JP2011527024A5 - - Google Patents

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Publication number
JP2011527024A5
JP2011527024A5 JP2011516307A JP2011516307A JP2011527024A5 JP 2011527024 A5 JP2011527024 A5 JP 2011527024A5 JP 2011516307 A JP2011516307 A JP 2011516307A JP 2011516307 A JP2011516307 A JP 2011516307A JP 2011527024 A5 JP2011527024 A5 JP 2011527024A5
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JP
Japan
Prior art keywords
telecentricity
image plane
illuminator
local
correction
Prior art date
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Granted
Application number
JP2011516307A
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English (en)
Japanese (ja)
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JP5763534B2 (ja
JP2011527024A (ja
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Priority claimed from PCT/US2009/003795 external-priority patent/WO2010005491A1/en
Publication of JP2011527024A publication Critical patent/JP2011527024A/ja
Publication of JP2011527024A5 publication Critical patent/JP2011527024A5/ja
Application granted granted Critical
Publication of JP5763534B2 publication Critical patent/JP5763534B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011516307A 2008-06-30 2009-06-25 マイクロリソグラフィック投影システムのためのテレセントリシティ補正素子 Expired - Fee Related JP5763534B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US7688808P 2008-06-30 2008-06-30
US61/076,888 2008-06-30
PCT/US2009/003795 WO2010005491A1 (en) 2008-06-30 2009-06-25 Telecentricity corrector for microlithographic projection system

Publications (3)

Publication Number Publication Date
JP2011527024A JP2011527024A (ja) 2011-10-20
JP2011527024A5 true JP2011527024A5 (enExample) 2012-06-07
JP5763534B2 JP5763534B2 (ja) 2015-08-12

Family

ID=41168460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011516307A Expired - Fee Related JP5763534B2 (ja) 2008-06-30 2009-06-25 マイクロリソグラフィック投影システムのためのテレセントリシティ補正素子

Country Status (6)

Country Link
US (1) US8314922B2 (enExample)
EP (1) EP2310914B1 (enExample)
JP (1) JP5763534B2 (enExample)
KR (1) KR101624758B1 (enExample)
CN (1) CN102077143B (enExample)
WO (1) WO2010005491A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5763534B2 (ja) * 2008-06-30 2015-08-12 コーニング インコーポレイテッド マイクロリソグラフィック投影システムのためのテレセントリシティ補正素子
TWI708052B (zh) * 2011-08-29 2020-10-21 美商安美基公司 用於非破壞性檢測-流體中未溶解粒子之方法及裝置
JP6147058B2 (ja) * 2013-04-01 2017-06-14 キヤノン株式会社 ノズルチップの製造方法
US9188767B2 (en) 2013-11-04 2015-11-17 Christie Digital Systems Usa, Inc. Relay lens system for a high dynamic range projector
US9232172B2 (en) 2013-11-04 2016-01-05 Christie Digital Systems Usa, Inc. Two-stage light modulation for high dynamic range
CN107636539A (zh) * 2015-05-21 2018-01-26 卡尔蔡司Smt有限责任公司 微光刻投射设备的操作方法
US10088660B2 (en) 2017-02-10 2018-10-02 Amgen Inc. Imaging system for counting and sizing particles in fluid-filled vessels
JP2018151832A (ja) * 2017-03-13 2018-09-27 キヤノン株式会社 情報処理装置、情報処理方法、および、プログラム
WO2019082727A1 (ja) * 2017-10-24 2019-05-02 キヤノン株式会社 露光装置および物品の製造方法
JP2019079029A (ja) * 2017-10-24 2019-05-23 キヤノン株式会社 露光装置および物品の製造方法
EP3486866A1 (en) * 2017-11-15 2019-05-22 Thomson Licensing A method for processing a light field video based on the use of a super-rays representation
CN114391086B (zh) * 2019-09-04 2024-05-24 ams传感器新加坡私人有限公司 设计和构造用于三维传感器模块的点投影仪
CN113552774A (zh) * 2020-04-23 2021-10-26 上海微电子装备（集团）股份有限公司 照明光学系统、光刻机设备及曝光方法
EP4650875A1 (en) 2024-05-13 2025-11-19 ASML Netherlands B.V. Illumination uniformity correction apparatus with a transmissive correction plate with a varying parameter profile

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62266513A (ja) * 1986-05-14 1987-11-19 Canon Inc 投影露光光学系
US5461456A (en) * 1992-11-24 1995-10-24 General Signal Corporation Spatial uniformity varier for microlithographic illuminator
US5995263A (en) * 1993-11-12 1999-11-30 Nikon Corporation Projection exposure apparatus
US5739899A (en) * 1995-05-19 1998-04-14 Nikon Corporation Projection exposure apparatus correcting tilt of telecentricity
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
JP2000195778A (ja) * 1998-12-28 2000-07-14 Nikon Corp 露光装置及びテレセントリシティ―ムラ補正部材の製造方法
TWI283798B (en) * 2000-01-20 2007-07-11 Asml Netherlands Bv A microlithography projection apparatus
JP2002184676A (ja) 2000-12-18 2002-06-28 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2003203844A (ja) * 2002-01-08 2003-07-18 Nikon Corp 投影露光装置及び露光方法
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
WO2006029796A2 (en) * 2004-09-13 2006-03-23 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
US20090021830A1 (en) * 2005-09-14 2009-01-22 Carl Zeiss Smt Ag Projection lens of a microlithographic exposure system
US7646543B2 (en) 2006-05-05 2010-01-12 Corning Incorporated Distortion tuning of quasi-telecentric lens
JP5763534B2 (ja) * 2008-06-30 2015-08-12 コーニング インコーポレイテッド マイクロリソグラフィック投影システムのためのテレセントリシティ補正素子

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