JP2011226817A - 接続基板 - Google Patents
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- JP2011226817A JP2011226817A JP2010094234A JP2010094234A JP2011226817A JP 2011226817 A JP2011226817 A JP 2011226817A JP 2010094234 A JP2010094234 A JP 2010094234A JP 2010094234 A JP2010094234 A JP 2010094234A JP 2011226817 A JP2011226817 A JP 2011226817A
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- 230000005855 radiation Effects 0.000 claims abstract description 124
- 239000004020 conductor Substances 0.000 claims abstract description 68
- 239000010410 layer Substances 0.000 claims abstract description 49
- 239000011229 interlayer Substances 0.000 claims abstract description 42
- 238000010030 laminating Methods 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 44
- 238000006243 chemical reaction Methods 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 abstract description 11
- 230000003071 parasitic effect Effects 0.000 abstract description 8
- 230000000149 penetrating effect Effects 0.000 abstract description 6
- 230000035515 penetration Effects 0.000 abstract description 3
- 239000003990 capacitor Substances 0.000 description 9
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000010354 integration Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2018—Scintillation-photodiode combinations
- G01T1/20184—Detector read-out circuitry, e.g. for clearing of traps, compensating for traps or compensating for direct hits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2018—Scintillation-photodiode combinations
- G01T1/20188—Auxiliary details, e.g. casings or cooling
- G01T1/2019—Shielding against direct hits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14623—Optical shielding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14634—Assemblies, i.e. Hybrid structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14661—X-ray, gamma-ray or corpuscular radiation imagers of the hybrid type
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14663—Indirect radiation imagers, e.g. using luminescent members
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/0218—Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
- H05K1/025—Impedance arrangements, e.g. impedance matching, reduction of parasitic impedance
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
- H05K1/0242—Structural details of individual signal conductors, e.g. related to the skin effect
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
- H05K1/112—Pads for surface mounting, e.g. lay-out directly combined with via connections
- H05K1/113—Via provided in pad; Pad over filled via
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
- H05K2201/09727—Varying width along a single conductor; Conductors or pads having different widths
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10431—Details of mounted components
- H05K2201/10507—Involving several components
- H05K2201/10545—Related components mounted on both sides of the PCB
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
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- Measurement Of Radiation (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
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Abstract
【解決手段】接続基板13は、複数の誘電体層130a〜130fが積層されて成る基材130と、互いに隣接する誘電体層130c〜130fを貫通して設けられた複数の貫通導体20とを備える。複数の貫通導体20それぞれと一体に形成されると共に互いに離間された複数の放射線遮蔽膜21a〜23aが、誘電体層130c〜130fにおける二以上の層間部分に設けられている。一の層間部分において一の貫通導体20と一体に形成された放射線遮蔽膜21a(21b)を所定方向に垂直な仮想平面に投影した領域PR1と、他の層間部分において他の貫通導体20と一体に形成された放射線遮蔽膜22b又は22c(22c)を仮想平面に投影した領域とは互いに重ならない。
【選択図】図2
Description
Claims (4)
- 所定方向から入射する放射線を光に変換するシンチレータからの光を二次元状に配列された複数の光電変換領域に受ける光電変換デバイスを一方の板面上に搭載し、前記光電変換デバイスの前記複数の光電変換領域それぞれから出力される電気信号を複数の読出回路により個別に読み出す集積回路デバイスを他方の板面上に搭載するための接続基板であって、
複数の誘電体層が積層されて成る基材と、
前記複数の誘電体層のうち、互いに隣接する少なくとも三つの前記誘電体層を貫通して設けられ、前記電気信号の経路の一部となる金属製の複数の貫通導体と
を備え、
前記複数の貫通導体それぞれと一体に形成されると共に互いに離間された金属製の複数の放射線遮蔽膜が、前記少なくとも三つの誘電体層における二以上の層間部分に設けられており、
一の前記層間部分において一の前記貫通導体と一体に形成された前記放射線遮蔽膜を前記所定方向に垂直な仮想平面に投影した領域と、他の前記層間部分において他の前記貫通導体と一体に形成された前記放射線遮蔽膜を前記仮想平面に投影した領域とが互いに重ならないことを特徴とする、接続基板。 - 放射線を光に変換するシンチレータからの光を二次元状に配列された複数の光電変換領域に受ける光電変換デバイスを一方の板面上に搭載し、前記光電変換デバイスの前記複数の光電変換領域それぞれから出力される電気信号を複数の読出回路により個別に読み出す集積回路デバイスを他方の板面上に搭載するための接続基板であって、
複数の誘電体層が積層されて成る基材と、
前記複数の誘電体層のうち、互いに隣接する少なくとも三つの前記誘電体層を貫通して設けられ、前記電気信号の経路の一部となる金属製の複数の貫通導体と
を備え、
前記複数の貫通導体それぞれと一体に形成されると共に互いに離間された金属製の複数の放射線遮蔽膜が、前記少なくとも三つの誘電体層における二以上の層間部分に設けられており、
一の前記層間部分において一の前記貫通導体と一体に形成された前記放射線遮蔽膜を前記一方の板面に平行な仮想平面に投影した領域と、他の前記層間部分において他の前記貫通導体と一体に形成された前記放射線遮蔽膜を前記仮想平面に投影した領域とが互いに重ならないことを特徴とする、接続基板。 - 前記複数の誘電体層における層間部分のうち、前記少なくとも三つの誘電体層に対して前記一方の板面側に位置する一又は二以上の前記層間部分に、前記光電変換デバイスの電極ピッチと前記複数の貫通導体のピッチとの相違に起因する層間配線が設けられていることを特徴とする、請求項1または2に記載の接続基板。
- 各放射線遮蔽膜が、対応する各貫通導体の周囲に延在していることを特徴とする、請求項1〜3のいずれか一項に記載の接続基板。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010094234A JP5868575B2 (ja) | 2010-04-15 | 2010-04-15 | 接続基板 |
US13/640,395 US9000388B2 (en) | 2010-04-15 | 2011-01-27 | Connection substrate |
CN201180019155.4A CN102870006B (zh) | 2010-04-15 | 2011-01-27 | 连接基板 |
PCT/JP2011/051624 WO2011129133A1 (ja) | 2010-04-15 | 2011-01-27 | 接続基板 |
EP11768655.0A EP2560027B1 (en) | 2010-04-15 | 2011-01-27 | Connection substrate |
TW100104320A TWI520352B (zh) | 2010-04-15 | 2011-02-09 | Connect the substrate |
IL222083A IL222083A (en) | 2010-04-15 | 2012-09-23 | Connection layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010094234A JP5868575B2 (ja) | 2010-04-15 | 2010-04-15 | 接続基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011226817A true JP2011226817A (ja) | 2011-11-10 |
JP5868575B2 JP5868575B2 (ja) | 2016-02-24 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010094234A Active JP5868575B2 (ja) | 2010-04-15 | 2010-04-15 | 接続基板 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9000388B2 (ja) |
EP (1) | EP2560027B1 (ja) |
JP (1) | JP5868575B2 (ja) |
CN (1) | CN102870006B (ja) |
IL (1) | IL222083A (ja) |
TW (1) | TWI520352B (ja) |
WO (1) | WO2011129133A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012118073A (ja) * | 2010-11-30 | 2012-06-21 | General Electric Co <Ge> | スルービアインターポーザを有する検出器アレイ |
KR20150035461A (ko) * | 2013-09-27 | 2015-04-06 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 웨이퍼 레벨 적층을 이용한 듀얼 페이싱 bsi 이미지 센서들 |
JP2018205031A (ja) * | 2017-05-31 | 2018-12-27 | 東芝電子管デバイス株式会社 | 放射線検出器 |
JP2019027887A (ja) * | 2017-07-28 | 2019-02-21 | 京セラ株式会社 | 検出素子搭載用基板、検出装置および検出モジュール |
US11532524B2 (en) | 2020-07-27 | 2022-12-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated circuit test method and structure thereof |
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US8242375B2 (en) * | 2008-09-18 | 2012-08-14 | United Technologies Corporation | Conductive emissions protection |
US9198293B2 (en) * | 2013-01-16 | 2015-11-24 | Intel Corporation | Non-cylindrical conducting shapes in multilayer laminated substrate cores |
US9526468B2 (en) * | 2014-09-09 | 2016-12-27 | General Electric Company | Multiple frame acquisition for exposure control in X-ray medical imagers |
CN105528598B (zh) * | 2014-09-29 | 2019-03-29 | 上海箩箕技术有限公司 | 光学指纹传感器 |
DE102014221829B4 (de) * | 2014-10-27 | 2018-02-22 | Siemens Healthcare Gmbh | Verfahren zur Herstellung eines Sensorboards für ein Detektormodul und damit hergestelltes Detektormodul |
CN107646091B (zh) * | 2015-04-14 | 2019-11-15 | 模拟技术公司 | 用于辐射系统的探测器阵列 |
JP7080579B2 (ja) * | 2016-12-02 | 2022-06-06 | 凸版印刷株式会社 | 電子部品製造方法 |
US10473798B2 (en) * | 2017-06-16 | 2019-11-12 | Varex Imaging Corporation | Counting and integrating pixels, detectors, and methods |
JP7048722B2 (ja) * | 2018-03-27 | 2022-04-05 | 富士フイルム株式会社 | 放射線検出器及び放射線画像撮影装置 |
TW201945346A (zh) | 2018-04-10 | 2019-12-01 | 德商拜耳廠股份有限公司 | 2,4,5-三取代的1,2,4-三唑酮之製備方法 |
JP7449264B2 (ja) * | 2021-08-18 | 2024-03-13 | 株式会社東芝 | 放射線検出器 |
FR3131431B1 (fr) * | 2021-12-28 | 2024-03-22 | Trixell | Détecteur photosensible matriciel et procédé de réalisation du détecteur photosensible |
US11740367B2 (en) | 2022-01-07 | 2023-08-29 | Analogic Corporation | Radiation detectors for scanning systems, and related scanning systems |
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JP2003014862A (ja) * | 2001-07-02 | 2003-01-15 | Canon Inc | 放射線画像検出装置及び放射線遮蔽方法 |
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JP2005539232A (ja) * | 2002-09-18 | 2005-12-22 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 複数の検出器ユニットを有するx線検出器 |
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JP4421209B2 (ja) * | 2003-04-11 | 2010-02-24 | 浜松ホトニクス株式会社 | 放射線検出器 |
JP2007515794A (ja) * | 2003-12-22 | 2007-06-14 | エックストゥーワイ アテニュエイターズ,エルエルシー | 内部で遮蔽されたエネルギー調節器 |
JP4722104B2 (ja) * | 2007-09-21 | 2011-07-13 | 京セラ株式会社 | X線検出素子搭載用配線基板およびx線検出装置 |
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- 2011-01-27 EP EP11768655.0A patent/EP2560027B1/en active Active
- 2011-01-27 US US13/640,395 patent/US9000388B2/en active Active
- 2011-01-27 WO PCT/JP2011/051624 patent/WO2011129133A1/ja active Application Filing
- 2011-01-27 CN CN201180019155.4A patent/CN102870006B/zh active Active
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KR101649797B1 (ko) | 2013-09-27 | 2016-08-19 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 웨이퍼 레벨 적층을 이용한 듀얼 페이싱 bsi 이미지 센서들 |
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Also Published As
Publication number | Publication date |
---|---|
US20130032389A1 (en) | 2013-02-07 |
WO2011129133A1 (ja) | 2011-10-20 |
EP2560027B1 (en) | 2015-01-21 |
EP2560027A4 (en) | 2013-11-20 |
TWI520352B (zh) | 2016-02-01 |
IL222083A (en) | 2015-05-31 |
CN102870006B (zh) | 2016-04-27 |
US9000388B2 (en) | 2015-04-07 |
JP5868575B2 (ja) | 2016-02-24 |
TW201143104A (en) | 2011-12-01 |
EP2560027A1 (en) | 2013-02-20 |
CN102870006A (zh) | 2013-01-09 |
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