JP2011176312A5 - - Google Patents

Download PDF

Info

Publication number
JP2011176312A5
JP2011176312A5 JP2011033127A JP2011033127A JP2011176312A5 JP 2011176312 A5 JP2011176312 A5 JP 2011176312A5 JP 2011033127 A JP2011033127 A JP 2011033127A JP 2011033127 A JP2011033127 A JP 2011033127A JP 2011176312 A5 JP2011176312 A5 JP 2011176312A5
Authority
JP
Japan
Prior art keywords
light
pupil
region
order diffracted
partial region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011033127A
Other languages
English (en)
Japanese (ja)
Other versions
JP5691608B2 (ja
JP2011176312A (ja
Filing date
Publication date
Priority claimed from US13/011,320 external-priority patent/US9389519B2/en
Application filed filed Critical
Publication of JP2011176312A publication Critical patent/JP2011176312A/ja
Publication of JP2011176312A5 publication Critical patent/JP2011176312A5/ja
Application granted granted Critical
Publication of JP5691608B2 publication Critical patent/JP5691608B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011033127A 2010-02-25 2011-02-18 瞳透過率分布の測定方法および測定装置、露光方法および露光装置、並びにデバイス製造方法 Active JP5691608B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US30808710P 2010-02-25 2010-02-25
US61/308,087 2010-02-25
US13/011,320 2011-01-21
US13/011,320 US9389519B2 (en) 2010-02-25 2011-01-21 Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015010485A Division JP5862992B2 (ja) 2010-02-25 2015-01-22 光学系の測定方法、露光装置の制御方法、露光方法、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011176312A JP2011176312A (ja) 2011-09-08
JP2011176312A5 true JP2011176312A5 (enExample) 2014-04-03
JP5691608B2 JP5691608B2 (ja) 2015-04-01

Family

ID=44476238

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011033127A Active JP5691608B2 (ja) 2010-02-25 2011-02-18 瞳透過率分布の測定方法および測定装置、露光方法および露光装置、並びにデバイス製造方法
JP2015010485A Active JP5862992B2 (ja) 2010-02-25 2015-01-22 光学系の測定方法、露光装置の制御方法、露光方法、およびデバイス製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015010485A Active JP5862992B2 (ja) 2010-02-25 2015-01-22 光学系の測定方法、露光装置の制御方法、露光方法、およびデバイス製造方法

Country Status (5)

Country Link
US (1) US9389519B2 (enExample)
JP (2) JP5691608B2 (enExample)
KR (1) KR20130054942A (enExample)
TW (4) TWI630378B (enExample)
WO (1) WO2011105307A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105258922B (zh) * 2009-10-20 2018-10-19 株式会社尼康 用于测量波前像差的方法和波前像差测量设备
CN102620917A (zh) * 2012-04-11 2012-08-01 长春理工大学 透射式光学元件光致热变形像质分析方法
CN104395985B (zh) * 2012-05-02 2018-01-30 株式会社尼康 光瞳亮度分布的评价方法和改善方法、照明光学系统及其调整方法、曝光装置、曝光方法以及器件制造方法
JP5969848B2 (ja) * 2012-07-19 2016-08-17 キヤノン株式会社 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法
DE102013204466A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Messung einer optischen Symmetrieeigenschaft an einer Projektionsbelichtungsanlage
US11402629B2 (en) 2013-11-27 2022-08-02 Magic Leap, Inc. Separated pupil optical systems for virtual and augmented reality and methods for displaying images using same
KR102283654B1 (ko) * 2014-11-14 2021-07-29 가부시키가이샤 니콘 조형 장치 및 조형 방법
KR102708502B1 (ko) 2015-05-04 2024-09-20 매직 립, 인코포레이티드 가상 및 증강 현실을 위한 분리된 동공 광학 시스템들 및 이를 사용하여 이미지들을 디스플레이하기 위한 방법들
KR102598505B1 (ko) * 2015-05-20 2023-11-06 칼 짜이스 에스엠테 게엠베하 이미징 광학 시스템용 측정 방법 및 측정 배열체
DE102016212477A1 (de) * 2016-07-08 2018-01-11 Carl Zeiss Smt Gmbh Messverfahren und Messsystem zur interferometrischen Vermessung der Abbildungsqualität eines optischen Abbildungssystems
DE102017221005A1 (de) * 2017-11-23 2019-05-23 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Kalibrierung einer diffraktiven Messstruktur
CN110243572B (zh) * 2019-06-28 2021-07-27 中兴光电子技术有限公司 一种光波导群折射率测试装置和方法
CN113552773B (zh) * 2020-04-23 2023-02-10 上海微电子装备（集团）股份有限公司 光刻机、瞳面透过率分布检测装置及检测方法
US20240085268A1 (en) * 2022-09-14 2024-03-14 National Central University Optical wavefront measuring device and measuring method thereof

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2385241A1 (fr) * 1976-12-23 1978-10-20 Marie G R P Convertisseurs de mode de polarisation pour faisceaux laser et generateurs de plasma les utilisant
JPH053300A (ja) 1990-10-05 1993-01-08 Nippon Steel Corp 半導体装置
JP2633091B2 (ja) * 1991-02-22 1997-07-23 キヤノン株式会社 像投影方法、回路製造方法及び投影露光装置
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
JP3102086B2 (ja) * 1991-10-08 2000-10-23 株式会社ニコン 投影露光装置及び方法、並びに回路素子形成方法
JP3318620B2 (ja) * 1992-01-28 2002-08-26 株式会社ニコン 投影光学系の特性計測方法、並びに露光方法及び装置
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
RU2084941C1 (ru) 1996-05-06 1997-07-20 Йелстаун Корпорейшн Н.В. Адаптивный оптический модуль
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP3302965B2 (ja) 2000-02-15 2002-07-15 株式会社東芝 露光装置の検査方法
TW550377B (en) 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection
JP4230676B2 (ja) 2001-04-27 2009-02-25 株式会社東芝 露光装置の照度むらの測定方法、照度むらの補正方法、半導体デバイスの製造方法及び露光装置
EP1422562B1 (en) 2001-08-31 2013-04-17 Canon Kabushiki Kaisha Reticle and optical characteristic measuring method
JP4307813B2 (ja) 2001-11-14 2009-08-05 株式会社リコー 光偏向方法並びに光偏向装置及びその光偏向装置の製造方法並びにその光偏向装置を具備する光情報処理装置及び画像形成装置及び画像投影表示装置及び光伝送装置
US6900915B2 (en) 2001-11-14 2005-05-31 Ricoh Company, Ltd. Light deflecting method and apparatus efficiently using a floating mirror
JP4182277B2 (ja) * 2002-03-04 2008-11-19 富士通マイクロエレクトロニクス株式会社 マスク、有効光路の測定方法、及び露光装置
JP4324957B2 (ja) 2002-05-27 2009-09-02 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2004304135A (ja) 2003-04-01 2004-10-28 Nikon Corp 露光装置、露光方法及びマイクロデバイスの製造方法
EP1620350A1 (en) 2003-04-24 2006-02-01 Metconnex Canada Inc. A micro-electro-mechanical-system two dimensional mirror with articulated suspension structures for high fill factor arrays
US7095546B2 (en) 2003-04-24 2006-08-22 Metconnex Canada Inc. Micro-electro-mechanical-system two dimensional mirror with articulated suspension structures for high fill factor arrays
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
JP2005159213A (ja) * 2003-11-28 2005-06-16 Canon Inc シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
CN101793993B (zh) 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 光学元件、光学布置及系统
US20070195676A1 (en) 2004-01-16 2007-08-23 Koninklijke Philips Electronic, N.V. Optical system
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
WO2005119368A2 (en) 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
EP1621930A3 (en) * 2004-07-29 2011-07-06 Carl Zeiss SMT GmbH Illumination system for a microlithographic projection exposure apparatus
JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
JP4335114B2 (ja) 2004-10-18 2009-09-30 日本碍子株式会社 マイクロミラーデバイス
TWI423301B (zh) 2005-01-21 2014-01-11 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
EP1843204A1 (en) 2005-01-25 2007-10-10 Nikon Corporation Exposure device, exposure method, and micro device manufacturing method
DE102006015213A1 (de) 2006-03-30 2007-10-11 Carl Zeiss Smt Ag Polarisationsbeeinflussende optische Anordnung
JP5197304B2 (ja) * 2008-10-30 2013-05-15 キヤノン株式会社 露光装置およびデバイス製造方法

Similar Documents

Publication Publication Date Title
JP2011176312A5 (enExample)
JP2018529952A5 (enExample)
EP2937035A4 (en) DEVICE AND METHOD FOR DETECTING AND QUANTIFYING VARIATIONS FOR EYE DAMAGE CAUSED BY BLUE AND VIOLET LIGHT IN THE VISIBLE SPECTRUM
MY182409A (en) Surface inspection method and surface inspection apparatus
RU2013143824A (ru) Устройство измерения оптических характеристик и способ измерения оптических характеристик
FR2975771B1 (fr) Dispositif de mesure d'une piece dans une turbomachine
EP2881726A4 (en) LIGHTINDUCED FLUORESCENT MEASUREMENT DEVICE
BR112013026969A2 (pt) processo de simulação de operações de controle não destrutivo em condições reais que utiliza sinais sintéticos
FR2984491B1 (fr) Mesure par interferometrie atomique
JP2014045908A5 (enExample)
EP2685237A4 (en) OPTICAL CHARACTERISTICS
JP2010161261A5 (enExample)
JP2014190705A5 (enExample)
BR112013031035A2 (pt) inspeção com radiação múltipla de lentes oftálmicas
WO2013139483A3 (en) Measuring system for measuring an imaging quality of an euv lens
JP2016536576A5 (enExample)
EP2876432A4 (en) LIGHT MEASURING DEVICE FOR REACTION VESSEL AND LIGHT MEASUREMENT METHOD
WO2014056708A3 (en) Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method
EP2678946A4 (en) METHOD AND DEVICE FOR INTERFERENCE MEASUREMENT AND REACTION
JP2013171154A5 (enExample)
EP2708856A4 (en) DEVICE AND METHOD FOR MEASURING THE DISTRIBUTION OF PHYSICAL QUANTITIES IN A GLASS FIBER
WO2009028332A1 (ja) 波面収差計測装置および方法、並びに波面収差調整方法
FR2988473B1 (fr) Procede et appareil de caracterisation d'echantillons par mesure de la diffusion lumineuse et de la fluorescence.
FR2970776B1 (fr) Dispositif de mesure de la temperature d'une poutre vibrante et application a l'amelioration de la precision de mesure d'un capteur a poutre vibrante
MX2013009208A (es) Metodo y aparato para utilizar multiples envolventes espectroscopicas para determinar componentes con mayor precision y rango dinamico.