JP2009506200A5 - - Google Patents

Info

Publication number
JP2009506200A5
JP2009506200A5 JP2008526067A JP2008526067A JP2009506200A5 JP 2009506200 A5 JP2009506200 A5 JP 2009506200A5 JP 2008526067 A JP2008526067 A JP 2008526067A JP 2008526067 A JP2008526067 A JP 2008526067A JP 2009506200 A5 JP2009506200 A5 JP 2009506200A5
Authority
JP
Japan
Prior art keywords
reflector
thin film
film layer
shadow mask
deposition substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008526067A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009506200A (ja
Filing date
Publication date
Priority claimed from US11/201,587 external-priority patent/US7615501B2/en
Application filed filed Critical
Publication of JP2009506200A publication Critical patent/JP2009506200A/ja
Publication of JP2009506200A5 publication Critical patent/JP2009506200A5/ja
Withdrawn legal-status Critical Current

Links

JP2008526067A 2005-08-11 2006-08-02 薄膜層の作成方法 Withdrawn JP2009506200A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/201,587 US7615501B2 (en) 2005-08-11 2005-08-11 Method for making a thin film layer
PCT/US2006/030067 WO2007021544A2 (en) 2005-08-11 2006-08-02 Method for making a thin film layer

Publications (2)

Publication Number Publication Date
JP2009506200A JP2009506200A (ja) 2009-02-12
JP2009506200A5 true JP2009506200A5 (enExample) 2009-09-17

Family

ID=37742820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008526067A Withdrawn JP2009506200A (ja) 2005-08-11 2006-08-02 薄膜層の作成方法

Country Status (5)

Country Link
US (1) US7615501B2 (enExample)
EP (1) EP1922433A2 (enExample)
JP (1) JP2009506200A (enExample)
CN (1) CN101287856B (enExample)
WO (1) WO2007021544A2 (enExample)

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US8034419B2 (en) 2004-06-30 2011-10-11 General Electric Company Method for making a graded barrier coating
US20090110892A1 (en) * 2004-06-30 2009-04-30 General Electric Company System and method for making a graded barrier coating
US8293323B2 (en) * 2007-02-23 2012-10-23 The Penn State Research Foundation Thin metal film conductors and their manufacture
US7884316B1 (en) 2007-03-21 2011-02-08 Saint-Gobain Ceramics & Plastics, Inc. Scintillator device
US7829857B2 (en) * 2008-04-17 2010-11-09 Menge Peter R Radiation detector device
KR100994118B1 (ko) * 2009-01-13 2010-11-15 삼성모바일디스플레이주식회사 유기 발광 소자 및 그 제조 방법
US8629523B2 (en) * 2010-04-16 2014-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Inserted reflective shield to improve quantum efficiency of image sensors
KR101846364B1 (ko) * 2011-07-29 2018-04-09 엘지이노텍 주식회사 광소자 패키지 및 그 제조 방법
JP2013115098A (ja) * 2011-11-25 2013-06-10 Sony Corp トランジスタ、トランジスタの製造方法、表示装置および電子機器
CN105821375A (zh) * 2012-01-12 2016-08-03 大日本印刷株式会社 蒸镀掩模的制造方法及有机半导体元件的制造方法
US9056432B2 (en) * 2012-04-25 2015-06-16 Johnson & Johnson Vision Care, Inc. High-density mask for three-dimensional substrates and methods for making the same
CN105453298B (zh) * 2013-08-19 2018-07-27 乐金显示有限公司 包括有机材料掩模的层压体以及使用其的有机发光装置的制造方法
KR102399575B1 (ko) * 2014-09-26 2022-05-19 삼성디스플레이 주식회사 증착 위치 정밀도 검사장치 및 그것을 이용한 증착 위치 정밀도 검사방법
CN117894856A (zh) 2020-04-26 2024-04-16 隆基绿能科技股份有限公司 一种太阳能电池金属电极及其制备方法
CN117230411B (zh) * 2023-06-29 2025-07-29 安徽熙泰智能科技有限公司 一种薄膜沉积装置及其沉积方法

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US3678889A (en) 1970-02-06 1972-07-25 Tokyo Shibaura Electric Co Reflector assembly for reflecting the vapors of high temperature volatile materials
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US6890627B2 (en) 2002-08-02 2005-05-10 Eastman Kodak Company Laser thermal transfer from a donor element containing a hole-transporting layer
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JP4924038B2 (ja) * 2004-11-02 2012-04-25 旭硝子株式会社 フルオロカーボン膜の製造方法
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