JP2011137230A5 - - Google Patents
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- Publication number
- JP2011137230A5 JP2011137230A5 JP2010283138A JP2010283138A JP2011137230A5 JP 2011137230 A5 JP2011137230 A5 JP 2011137230A5 JP 2010283138 A JP2010283138 A JP 2010283138A JP 2010283138 A JP2010283138 A JP 2010283138A JP 2011137230 A5 JP2011137230 A5 JP 2011137230A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- producing
- substrate
- layer
- film according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims 14
- 238000004519 manufacturing process Methods 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 7
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 239000002086 nanomaterial Substances 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 3
- 238000004220 aggregation Methods 0.000 claims 2
- 230000002776 aggregation Effects 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 2
- 239000000395 magnesium oxide Substances 0.000 claims 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- 229910052723 transition metal Inorganic materials 0.000 claims 1
- 150000003624 transition metals Chemical group 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20090132423 | 2009-12-29 | ||
| KR10-2009-0132423 | 2009-12-29 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011137230A JP2011137230A (ja) | 2011-07-14 |
| JP2011137230A5 true JP2011137230A5 (enExample) | 2014-01-30 |
| JP5610393B2 JP5610393B2 (ja) | 2014-10-22 |
Family
ID=44348913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010283138A Expired - Fee Related JP5610393B2 (ja) | 2009-12-29 | 2010-12-20 | 自己組織化されたナノ構造薄膜の製造方法、ナノ構造薄膜 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5610393B2 (enExample) |
| KR (1) | KR101174321B1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3178067B2 (ja) | 1991-02-26 | 2001-06-18 | ぺんてる株式会社 | スズ−ニッケル二元合金電気めっき液組成物 |
| KR20140036403A (ko) * | 2012-09-13 | 2014-03-26 | 포항공과대학교 산학협력단 | 발광 다이오드의 패턴 형성 방법 |
| CN109207949B (zh) * | 2018-10-23 | 2020-06-16 | 宁波工程学院 | 一种镀制非均匀多层薄膜的方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0585773A (ja) * | 1991-09-26 | 1993-04-06 | Central Glass Co Ltd | 基材表面への微細凹凸被膜の形成法 |
| JPH0786282A (ja) * | 1993-09-20 | 1995-03-31 | Oki Electric Ind Co Ltd | 配線形成方法 |
| JP2007242880A (ja) | 2006-03-08 | 2007-09-20 | Tdk Corp | 成膜方法 |
| KR100813243B1 (ko) | 2006-07-04 | 2008-03-13 | 삼성에스디아이 주식회사 | 탄소나노튜브를 이용한 반도체 소자의 층간 배선 및 그제조 방법 |
| JP2008108924A (ja) * | 2006-10-26 | 2008-05-08 | Matsushita Electric Works Ltd | 化合物半導体発光素子およびそれを用いる照明装置ならびに化合物半導体発光素子の製造方法 |
| WO2009113195A1 (ja) * | 2008-03-13 | 2009-09-17 | 大陽日酸株式会社 | ブラシ状カーボンナノ構造物製造用触媒体、触媒体製造方法、ブラシ状カーボンナノ構造物及びその製法 |
| WO2009068756A1 (fr) | 2007-11-28 | 2009-06-04 | Commissariat A L'energie Atomique | Procede de cristallisation |
-
2010
- 2010-12-20 JP JP2010283138A patent/JP5610393B2/ja not_active Expired - Fee Related
- 2010-12-27 KR KR1020100135802A patent/KR101174321B1/ko not_active Expired - Fee Related
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