JP2011513772A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011513772A5 JP2011513772A5 JP2010547750A JP2010547750A JP2011513772A5 JP 2011513772 A5 JP2011513772 A5 JP 2011513772A5 JP 2010547750 A JP2010547750 A JP 2010547750A JP 2010547750 A JP2010547750 A JP 2010547750A JP 2011513772 A5 JP2011513772 A5 JP 2011513772A5
- Authority
- JP
- Japan
- Prior art keywords
- coating layer
- antireflection coating
- value
- antireflection
- antireflective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 43
- 239000011247 coating layer Substances 0.000 claims 39
- 239000010410 layer Substances 0.000 claims 32
- 239000006117 anti-reflective coating Substances 0.000 claims 30
- 229920000642 polymer Polymers 0.000 claims 13
- 239000000203 mixture Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 9
- 238000004377 microelectronic Methods 0.000 claims 8
- 239000002904 solvent Substances 0.000 claims 8
- 238000004132 cross linking Methods 0.000 claims 6
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 4
- 238000003384 imaging method Methods 0.000 claims 3
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 claims 2
- 230000002378 acidificating effect Effects 0.000 claims 2
- 150000001252 acrylic acid derivatives Chemical group 0.000 claims 2
- 150000001253 acrylic acids Chemical class 0.000 claims 2
- 229940116333 ethyl lactate Drugs 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 2
- 150000003440 styrenes Chemical class 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- 229920002554 vinyl polymer Polymers 0.000 claims 2
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US3083008P | 2008-02-22 | 2008-02-22 | |
| US61/030,830 | 2008-02-22 | ||
| PCT/US2009/034540 WO2009105556A2 (en) | 2008-02-22 | 2009-02-19 | Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011513772A JP2011513772A (ja) | 2011-04-28 |
| JP2011513772A5 true JP2011513772A5 (enExample) | 2011-06-16 |
| JP4918162B2 JP4918162B2 (ja) | 2012-04-18 |
Family
ID=40986181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010547750A Active JP4918162B2 (ja) | 2008-02-22 | 2009-02-19 | １９３ｎｍリソグラフィー用の二重層の感光性で現像液に可溶な底面反射防止塗膜 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9638999B2 (enExample) |
| EP (1) | EP2255377B1 (enExample) |
| JP (1) | JP4918162B2 (enExample) |
| KR (1) | KR101697789B1 (enExample) |
| CN (1) | CN101952936B (enExample) |
| TW (1) | TWI430051B (enExample) |
| WO (1) | WO2009105556A2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090098490A1 (en) * | 2007-10-16 | 2009-04-16 | Victor Pham | Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing |
| JP5840954B2 (ja) | 2009-02-19 | 2016-01-06 | ブルーワー サイエンス アイ エヌシー． | 酸感応性、現像剤可溶性の下層反射防止膜 |
| US8877430B2 (en) * | 2010-08-05 | 2014-11-04 | Brewer Science Inc. | Methods of producing structures using a developer-soluble layer with multilayer technology |
| JP5278406B2 (ja) * | 2010-11-02 | 2013-09-04 | 信越化学工業株式会社 | パターン形成方法 |
| JP6035887B2 (ja) | 2011-06-21 | 2016-11-30 | セントラル硝子株式会社 | ポジ型レジスト組成物 |
| JP5751173B2 (ja) * | 2012-01-05 | 2015-07-22 | 信越化学工業株式会社 | パターン形成方法 |
| JP6062878B2 (ja) * | 2014-03-07 | 2017-01-18 | 信越化学工業株式会社 | 化学増幅型ポジ型レジスト組成物及びレジストパターン形成方法 |
| US9229326B2 (en) * | 2014-03-14 | 2016-01-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for integrated circuit patterning |
| KR102222818B1 (ko) | 2014-10-06 | 2021-03-04 | 삼성전자주식회사 | 반도체 장치의 제조 방법 |
| JP6641687B2 (ja) * | 2014-12-01 | 2020-02-05 | 大日本印刷株式会社 | カラーフィルタの製造方法およびブラックマトリクス基板の製造方法 |
| WO2016179023A1 (en) * | 2015-05-01 | 2016-11-10 | Adarza Biosystems, Inc. | Methods and devices for the high-volume production of silicon chips with uniform anti-reflective coatings |
| US9768022B2 (en) * | 2016-01-27 | 2017-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Advanced cross-linkable layer over a substrate |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06230574A (ja) * | 1993-02-05 | 1994-08-19 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
| JPH09205057A (ja) * | 1996-01-25 | 1997-08-05 | Hitachi Ltd | 半導体装置の製造方法 |
| JP3189773B2 (ja) * | 1998-01-09 | 2001-07-16 | 三菱電機株式会社 | レジストパターン形成方法及びこれを用いた半導体装置の製造方法並びに半導体装置 |
| KR100421034B1 (ko) * | 1999-04-21 | 2004-03-04 | 삼성전자주식회사 | 레지스트 조성물과 이를 이용한 미세패턴 형성방법 |
| KR100337325B1 (ko) * | 1999-12-30 | 2002-05-22 | 이계안 | 엔진의 고압 연료 분사 장치의 소음 저감 브라켓트 |
| TW591341B (en) | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| US7265431B2 (en) * | 2002-05-17 | 2007-09-04 | Intel Corporation | Imageable bottom anti-reflective coating for high resolution lithography |
| US20050214674A1 (en) * | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
| US20050255410A1 (en) * | 2004-04-29 | 2005-11-17 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
| EP2592476A1 (en) * | 2004-05-14 | 2013-05-15 | Nissan Chemical Industries, Ltd. | Antireflective coating forming composition containing vinyl ether compound and polyimide |
| JP4466879B2 (ja) | 2004-12-03 | 2010-05-26 | 日産化学工業株式会社 | 二層型反射防止膜を用いたフォトレジストパターンの形成方法 |
| EP1691238A3 (en) * | 2005-02-05 | 2009-01-21 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| US7816071B2 (en) * | 2005-02-10 | 2010-10-19 | Az Electronic Materials Usa Corp. | Process of imaging a photoresist with multiple antireflective coatings |
| US20060177772A1 (en) * | 2005-02-10 | 2006-08-10 | Abdallah David J | Process of imaging a photoresist with multiple antireflective coatings |
| US7816069B2 (en) * | 2006-06-23 | 2010-10-19 | International Business Machines Corporation | Graded spin-on organic antireflective coating for photolithography |
-
2009
- 2009-02-19 US US12/389,135 patent/US9638999B2/en active Active
- 2009-02-19 CN CN2009801060149A patent/CN101952936B/zh active Active
- 2009-02-19 KR KR1020107021298A patent/KR101697789B1/ko active Active
- 2009-02-19 JP JP2010547750A patent/JP4918162B2/ja active Active
- 2009-02-19 EP EP09712806.0A patent/EP2255377B1/en active Active
- 2009-02-19 WO PCT/US2009/034540 patent/WO2009105556A2/en not_active Ceased
- 2009-02-23 TW TW98105594A patent/TWI430051B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011513772A5 (enExample) | ||
| US7838198B2 (en) | Photoresist compositions and method for multiple exposures with multiple layer resist systems | |
| JP6792547B2 (ja) | 素子のフォトリソグラフパターン化方法 | |
| CN100342283C (zh) | 使用第一最小值底部抗反射涂层组合物制备图像的方法 | |
| JP2012103679A5 (enExample) | ||
| US20140127625A1 (en) | Orthogonal solvents and compatible photoresists for the photolithographic patterning of organic electronic devices | |
| KR100876783B1 (ko) | 반도체 소자의 미세 패턴 형성 방법 | |
| JP5520103B2 (ja) | 二重露光プロセスにおけるレジスト・パターンの限界寸法変動を緩和する方法 | |
| TWI382277B (zh) | Photosensitive resin laminate | |
| JP2007284681A5 (enExample) | ||
| JP2012518812A5 (enExample) | ||
| WO2009105556A4 (en) | Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography | |
| TWI571706B (zh) | 使用於先進圖案化需求之微小特徵圖案化之方法 | |
| WO2011065207A1 (ja) | 感放射線性組成物及びレジストパターン形成方法 | |
| TWI425316B (zh) | 適於與上塗光阻併用之塗覆組成物 | |
| CN100570483C (zh) | 含有丙烯酸类聚合物的光刻用形成填隙材料的组合物 | |
| CN113075868A (zh) | 一种光刻胶图形化方法及双层光刻胶剥离方法 | |
| CN112320752A (zh) | 负性光刻胶图形化膜层的制备方法 | |
| JP2014073679A5 (enExample) | ||
| JP3825294B2 (ja) | レジストパターンの微細化方法及びその方法に用いるレジストパターン微細化用被覆形成液 | |
| JP4870622B2 (ja) | １９３ｎｍ波長光の上面反射防止ドライコーティング塗布のための無水マレイン酸ポリマーのフッ素化半エステル | |
| WO2020092963A1 (en) | Bottom-up conformal coating and photopatterning on pag-immobilized surfaces | |
| JP6371057B2 (ja) | パターン形成方法 | |
| JP2005222040A5 (enExample) | ||
| KR100611394B1 (ko) | 유기 반사 방지막 조성물 및 이를 이용한 포토레지스트의패턴 형성 방법 |