JP2012220381A5 - - Google Patents

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Publication number
JP2012220381A5
JP2012220381A5 JP2011087655A JP2011087655A JP2012220381A5 JP 2012220381 A5 JP2012220381 A5 JP 2012220381A5 JP 2011087655 A JP2011087655 A JP 2011087655A JP 2011087655 A JP2011087655 A JP 2011087655A JP 2012220381 A5 JP2012220381 A5 JP 2012220381A5
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JP
Japan
Prior art keywords
measuring
anisotropy
optical
optical anisotropy
magnitude
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JP2011087655A
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Japanese (ja)
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JP5806837B2 (en
JP2012220381A (en
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Priority claimed from JP2011087655A external-priority patent/JP5806837B2/en
Priority to JP2011087655A priority Critical patent/JP5806837B2/en
Priority to KR1020137025210A priority patent/KR101594982B1/en
Priority to PCT/JP2012/059314 priority patent/WO2012141061A2/en
Priority to CN201280017649.3A priority patent/CN103477206B/en
Priority to TW101112439A priority patent/TWI545309B/en
Publication of JP2012220381A publication Critical patent/JP2012220381A/en
Publication of JP2012220381A5 publication Critical patent/JP2012220381A5/ja
Publication of JP5806837B2 publication Critical patent/JP5806837B2/en
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Expired - Fee Related legal-status Critical Current
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Description

本発明は、光学異方性を有する試料の光学軸の方位及び異方性の大きさを測定する光学異方性パラメータ測定装置、測定方法及び測定用プログラムに関し、特に、液晶配向膜の検査等に用いて好適である。
The present invention relates to an optical anisotropy parameter measuring apparatus, a measuring method, and a measuring program for measuring the orientation of an optical axis and the magnitude of anisotropy of a sample having optical anisotropy. It is suitable for use.

JP2011087655A 2011-04-11 2011-04-11 Optical anisotropy parameter measuring device, measuring method and measuring program Expired - Fee Related JP5806837B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011087655A JP5806837B2 (en) 2011-04-11 2011-04-11 Optical anisotropy parameter measuring device, measuring method and measuring program
KR1020137025210A KR101594982B1 (en) 2011-04-11 2012-04-05 Optical anisotropic parameter measurement device, measurement method and measurement program
PCT/JP2012/059314 WO2012141061A2 (en) 2011-04-11 2012-04-05 Optical anisotropic parameter measurement device, measurement method and measurement program
CN201280017649.3A CN103477206B (en) 2011-04-11 2012-04-05 Optical anisotropy's parameter measuring apparatus, measuring method and measurement system
TW101112439A TWI545309B (en) 2011-04-11 2012-04-09 Apparatus, method and program for measuring optical anisotropy parameters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011087655A JP5806837B2 (en) 2011-04-11 2011-04-11 Optical anisotropy parameter measuring device, measuring method and measuring program

Publications (3)

Publication Number Publication Date
JP2012220381A JP2012220381A (en) 2012-11-12
JP2012220381A5 true JP2012220381A5 (en) 2014-05-08
JP5806837B2 JP5806837B2 (en) 2015-11-10

Family

ID=47009779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011087655A Expired - Fee Related JP5806837B2 (en) 2011-04-11 2011-04-11 Optical anisotropy parameter measuring device, measuring method and measuring program

Country Status (5)

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JP (1) JP5806837B2 (en)
KR (1) KR101594982B1 (en)
CN (1) CN103477206B (en)
TW (1) TWI545309B (en)
WO (1) WO2012141061A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6087751B2 (en) * 2013-07-05 2017-03-01 株式会社モリテックス Optical anisotropy parameter measuring device, measuring method and measuring program
JP2015143650A (en) * 2014-01-31 2015-08-06 セイコーエプソン株式会社 Optical rotation measuring method and optical rotation measuring device
TWI542864B (en) * 2014-12-30 2016-07-21 財團法人工業技術研究院 A system for measuring anisotropy, a method for measuring anisotropy and a calibration method thereof
KR101675694B1 (en) 2015-09-11 2016-11-23 성균관대학교산학협력단 Block replacement method of ssd based on block popularity
JP6940413B2 (en) * 2015-12-03 2021-09-29 浜松ホトニクス株式会社 Inspection equipment and inspection method
KR101704936B1 (en) 2015-12-07 2017-02-09 성균관대학교산학협력단 Block replacement method based on recency, and thereof hybrid strorage system
CN105675541B (en) * 2016-01-13 2018-10-26 中国科学院苏州生物医学工程技术研究所 One kind having axial high-resolution reflective confocal system
JP2018187143A (en) * 2017-05-09 2018-11-29 ソニー株式会社 Optical constant measuring device and optical constant measuring method
WO2018216246A1 (en) * 2017-05-23 2018-11-29 浜松ホトニクス株式会社 Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
KR102366788B1 (en) 2017-05-23 2022-02-23 하마마츠 포토닉스 가부시키가이샤 Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement apparatus
CN109141828B (en) * 2018-07-19 2020-08-28 中国科学院上海光学精密机械研究所 Device and method for measuring phase regulation and control characteristics of liquid crystal device
KR102486442B1 (en) * 2019-06-07 2023-01-09 주식회사 엘지화학 Device for testing liquid crystal stain of polarizing plate and method for testing liquid crystal stain of polarizing plate
KR20200129033A (en) * 2020-03-03 2020-11-17 주식회사 코엠에스 PCB Plate Film Monitoring System

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2956688B1 (en) * 1998-04-24 1999-10-04 日本電気株式会社 Anisotropic thin film evaluation method and evaluation apparatus
JP3610837B2 (en) * 1998-09-18 2005-01-19 株式会社日立製作所 Sample surface observation method and apparatus, defect inspection method and apparatus
JP2001083042A (en) * 1999-09-13 2001-03-30 Nec Corp Apparatus and method for measurement of optical anisotropy as well as recording medium with recorded measuring method
JP3535786B2 (en) * 1999-12-03 2004-06-07 Ｎｅｃエレクトロニクス株式会社 Liquid crystal display element evaluation method and evaluation device
JP2004294293A (en) * 2003-03-27 2004-10-21 Neoark Corp Method for collectively observing and measuring optical characteristics of plurality of different samples
JP4663529B2 (en) * 2005-01-24 2011-04-06 株式会社モリテックス Optical anisotropy parameter measuring method and measuring apparatus
KR101280335B1 (en) * 2005-01-24 2013-07-01 가부시키가이샤 모리텍스 Method and apparatus for measuring optical aeolotropic parameter
JP4921090B2 (en) * 2006-09-25 2012-04-18 株式会社モリテックス Optical anisotropy parameter measuring method and measuring apparatus
CN100507478C (en) * 2007-06-01 2009-07-01 清华大学 Device and method for trace to the source for measuring any wave plate retardation
JP5198980B2 (en) * 2008-09-02 2013-05-15 株式会社モリテックス Optical anisotropy parameter measuring method and measuring apparatus
CN101963495A (en) * 2009-07-24 2011-02-02 瀚宇彩晶股份有限公司 Device and method for measuring physical parameters of aeolotropic substance

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