JP2011515650A5 - - Google Patents

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Publication number
JP2011515650A5
JP2011515650A5 JP2010539427A JP2010539427A JP2011515650A5 JP 2011515650 A5 JP2011515650 A5 JP 2011515650A5 JP 2010539427 A JP2010539427 A JP 2010539427A JP 2010539427 A JP2010539427 A JP 2010539427A JP 2011515650 A5 JP2011515650 A5 JP 2011515650A5
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JP
Japan
Prior art keywords
zone
coating
collector mirror
electromagnetic radiation
temperature
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Pending
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JP2010539427A
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English (en)
Japanese (ja)
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JP2011515650A (ja
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Priority claimed from US12/004,871 external-priority patent/US7960701B2/en
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Publication of JP2011515650A publication Critical patent/JP2011515650A/ja
Publication of JP2011515650A5 publication Critical patent/JP2011515650A5/ja
Pending legal-status Critical Current

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JP2010539427A 2007-12-20 2008-12-05 Ｅｕｖ光源構成要素及びその製造、使用及び修復方法 Pending JP2011515650A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/004,871 US7960701B2 (en) 2007-12-20 2007-12-20 EUV light source components and methods for producing, using and refurbishing same
US12/004,871 2007-12-20
PCT/US2008/013416 WO2009085094A2 (en) 2007-12-20 2008-12-05 Euv light source components and methods for producing, using and refurbishing same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015027621A Division JP6013528B2 (ja) 2007-12-20 2015-02-16 Ｅｕｖ光源構成要素及びその製造、使用及び修復方法

Publications (2)

Publication Number Publication Date
JP2011515650A JP2011515650A (ja) 2011-05-19
JP2011515650A5 true JP2011515650A5 (enExample) 2012-01-26

Family

ID=40787486

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JP2010539427A Pending JP2011515650A (ja) 2007-12-20 2008-12-05 Ｅｕｖ光源構成要素及びその製造、使用及び修復方法
JP2015027621A Active JP6013528B2 (ja) 2007-12-20 2015-02-16 Ｅｕｖ光源構成要素及びその製造、使用及び修復方法

Family Applications After (1)

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JP2015027621A Active JP6013528B2 (ja) 2007-12-20 2015-02-16 Ｅｕｖ光源構成要素及びその製造、使用及び修復方法

Country Status (5)

Country Link
US (3) US7960701B2 (enExample)
EP (1) EP2232210A2 (enExample)
JP (2) JP2011515650A (enExample)
TW (1) TWI404461B (enExample)
WO (1) WO2009085094A2 (enExample)

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JP6751138B2 (ja) * 2016-04-27 2020-09-02 ギガフォトン株式会社 極端紫外光センサユニット及び極端紫外光生成装置
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WO2019043773A1 (ja) 2017-08-29 2019-03-07 ギガフォトン株式会社 極端紫外光生成装置
KR102775472B1 (ko) * 2018-04-26 2025-02-28 에이에스엠엘 네델란즈 비.브이. 컬렉터 미러 등의 미러를 테스트하기 위한 시스템 및 컬렉터 미러 등의 미러를 테스트하는 방법
JP7731247B2 (ja) * 2021-09-08 2025-08-29 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
KR20230048212A (ko) * 2021-10-01 2023-04-11 삼성전자주식회사 Euv 컬렉터 검사 장치 및 검사 방법
CN120457605A (zh) * 2023-02-06 2025-08-08 极光先进雷射株式会社 劣化估计方法、激光装置和电子器件的制造方法
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