JP2011529273A5 - - Google Patents

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JP2011529273A5
JP2011529273A5 JP2011520089A JP2011520089A JP2011529273A5 JP 2011529273 A5 JP2011529273 A5 JP 2011529273A5 JP 2011520089 A JP2011520089 A JP 2011520089A JP 2011520089 A JP2011520089 A JP 2011520089A JP 2011529273 A5 JP2011529273 A5 JP 2011529273A5
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Japan
Prior art keywords
electrode
process kit
workpiece
pack
electrostatic chuck
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JP2011520089A
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JP5898955B2 (ja
JP2011529273A (ja
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JP2011520089A 2008-07-23 2009-07-13 プロセスキットリングへの制御されたｒｆ電力配分を有するプラズマリアクタ用ワークピースサポート Active JP5898955B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/178,032 2008-07-23
US12/178,032 US20100018648A1 (en) 2008-07-23 2008-07-23 Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring
PCT/US2009/050403 WO2010011521A2 (en) 2008-07-23 2009-07-13 Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring

Publications (3)

Publication Number Publication Date
JP2011529273A JP2011529273A (ja) 2011-12-01
JP2011529273A5 true JP2011529273A5 (https=) 2012-08-30
JP5898955B2 JP5898955B2 (ja) 2016-04-06

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JP2011520089A Active JP5898955B2 (ja) 2008-07-23 2009-07-13 プロセスキットリングへの制御されたｒｆ電力配分を有するプラズマリアクタ用ワークピースサポート

Country Status (7)

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US (1) US20100018648A1 (https=)
JP (1) JP5898955B2 (https=)
KR (1) KR101481377B1 (https=)
CN (1) CN102106191B (https=)
SG (1) SG192540A1 (https=)
TW (1) TWI494028B (https=)
WO (1) WO2010011521A2 (https=)

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