2012-09-13
JP5788153B2 JP5788153B2 (ja) 2015-09-30

Family

ID=45530182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010169338A Expired - Fee Related JP5788153B2 (ja) 2010-07-28 2010-07-28 X線回折方法及びそれを用いた可搬型x線回折装置

Country Status (6)

Country Link
US (1) US9518940B2 (enExample)
JP (1) JP5788153B2 (enExample)
CN (1) CN103026215B (enExample)
DE (1) DE112011102492T5 (enExample)
GB (1) GB2495260B (enExample)
WO (1) WO2012014982A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5695589B2 (ja) * 2012-03-02 2015-04-08 株式会社リガク X線強度補正方法およびx線回折装置
CN102625555A (zh) * 2012-04-05 2012-08-01 无锡日联科技有限公司 一种可用于连续工作状态下的物理聚焦微焦点x射线源
KR20140145682A (ko) * 2013-06-13 2014-12-24 삼성전자주식회사 엑스선 영상 장치 및 그 제어방법
US10161887B2 (en) * 2015-01-20 2018-12-25 United Technologies Corporation Systems and methods for materials analysis
CN104897705B (zh) * 2015-06-26 2019-05-21 北京师范大学 一种识别液体种类的x射线衍射谱仪与方法
KR101867318B1 (ko) * 2016-11-23 2018-06-15 (주)이림전자 휴대용 엑스레이장치의 엑스레이 모듈 어셈블리
JP6776181B2 (ja) * 2017-05-31 2020-10-28 株式会社神戸製鋼所 応力測定方法
WO2019117276A1 (ja) * 2017-12-15 2019-06-20 株式会社堀場製作所 放射線検出器及び放射線検出装置
EP3885748A4 (en) * 2018-11-22 2022-10-19 Rigaku Corporation SAMPLE HOLDER OF A SINGLE-CRYSTAL X-RAY STRUCTURAL ANALYSIS DEVICE, SAMPLE HOLDER UNIT AND OCCLUSION METHOD

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2852682B2 (ja) * 1990-03-19 1999-02-03 マツダ株式会社 セラミック部品の強度測定法
US5497008A (en) * 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
JP2000146872A (ja) * 1998-11-17 2000-05-26 Rigaku Corp X線回折装置
JP2000314709A (ja) * 1999-04-30 2000-11-14 Agency Of Ind Science & Technol 結晶構造データと構成元素データを同時に計測するシステム及び方法
JP2001194325A (ja) * 2000-01-06 2001-07-19 Ours Tex Kk X線分析装置および方法
JP4777539B2 (ja) * 2001-05-29 2011-09-21 エスアイアイ・ナノテクノロジー株式会社 複合x線分析装置
US6697453B1 (en) * 2002-02-08 2004-02-24 Metscan Technologies, Llc Portable X-ray diffractometer
EP1660874B1 (en) 2003-08-04 2014-05-07 X-Ray Optical Systems, Inc. In-situ x-ray diffraction system using sources and detectors at fixed angular positions
JP3912606B2 (ja) 2004-10-26 2007-05-09 株式会社リガク X線薄膜検査装置と、プロダクトウエーハの薄膜検査装置およびその方法
US7321652B2 (en) * 2005-09-15 2008-01-22 Jordan Valley Semiconductors Ltd. Multi-detector EDXRD
WO2008097345A2 (en) * 2006-08-10 2008-08-14 X-Ray Optical Systems, Inc. Wide parallel beam diffraction imaging method and system
EP2260294A4 (en) * 2008-02-25 2012-02-08 X Ray Optical Sys Inc SAMPLE MODULE WITH SAMPLE FLOWS WINDOW SPLIT, FOR X-RAY ANALYSIS SYSTEM
JP5150316B2 (ja) * 2008-03-12 2013-02-20 理研計器株式会社 エックス線分析装置用支持台
GB0807474D0 (en) * 2008-04-24 2008-12-03 Durham Scient Crystals Ltd Determination of Composition of Liquids
US7646847B2 (en) 2008-05-01 2010-01-12 Bruker Axs Inc. Handheld two-dimensional X-ray diffractometer
JP2012013423A (ja) * 2010-06-29 2012-01-19 Nippon Steel Corp X線応力測定装置

Similar Documents

Publication Publication Date Title
JP2012032164A5 (enExample)
JP7418208B2 (ja) X線分光計及びその使用方法
JP6039093B2 (ja) 結晶学的結晶粒方位マッピング機能を有する実験室x線マイクロトモグラフィシステム
JP5990734B2 (ja) 蛍光x線分析装置
JP5525523B2 (ja) X線装置、その使用方法およびx線照射方法
JP6656519B2 (ja) X線回折装置
CN102253065A (zh) X射线衍射和计算机层析成像
JP2007501395A5 (enExample)
KR102179112B1 (ko) X선 회절장치
JPWO2015181961A1 (ja) 荷電粒子線分析装置および分析方法
CN103026215B (zh) X射线衍射方法以及使用该方法的便携式x射线衍射装置
JP2014021124A5 (enExample)
JP5081556B2 (ja) デバイシェラー光学系を備えたx線回折測定装置とそのためのx線回折測定方法
AU2017204869A1 (en) Methods and apparatus for x-ray diffraction
JP6709814B2 (ja) 高分解能x線回折方法および装置
JP5100063B2 (ja) X線分析装置
Szalóki et al. A novel confocal XRF-Raman spectrometer and FPM model for analysis of solid objects and liquid substances
JP2008058014A5 (enExample)
JP2023107744A (ja) X線吸収分光と蛍光x線分光分析を同時に実施するための方法およびシステム
JP2006038822A (ja) 蛍光x線分析装置
WO2003071257A1 (en) X-ray condenser
JP6732240B2 (ja) X線測定装置
JP2011149893A (ja) 微小部x線計測装置
US8472587B2 (en) Collimator with an adjustable focal length
JP2010197229A (ja) 蛍光x線分析装置