CN103477206B - 光学异向性参数测量装置、测量方法及测量用系统 - Google Patents

光学异向性参数测量装置、测量方法及测量用系统 Download PDF

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Publication number
CN103477206B
CN103477206B CN201280017649.3A CN201280017649A CN103477206B CN 103477206 B CN103477206 B CN 103477206B CN 201280017649 A CN201280017649 A CN 201280017649A CN 103477206 B CN103477206 B CN 103477206B
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reflected light
wavelength plate
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CN103477206A (zh
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田之冈大辅
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Moritex Corp
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Shortmore Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201280017649.3A 2011-04-11 2012-04-05 光学异向性参数测量装置、测量方法及测量用系统 Expired - Fee Related CN103477206B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011087655A JP5806837B2 (ja) 2011-04-11 2011-04-11 光学異方性パラメータ測定装置、測定方法及び測定用プログラム
JP2011-087655 2011-04-11
PCT/JP2012/059314 WO2012141061A2 (ja) 2011-04-11 2012-04-05 光学異方性パラメータ測定装置、測定方法及び測定用プログラム

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CN103477206A CN103477206A (zh) 2013-12-25
CN103477206B true CN103477206B (zh) 2015-11-25

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CN201280017649.3A Expired - Fee Related CN103477206B (zh) 2011-04-11 2012-04-05 光学异向性参数测量装置、测量方法及测量用系统

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JP (1) JP5806837B2 (enExample)
KR (1) KR101594982B1 (enExample)
CN (1) CN103477206B (enExample)
TW (1) TWI545309B (enExample)
WO (1) WO2012141061A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6087751B2 (ja) * 2013-07-05 2017-03-01 株式会社モリテックス 光学異方性パラメータ測定装置、測定方法及び測定用プログラム
JP2015143650A (ja) * 2014-01-31 2015-08-06 セイコーエプソン株式会社 旋光計測方法及び旋光計測装置
TWI542864B (zh) * 2014-12-30 2016-07-21 財團法人工業技術研究院 異向性量測系統、異向性量測方法及其校正方法
KR101675694B1 (ko) 2015-09-11 2016-11-23 성균관대학교산학협력단 블록 인기도에 기반한 ssd의 블록 교체방법
US10564126B2 (en) * 2015-12-03 2020-02-18 Hamamatsu Photonics K.K. Optical polarization inspection device and method
KR101704936B1 (ko) 2015-12-07 2017-02-09 성균관대학교산학협력단 블록의 우선성에 기반한 ｓｓｄ의 블록 교체방법 및 이를 적용하는 하이브리드 저장 시스템
CN105675541B (zh) * 2016-01-13 2018-10-26 中国科学院苏州生物医学工程技术研究所 一种具有轴向高分辨率的反射式共聚焦系统
JP2018187143A (ja) * 2017-05-09 2018-11-29 ソニー株式会社 光学定数測定装置及び光学定数測定方法
EP3633351B1 (en) * 2017-05-23 2023-03-29 Hamamatsu Photonics K.K. Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
JP6356372B1 (ja) * 2017-05-23 2018-07-11 浜松ホトニクス株式会社 配向特性測定方法、配向特性測定プログラム、及び配向特性測定装置
CN109141828B (zh) * 2018-07-19 2020-08-28 中国科学院上海光学精密机械研究所 液晶器件相位调控特性测量装置和测量方法
KR102486442B1 (ko) * 2019-06-07 2023-01-09 주식회사 엘지화학 편광판의 액정얼룩 검사장치 및 편광판의 액정얼룩 검사방법
KR20200129033A (ko) * 2020-03-03 2020-11-17 주식회사 코엠에스 반도체 기판 보호필름 박리 여부 감시 장치 및 방법

Citations (6)

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JPH11304645A (ja) * 1998-04-24 1999-11-05 Nec Corp 異方性薄膜評価方法および評価装置
CN1847816A (zh) * 2005-01-24 2006-10-18 株式会社茉莉特斯 光学各向异性参数测定方法及测定装置
CN101055207A (zh) * 2007-06-01 2007-10-17 清华大学 可溯源测量任意波片位相延迟的方法和装置
CN101153965A (zh) * 2006-09-25 2008-04-02 株式会社茉莉特斯 光学各向异性参数测定装置
CN101666926A (zh) * 2008-09-02 2010-03-10 株式会社茉莉特斯 光学各向异性参数测定方法及测定装置
CN101963495A (zh) * 2009-07-24 2011-02-02 瀚宇彩晶股份有限公司 测量各向异性物质的物理参数的装置及方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3610837B2 (ja) * 1998-09-18 2005-01-19 株式会社日立製作所 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2001083042A (ja) * 1999-09-13 2001-03-30 Nec Corp 光学的異方性の測定方法、測定装置及び測定方法を記録した記録媒体
JP3535786B2 (ja) * 1999-12-03 2004-06-07 Ｎｅｃエレクトロニクス株式会社 液晶表示素子評価法及び評価装置
JP2004294293A (ja) * 2003-03-27 2004-10-21 Neoark Corp 複数の異なる試料の光学特性を一括して観察・測定する方法
JP4663529B2 (ja) * 2005-01-24 2011-04-06 株式会社モリテックス 光学的異方性パラメータ測定方法及び測定装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11304645A (ja) * 1998-04-24 1999-11-05 Nec Corp 異方性薄膜評価方法および評価装置
CN1847816A (zh) * 2005-01-24 2006-10-18 株式会社茉莉特斯 光学各向异性参数测定方法及测定装置
CN101153965A (zh) * 2006-09-25 2008-04-02 株式会社茉莉特斯 光学各向异性参数测定装置
CN101055207A (zh) * 2007-06-01 2007-10-17 清华大学 可溯源测量任意波片位相延迟的方法和装置
CN101666926A (zh) * 2008-09-02 2010-03-10 株式会社茉莉特斯 光学各向异性参数测定方法及测定装置
CN101963495A (zh) * 2009-07-24 2011-02-02 瀚宇彩晶股份有限公司 测量各向异性物质的物理参数的装置及方法

Also Published As

Publication number Publication date
WO2012141061A3 (ja) 2012-12-06
JP2012220381A (ja) 2012-11-12
TW201250228A (en) 2012-12-16
WO2012141061A2 (ja) 2012-10-18
TWI545309B (zh) 2016-08-11
CN103477206A (zh) 2013-12-25
KR101594982B1 (ko) 2016-02-17
KR20140011346A (ko) 2014-01-28
JP5806837B2 (ja) 2015-11-10

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Address after: Saitama Prefecture, Japan

Patentee after: Moritex Co. Ltd.

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Granted publication date: 20151125

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