JP2011124548A5 - - Google Patents

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Publication number
JP2011124548A5
JP2011124548A5 JP2010237915A JP2010237915A JP2011124548A5 JP 2011124548 A5 JP2011124548 A5 JP 2011124548A5 JP 2010237915 A JP2010237915 A JP 2010237915A JP 2010237915 A JP2010237915 A JP 2010237915A JP 2011124548 A5 JP2011124548 A5 JP 2011124548A5
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JP
Japan
Prior art keywords
substrate
substrate stage
transfer arm
exposure apparatus
movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010237915A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011124548A (ja
JP5537380B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2010237915A priority Critical patent/JP5537380B2/ja
Priority claimed from JP2010237915A external-priority patent/JP5537380B2/ja
Priority to KR1020100109121A priority patent/KR101431867B1/ko
Priority to US12/940,681 priority patent/US9280067B2/en
Priority to CN2010105401255A priority patent/CN102063017B/zh
Publication of JP2011124548A publication Critical patent/JP2011124548A/ja
Publication of JP2011124548A5 publication Critical patent/JP2011124548A5/ja
Application granted granted Critical
Publication of JP5537380B2 publication Critical patent/JP5537380B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010237915A 2009-11-16 2010-10-22 露光装置及びデバイス製造方法 Active JP5537380B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010237915A JP5537380B2 (ja) 2009-11-16 2010-10-22 露光装置及びデバイス製造方法
KR1020100109121A KR101431867B1 (ko) 2009-11-16 2010-11-04 노광 장치 및 디바이스 제조 방법
US12/940,681 US9280067B2 (en) 2009-11-16 2010-11-05 Exposure aparatus and method of manufacturing device to avoid collision between an elevating member of a substrate stage and a conveyance arm
CN2010105401255A CN102063017B (zh) 2009-11-16 2010-11-11 曝光装置和器件制造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009261318 2009-11-16
JP2009261318 2009-11-16
JP2010237915A JP5537380B2 (ja) 2009-11-16 2010-10-22 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011124548A JP2011124548A (ja) 2011-06-23
JP2011124548A5 true JP2011124548A5 (enExample) 2013-11-28
JP5537380B2 JP5537380B2 (ja) 2014-07-02

Family

ID=43998349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010237915A Active JP5537380B2 (ja) 2009-11-16 2010-10-22 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US9280067B2 (enExample)
JP (1) JP5537380B2 (enExample)
KR (1) KR101431867B1 (enExample)
CN (1) CN102063017B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7212558B2 (ja) * 2019-03-15 2023-01-25 キヤノン株式会社 基板処理装置、決定方法及び物品の製造方法
KR20210086748A (ko) * 2019-12-30 2021-07-09 세메스 주식회사 기판 리프팅 방법 및 기판 처리 장치
JP7625636B2 (ja) 2023-05-24 2025-02-03 キヤノン株式会社 基板処理装置、制御方法、および物品製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100280108B1 (ko) * 1998-11-03 2001-03-02 윤종용 오리엔터 플랫존 유니트의 웨이퍼 파손 방지 시스템
KR100388653B1 (ko) * 2000-12-18 2003-06-25 삼성전자주식회사 반송로봇과 그 제어방법
JP2003163251A (ja) * 2001-11-27 2003-06-06 Sendai Nikon:Kk 搬送装置及び露光装置
JP2005114882A (ja) * 2003-10-06 2005-04-28 Hitachi High-Tech Electronics Engineering Co Ltd 処理ステージの基板載置方法、基板露光ステージおよび基板露光装置
JP4524132B2 (ja) * 2004-03-30 2010-08-11 東京エレクトロン株式会社 真空処理装置
JP2006066636A (ja) * 2004-08-26 2006-03-09 Nikon Corp 搬送装置とその方法、及び露光装置
JP4807629B2 (ja) * 2004-11-25 2011-11-02 株式会社ニコン 露光装置及びデバイス製造方法
CN100361287C (zh) * 2006-03-10 2008-01-09 友达光电股份有限公司 基板传送装置
EP2006899A4 (en) * 2006-04-05 2011-12-28 Nikon Corp STAGE APPARATUS, EXPOSURE APPARATUS, STAGE CONTROL METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
JP4969138B2 (ja) * 2006-04-17 2012-07-04 大日本スクリーン製造株式会社 基板処理装置
JP4799325B2 (ja) * 2006-09-05 2011-10-26 東京エレクトロン株式会社 基板受け渡し装置，基板処理装置，基板受け渡し方法

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