TWI515419B - 光瞳透射率分布之測定方法、程式、電腦可讀取之媒體、曝光裝置之控制方法、曝光方法及曝光裝置、以及元件製造方法 - Google Patents

光瞳透射率分布之測定方法、程式、電腦可讀取之媒體、曝光裝置之控制方法、曝光方法及曝光裝置、以及元件製造方法 Download PDF

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Publication number
TWI515419B
TWI515419B TW100105040A TW100105040A TWI515419B TW I515419 B TWI515419 B TW I515419B TW 100105040 A TW100105040 A TW 100105040A TW 100105040 A TW100105040 A TW 100105040A TW I515419 B TWI515419 B TW I515419B
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Taiwan
Prior art keywords
optical system
light
pupil
diffracted light
measurement
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TW100105040A
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English (en)
Chinese (zh)
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TW201140019A (en
Inventor
北尚憲
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尼康股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • H10P76/2041—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0221—Testing optical properties by determining the optical axis or position of lenses
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0228—Testing optical properties by measuring refractive power
    • G01M11/0235—Testing optical properties by measuring refractive power by measuring multiple properties of lenses, automatic lens meters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
TW100105040A 2010-02-25 2011-02-16 光瞳透射率分布之測定方法、程式、電腦可讀取之媒體、曝光裝置之控制方法、曝光方法及曝光裝置、以及元件製造方法 TWI515419B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US30808710P 2010-02-25 2010-02-25
US13/011,320 US9389519B2 (en) 2010-02-25 2011-01-21 Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method

Publications (2)

Publication Number Publication Date
TW201140019A TW201140019A (en) 2011-11-16
TWI515419B true TWI515419B (zh) 2016-01-01

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Family Applications (4)

Application Number Title Priority Date Filing Date
TW100105040A TWI515419B (zh) 2010-02-25 2011-02-16 光瞳透射率分布之測定方法、程式、電腦可讀取之媒體、曝光裝置之控制方法、曝光方法及曝光裝置、以及元件製造方法
TW105123218A TWI630378B (zh) 2010-02-25 2011-02-16 Measuring device and exposure device, and component manufacturing method
TW104138470A TWI548868B (zh) 2010-02-25 2011-02-16 A method of measuring a photomask transmittance distribution, a program, a computer-readable medium, a control method of an exposure apparatus, an exposure method, and an exposure apparatus, and a device manufacturing method
TW107119872A TWI706125B (zh) 2010-02-25 2011-02-16 測量裝置及曝光裝置、以及元件製造方法

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW105123218A TWI630378B (zh) 2010-02-25 2011-02-16 Measuring device and exposure device, and component manufacturing method
TW104138470A TWI548868B (zh) 2010-02-25 2011-02-16 A method of measuring a photomask transmittance distribution, a program, a computer-readable medium, a control method of an exposure apparatus, an exposure method, and an exposure apparatus, and a device manufacturing method
TW107119872A TWI706125B (zh) 2010-02-25 2011-02-16 測量裝置及曝光裝置、以及元件製造方法

Country Status (5)

Country Link
US (1) US9389519B2 (enExample)
JP (2) JP5691608B2 (enExample)
KR (1) KR20130054942A (enExample)
TW (4) TWI515419B (enExample)
WO (1) WO2011105307A1 (enExample)

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Also Published As

Publication number Publication date
KR20130054942A (ko) 2013-05-27
TWI630378B (zh) 2018-07-21
TW201140019A (en) 2011-11-16
JP5691608B2 (ja) 2015-04-01
TW201638571A (zh) 2016-11-01
US9389519B2 (en) 2016-07-12
TW201835540A (zh) 2018-10-01
TWI706125B (zh) 2020-10-01
US20110205514A1 (en) 2011-08-25
JP5862992B2 (ja) 2016-02-16
JP2011176312A (ja) 2011-09-08
JP2015144275A (ja) 2015-08-06
WO2011105307A1 (en) 2011-09-01
TW201608222A (zh) 2016-03-01
TWI548868B (zh) 2016-09-11

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