JP2011507309A5 - - Google Patents

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Publication number
JP2011507309A5
JP2011507309A5 JP2010539813A JP2010539813A JP2011507309A5 JP 2011507309 A5 JP2011507309 A5 JP 2011507309A5 JP 2010539813 A JP2010539813 A JP 2010539813A JP 2010539813 A JP2010539813 A JP 2010539813A JP 2011507309 A5 JP2011507309 A5 JP 2011507309A5
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JP
Japan
Prior art keywords
purge
wafer
storage container
container
purging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010539813A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011507309A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2008/087474 external-priority patent/WO2009079636A2/en
Publication of JP2011507309A publication Critical patent/JP2011507309A/ja
Publication of JP2011507309A5 publication Critical patent/JP2011507309A5/ja
Pending legal-status Critical Current

Links

JP2010539813A 2007-12-18 2008-12-18 基板の汚染を抑制するための方法および装置 Pending JP2011507309A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1470907P 2007-12-18 2007-12-18
PCT/US2008/087474 WO2009079636A2 (en) 2007-12-18 2008-12-18 Methods and apparatuses for controlling contamination of substrates

Publications (2)

Publication Number Publication Date
JP2011507309A JP2011507309A (ja) 2011-03-03
JP2011507309A5 true JP2011507309A5 (enExample) 2012-02-16

Family

ID=40796141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010539813A Pending JP2011507309A (ja) 2007-12-18 2008-12-18 基板の汚染を抑制するための方法および装置

Country Status (6)

Country Link
US (1) US20110114129A1 (enExample)
JP (1) JP2011507309A (enExample)
KR (1) KR20100102616A (enExample)
CN (1) CN101970315B (enExample)
TW (1) TW200948688A (enExample)
WO (1) WO2009079636A2 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7328727B2 (en) * 2004-04-18 2008-02-12 Entegris, Inc. Substrate container with fluid-sealing flow passageway
US9536763B2 (en) 2011-06-28 2017-01-03 Brooks Automation, Inc. Semiconductor stocker systems and methods
KR101147192B1 (ko) * 2011-11-11 2012-05-25 주식회사 엘에스테크 웨이퍼 표면상의 증착 이물 제거 장치
JP5527624B2 (ja) * 2012-01-05 2014-06-18 株式会社ダイフク 保管棚用の不活性ガス注入装置
US9381011B2 (en) 2012-03-29 2016-07-05 Depuy (Ireland) Orthopedic surgical instrument for knee surgery
CN103426792A (zh) * 2012-05-24 2013-12-04 上海宏力半导体制造有限公司 一种密封的n2清洗装置
JP6131534B2 (ja) * 2012-06-11 2017-05-24 シンフォニアテクノロジー株式会社 パージノズルユニット、ロードポート、載置台、ストッカー
US9412632B2 (en) * 2012-10-25 2016-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. Reticle pod
US9136149B2 (en) 2012-11-16 2015-09-15 Taiwan Semiconductor Manufacturing Company, Ltd. Loading port, system for etching and cleaning wafers and method of use
FR2999016A1 (fr) * 2012-11-30 2014-06-06 Adixen Vacuum Products Station et procede de mesure de la contamination en particules d'une enceinte de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs
TWI615334B (zh) * 2013-03-26 2018-02-21 Gudeng Precision Industrial Co., Ltd. 具有氣體導引裝置之光罩盒
CN103409814B (zh) * 2013-07-15 2016-05-18 东华大学 一种密封式吹干装置及方法
JP2018536984A (ja) 2015-10-05 2018-12-13 ブルックス シーシーエス ゲーエムベーハーＢｒｏｏｋｓ ＣＣＳ ＧｍｂＨ 半導体システムにおける湿度制御
JP6729115B2 (ja) * 2016-03-31 2020-07-22 株式会社ダイフク 容器収納設備
US10583983B2 (en) 2016-03-31 2020-03-10 Daifuku Co., Ltd. Container storage facility
JP2017210899A (ja) * 2016-05-24 2017-11-30 愛三工業株式会社 燃料通路構造
JP6631446B2 (ja) * 2016-09-09 2020-01-15 株式会社ダイフク 物品収納設備
US10741432B2 (en) * 2017-02-06 2020-08-11 Applied Materials, Inc. Systems, apparatus, and methods for a load port door opener
JP6347301B2 (ja) * 2017-04-06 2018-06-27 シンフォニアテクノロジー株式会社 ロードポート及びノズル駆動ユニット
KR102516885B1 (ko) * 2018-05-10 2023-03-30 삼성전자주식회사 증착 장비 및 이를 이용한 반도체 장치 제조 방법
JP6614278B2 (ja) * 2018-05-24 2019-12-04 シンフォニアテクノロジー株式会社 容器パージ装置
US11189511B2 (en) * 2018-10-26 2021-11-30 Applied Materials, Inc. Side storage pods, equipment front end modules, and methods for operating EFEMs
US11244844B2 (en) * 2018-10-26 2022-02-08 Applied Materials, Inc. High flow velocity, gas-purged, side storage pod apparatus, assemblies, and methods
US11373891B2 (en) 2018-10-26 2022-06-28 Applied Materials, Inc. Front-ducted equipment front end modules, side storage pods, and methods of operating the same
KR102479895B1 (ko) * 2020-07-03 2022-12-21 우범제 웨이퍼 수납용기
US12087605B2 (en) * 2020-09-30 2024-09-10 Gudeng Precision Industrial Co., Ltd. Reticle pod with antistatic capability
US11822257B2 (en) * 2021-03-12 2023-11-21 Gudeng Precision Industrial Co., Ltd. Reticle storage pod and method for securing reticle
JP2024533399A (ja) * 2021-09-09 2024-09-12 インテグリス・インコーポレーテッド 傾斜面を含むラッチを有するレチクルポッド
TWI805266B (zh) * 2022-03-11 2023-06-11 迅得機械股份有限公司 基板卡匣的載具及微型倉儲系統
FR3139904B1 (fr) * 2022-09-20 2024-08-30 Pfeiffer Vacuum Dispositif de mesure de la contamination gazeuse d’une enceinte de transport de substrats semi-conducteurs et procédé de mesure associé
US20250208526A1 (en) * 2023-12-26 2025-06-26 Entegris, Inc. Photolithography substrate with purge flow direction

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0552756A1 (en) * 1992-01-21 1993-07-28 Shinko Electric Co. Ltd. Article storage house in a clean room
US5746008A (en) * 1992-07-29 1998-05-05 Shinko Electric Co., Ltd. Electronic substrate processing system using portable closed containers
JP3226998B2 (ja) * 1992-12-04 2001-11-12 株式会社荏原製作所 二重シール容器構造
US6926017B2 (en) * 1998-01-09 2005-08-09 Entegris, Inc. Wafer container washing apparatus
EP1062468B1 (en) * 1998-03-09 2004-01-07 Convey Incorporated A package for storing contaminant-sensitive articles
TW522482B (en) * 2000-08-23 2003-03-01 Tokyo Electron Ltd Vertical heat treatment system, method for controlling vertical heat treatment system, and method for transferring object to be treated
JP3939101B2 (ja) * 2000-12-04 2007-07-04 株式会社荏原製作所 基板搬送方法および基板搬送容器
JP2003092345A (ja) * 2001-07-13 2003-03-28 Semiconductor Leading Edge Technologies Inc 基板収納容器、基板搬送システム、保管装置及びガス置換方法
KR100649926B1 (ko) * 2001-11-14 2006-11-27 로제 가부시키가이샤 웨이퍼 위치 결정 방법 및 장치, 처리 시스템, 웨이퍼위치 결정 장치의 웨이퍼 시트 회전 축선 위치 결정 방법
US7400383B2 (en) * 2005-04-04 2008-07-15 Entegris, Inc. Environmental control in a reticle SMIF pod

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