JP2012220381A5 - - Google Patents

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Publication number
JP2012220381A5
JP2012220381A5 JP2011087655A JP2011087655A JP2012220381A5 JP 2012220381 A5 JP2012220381 A5 JP 2012220381A5 JP 2011087655 A JP2011087655 A JP 2011087655A JP 2011087655 A JP2011087655 A JP 2011087655A JP 2012220381 A5 JP2012220381 A5 JP 2012220381A5
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JP
Japan
Prior art keywords
measuring
anisotropy
optical
optical anisotropy
magnitude
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Application number
JP2011087655A
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English (en)
Japanese (ja)
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JP5806837B2 (ja
JP2012220381A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2011087655A external-priority patent/JP5806837B2/ja
Priority to JP2011087655A priority Critical patent/JP5806837B2/ja
Priority to PCT/JP2012/059314 priority patent/WO2012141061A2/ja
Priority to CN201280017649.3A priority patent/CN103477206B/zh
Priority to KR1020137025210A priority patent/KR101594982B1/ko
Priority to TW101112439A priority patent/TWI545309B/zh
Publication of JP2012220381A publication Critical patent/JP2012220381A/ja
Publication of JP2012220381A5 publication Critical patent/JP2012220381A5/ja
Publication of JP5806837B2 publication Critical patent/JP5806837B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011087655A 2011-04-11 2011-04-11 光学異方性パラメータ測定装置、測定方法及び測定用プログラム Expired - Fee Related JP5806837B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011087655A JP5806837B2 (ja) 2011-04-11 2011-04-11 光学異方性パラメータ測定装置、測定方法及び測定用プログラム
PCT/JP2012/059314 WO2012141061A2 (ja) 2011-04-11 2012-04-05 光学異方性パラメータ測定装置、測定方法及び測定用プログラム
CN201280017649.3A CN103477206B (zh) 2011-04-11 2012-04-05 光学异向性参数测量装置、测量方法及测量用系统
KR1020137025210A KR101594982B1 (ko) 2011-04-11 2012-04-05 광학 이방성 파라미터 측정 장치, 측정 방법 및 측정용 프로그램
TW101112439A TWI545309B (zh) 2011-04-11 2012-04-09 光學異向性參數測量裝置、測量方法及測量用程式

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011087655A JP5806837B2 (ja) 2011-04-11 2011-04-11 光学異方性パラメータ測定装置、測定方法及び測定用プログラム

Publications (3)

Publication Number Publication Date
JP2012220381A JP2012220381A (ja) 2012-11-12
JP2012220381A5 true JP2012220381A5 (enExample) 2014-05-08
JP5806837B2 JP5806837B2 (ja) 2015-11-10

Family

ID=47009779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011087655A Expired - Fee Related JP5806837B2 (ja) 2011-04-11 2011-04-11 光学異方性パラメータ測定装置、測定方法及び測定用プログラム

Country Status (5)

Country Link
JP (1) JP5806837B2 (enExample)
KR (1) KR101594982B1 (enExample)
CN (1) CN103477206B (enExample)
TW (1) TWI545309B (enExample)
WO (1) WO2012141061A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6087751B2 (ja) * 2013-07-05 2017-03-01 株式会社モリテックス 光学異方性パラメータ測定装置、測定方法及び測定用プログラム
JP2015143650A (ja) * 2014-01-31 2015-08-06 セイコーエプソン株式会社 旋光計測方法及び旋光計測装置
TWI542864B (zh) * 2014-12-30 2016-07-21 財團法人工業技術研究院 異向性量測系統、異向性量測方法及其校正方法
KR101675694B1 (ko) 2015-09-11 2016-11-23 성균관대학교산학협력단 블록 인기도에 기반한 ssd의 블록 교체방법
KR102523172B1 (ko) * 2015-12-03 2023-04-19 하마마츠 포토닉스 가부시키가이샤 검사 장치 및 검사 방법
KR101704936B1 (ko) 2015-12-07 2017-02-09 성균관대학교산학협력단 블록의 우선성에 기반한 ｓｓｄ의 블록 교체방법 및 이를 적용하는 하이브리드 저장 시스템
CN105675541B (zh) * 2016-01-13 2018-10-26 中国科学院苏州生物医学工程技术研究所 一种具有轴向高分辨率的反射式共聚焦系统
JP2018187143A (ja) * 2017-05-09 2018-11-29 ソニー株式会社 光学定数測定装置及び光学定数測定方法
KR102387341B1 (ko) * 2017-05-23 2022-04-15 하마마츠 포토닉스 가부시키가이샤 배향 특성 측정 방법, 배향 특성 측정 프로그램, 및 배향 특성 측정 장치
CN110651177B (zh) * 2017-05-23 2022-07-29 浜松光子学株式会社 取向特性测定方法、取向特性测定程序及取向特性测定装置
CN109141828B (zh) * 2018-07-19 2020-08-28 中国科学院上海光学精密机械研究所 液晶器件相位调控特性测量装置和测量方法
KR102486442B1 (ko) * 2019-06-07 2023-01-09 주식회사 엘지화학 편광판의 액정얼룩 검사장치 및 편광판의 액정얼룩 검사방법
KR20200129033A (ko) * 2020-03-03 2020-11-17 주식회사 코엠에스 반도체 기판 보호필름 박리 여부 감시 장치 및 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2956688B1 (ja) * 1998-04-24 1999-10-04 日本電気株式会社 異方性薄膜評価方法および評価装置
JP3610837B2 (ja) * 1998-09-18 2005-01-19 株式会社日立製作所 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2001083042A (ja) * 1999-09-13 2001-03-30 Nec Corp 光学的異方性の測定方法、測定装置及び測定方法を記録した記録媒体
JP3535786B2 (ja) * 1999-12-03 2004-06-07 Ｎｅｃエレクトロニクス株式会社 液晶表示素子評価法及び評価装置
JP2004294293A (ja) * 2003-03-27 2004-10-21 Neoark Corp 複数の異なる試料の光学特性を一括して観察・測定する方法
KR101280335B1 (ko) * 2005-01-24 2013-07-01 가부시키가이샤 모리텍스 광학적 이방성 파라미터 측정 방법 및 측정 장치
JP4663529B2 (ja) * 2005-01-24 2011-04-06 株式会社モリテックス 光学的異方性パラメータ測定方法及び測定装置
JP4921090B2 (ja) * 2006-09-25 2012-04-18 株式会社モリテックス 光学異方性パラメータ測定方法及び測定装置
CN100507478C (zh) * 2007-06-01 2009-07-01 清华大学 可溯源测量任意波片位相延迟的方法和装置
JP5198980B2 (ja) * 2008-09-02 2013-05-15 株式会社モリテックス 光学異方性パラメータ測定方法及び測定装置
CN101963495A (zh) * 2009-07-24 2011-02-02 瀚宇彩晶股份有限公司 测量各向异性物质的物理参数的装置及方法

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