JP2018536984A - 半導体システムにおける湿度制御 - Google Patents
半導体システムにおける湿度制御 Download PDFInfo
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- JP2018536984A JP2018536984A JP2018517713A JP2018517713A JP2018536984A JP 2018536984 A JP2018536984 A JP 2018536984A JP 2018517713 A JP2018517713 A JP 2018517713A JP 2018517713 A JP2018517713 A JP 2018517713A JP 2018536984 A JP2018536984 A JP 2018536984A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
- F26B21/08—Humidity
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Ventilation (AREA)
Abstract
Description
Claims (12)
- 半導体基板(380)のための低湿度レベル(115)のクリーン環境(100)を形成するための方法であって、
湿度設定点(140)近辺の所定区間内または湿度設定点(140)に前記環境(100)を維持するために、湿度センサ(110)を用いて、前記環境(100)内の湿度レベル(115)を測定するステップと、前記設定点(140)近辺の前記所定区間内の値にまで、または前記設定点(140)にまで、前記湿度レベル(115)が低下するまで、前記環境(100)にガス(120)を供給するステップと、を含み、このとき、第1の環境内の湿度が、前記設定点近辺の前記所定区間内の値にまで、または前記設定点にまで低下するまで、前記第1の環境を低湿度ガスでパージし、前記第1の環境内に形成された第2の環境を、第2のパージガスでパージする、方法。 - 前記環境(100)内の前記ガス(120,130)を、再循環させる、請求項1に記載の方法。
- 前記再循環ガス流(120,130)に結合した減湿アセンブリ(160)によって、戻りガス流(120)における湿度レベル(115)を低下させる、請求項2に記載の方法。
- 前記湿度レベル(115)が所定の閾値を超えているときには、フレッシュ乾燥ガス(170)を添加する、請求項1〜3のいずれか1項に記載の方法。
- 前記湿度レベル(115)は、
前記環境内のガスから、または、
前記供給したガスの排気中のガス(130)から、または、
減圧速度から、測定する、請求項1〜4のいずれか1項に記載の方法。 - 前記環境(100)を、搬送する半導体基板(380)収納用の容器(300)内に形成するか、または前記環境(100)を、搬送する半導体基板収納用もしくは容器(480)収納用の室(400)内に形成する、請求項1〜5のいずれか1項に記載の方法。
- 前記環境(100)は、容器(480)を処理するための室(400)内に形成されるものであり、当該方法は、
容器(480)を、前記室(400)内に供給するステップ(200)であって、特に前記室内に配置または導入するステップと、
前記容器(480)を、表面汚染物質を除去するために洗浄するステップ(200)と、
前記湿度レベル(115)が、前記設定点(140)近辺の前記所定区間内の値に達するまで、または前記設定点(140)に達するまで、前記室(400)内を排気することと、前記室(400)内にパージガスを供給することにより、前記室(400)内の湿気を除去するステップ(210)と、を含む、請求項1〜6のいずれか1項に記載の方法。 - 前記室(400)内の前記低湿度状態を、所定時間にわたって維持する(220)、請求項7に記載の方法。
- 前記環境(100)は、半導体基板(380)を収納するための容器(300)内に形成されるものであり、当該方法は、
前記容器を洗浄し、さらに/または前記容器(300)を乾燥させるステップ(240)と、
前記湿度レベル(115)が、前記設定点(140)近辺の前記所定区間内の値に達するまで、または前記設定点(140)に達するまで、前記容器(300)の内部をガス流でパージするステップ(250)と、を含む、請求項1〜8のいずれか1項に記載の方法。 - 前記第1の環境は、容器(1041)を収納するためのストッカ(1000)内に形成されるものであり、前記第2の環境は、半導体基板(1080)を収納するための容器(1041)内に形成されるものである、請求項1に記載の方法。
- 半導体基板のための低湿度レベル(115)のクリーン環境(100)を形成するためのシステムであって、
湿度設定点(140)近辺の所定区間内または湿度設定点(140)に前記環境を維持するために、前記環境(100)内の湿度レベル(115)を測定するように構成された湿度センサ(110)と、前記設定点(140)近辺の前記所定区間内の値にまで、または前記設定点(140)にまで、前記湿度レベル(115)が低下するまで、前記環境(100)にガス(120)を供給するように構成された機構と、を備え、当該システムは、さらに、第1の環境内の湿度が、前記設定点(140)近辺の前記所定区間内の値にまで、または前記設定点(140)にまで低下するまで、低湿度ガスでパージするように構成された手段によって、容器(1041)を収納するためのストッカ(1000)内に前記第1の環境を形成するように構成されており、さらに、第2のパージガスでパージするように構成された手段によって、半導体基板(1080)を収納するための容器(1041)内に第2の環境を形成するように構成されている、システム。 - 前記環境(100)を、搬送する半導体基板(380)収納用の容器(300)内に、または搬送する半導体基板収納用もしくは容器(480)収納用の室(400)内に形成するように構成されている、請求項11に記載のシステム。
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JP2022004384A JP7372362B2 (ja) | 2015-10-05 | 2022-01-14 | 半導体システムにおける湿度制御 |
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US201562236990P | 2015-10-05 | 2015-10-05 | |
US62/236,990 | 2015-10-05 | ||
PCT/EP2016/073750 WO2017060278A1 (en) | 2015-10-05 | 2016-10-05 | Humidity control in semiconductor systems |
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JP2022004384A Division JP7372362B2 (ja) | 2015-10-05 | 2022-01-14 | 半導体システムにおける湿度制御 |
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JP2022004384A Active JP7372362B2 (ja) | 2015-10-05 | 2022-01-14 | 半導体システムにおける湿度制御 |
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US (1) | US20180286726A1 (ja) |
EP (1) | EP3360156B1 (ja) |
JP (2) | JP2018536984A (ja) |
KR (1) | KR20180059914A (ja) |
CN (1) | CN108431941B (ja) |
TW (1) | TWI780030B (ja) |
WO (1) | WO2017060278A1 (ja) |
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2016
- 2016-10-05 WO PCT/EP2016/073750 patent/WO2017060278A1/en active Application Filing
- 2016-10-05 TW TW105132268A patent/TWI780030B/zh active
- 2016-10-05 EP EP16790890.4A patent/EP3360156B1/en active Active
- 2016-10-05 JP JP2018517713A patent/JP2018536984A/ja active Pending
- 2016-10-05 US US15/765,855 patent/US20180286726A1/en active Pending
- 2016-10-05 CN CN201680058049.XA patent/CN108431941B/zh active Active
- 2016-10-05 KR KR1020187012331A patent/KR20180059914A/ko not_active Application Discontinuation
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2020151833A (ja) * | 2019-03-22 | 2020-09-24 | オークマ株式会社 | 水分侵入検知システムおよび水分侵入検知方法 |
JP7198133B2 (ja) | 2019-03-22 | 2022-12-28 | オークマ株式会社 | 水分侵入検知システムおよび水分侵入検知方法 |
US12005569B2 (en) | 2019-03-22 | 2024-06-11 | Okuma Corporation | Moisture intrusion detection system and moisture intrusion detection method |
WO2022137438A1 (ja) * | 2020-12-24 | 2022-06-30 | 太陽誘電株式会社 | 匂い検出装置及び匂い検出方法 |
CN116967939A (zh) * | 2023-09-22 | 2023-10-31 | 大儒科技(苏州)有限公司 | 一种打磨抛光专用力控制系统 |
CN116967939B (zh) * | 2023-09-22 | 2023-12-26 | 大儒科技(苏州)有限公司 | 一种打磨抛光专用力控制系统 |
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WO2017060278A1 (en) | 2017-04-13 |
TWI780030B (zh) | 2022-10-11 |
TW201724325A (zh) | 2017-07-01 |
JP2022050623A (ja) | 2022-03-30 |
CN108431941B (zh) | 2023-05-12 |
EP3360156C0 (en) | 2023-08-30 |
US20180286726A1 (en) | 2018-10-04 |
EP3360156A1 (en) | 2018-08-15 |
KR20180059914A (ko) | 2018-06-05 |
CN108431941A (zh) | 2018-08-21 |
EP3360156B1 (en) | 2023-08-30 |
JP7372362B2 (ja) | 2023-10-31 |
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