JP2011122150A5 - - Google Patents
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- Publication number
- JP2011122150A5 JP2011122150A5 JP2010258566A JP2010258566A JP2011122150A5 JP 2011122150 A5 JP2011122150 A5 JP 2011122150A5 JP 2010258566 A JP2010258566 A JP 2010258566A JP 2010258566 A JP2010258566 A JP 2010258566A JP 2011122150 A5 JP2011122150 A5 JP 2011122150A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- ink
- providing
- substrate
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000463 material Substances 0.000 claims 22
- 239000000758 substrate Substances 0.000 claims 12
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 6
- 239000003638 chemical reducing agent Substances 0.000 claims 6
- 239000002243 precursor Substances 0.000 claims 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims 4
- 229920000768 polyamine Polymers 0.000 claims 4
- 239000011669 selenium Substances 0.000 claims 4
- 239000002904 solvent Substances 0.000 claims 4
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 claims 4
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 claims 3
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 claims 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 3
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 claims 3
- -1 carboxylate anion Chemical class 0.000 claims 3
- 150000007942 carboxylates Chemical class 0.000 claims 3
- RJMMFJHMVBOLGY-UHFFFAOYSA-N indium(3+) Chemical compound [In+3] RJMMFJHMVBOLGY-UHFFFAOYSA-N 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 229910052711 selenium Inorganic materials 0.000 claims 3
- 229910052717 sulfur Inorganic materials 0.000 claims 3
- 239000011593 sulfur Substances 0.000 claims 3
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 claims 2
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 claims 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims 2
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 2
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical group [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 claims 2
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 claims 2
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 claims 2
- 239000006185 dispersion Substances 0.000 claims 2
- 235000019253 formic acid Nutrition 0.000 claims 2
- FXHGMKSSBGDXIY-UHFFFAOYSA-N heptanal Chemical compound CCCCCCC=O FXHGMKSSBGDXIY-UHFFFAOYSA-N 0.000 claims 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-O hydrazinium(1+) Chemical compound [NH3+]N OAKJQQAXSVQMHS-UHFFFAOYSA-O 0.000 claims 2
- 235000006408 oxalic acid Nutrition 0.000 claims 2
- IUGYQRQAERSCNH-UHFFFAOYSA-M pivalate Chemical compound CC(C)(C)C([O-])=O IUGYQRQAERSCNH-UHFFFAOYSA-M 0.000 claims 2
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 claims 2
- 239000011734 sodium Substances 0.000 claims 2
- 229910052708 sodium Inorganic materials 0.000 claims 2
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 claims 1
- 241001367053 Autographa gamma Species 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 125000003916 ethylene diamine group Chemical group 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/622754 | 2009-11-20 | ||
| US12/622,754 US8894760B2 (en) | 2009-11-20 | 2009-11-20 | Group 3a ink and methods of making and using same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011122150A JP2011122150A (ja) | 2011-06-23 |
| JP2011122150A5 true JP2011122150A5 (enExample) | 2014-01-09 |
| JP5733957B2 JP5733957B2 (ja) | 2015-06-10 |
Family
ID=43662062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010258566A Active JP5733957B2 (ja) | 2009-11-20 | 2010-11-19 | 第３ａ族インク、並びにその製造方法および使用方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8894760B2 (enExample) |
| EP (1) | EP2325352A3 (enExample) |
| JP (1) | JP5733957B2 (enExample) |
| KR (1) | KR101766318B1 (enExample) |
| CN (1) | CN102070952B (enExample) |
| TW (1) | TWI417353B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011146115A1 (en) | 2010-05-21 | 2011-11-24 | Heliovolt Corporation | Liquid precursor for deposition of copper selenide and method of preparing the same |
| WO2012023973A2 (en) | 2010-08-16 | 2012-02-23 | Heliovolt Corporation | Liquid precursor for deposition of indium selenide and method of preparing the same |
| KR20140007332A (ko) | 2010-09-15 | 2014-01-17 | 프리커서 에너제틱스, 인코퍼레이티드. | 박막 태양 전지 방법을 위한 알칼리 금속 함유 잉크 |
| US9105797B2 (en) | 2012-05-31 | 2015-08-11 | Alliance For Sustainable Energy, Llc | Liquid precursor inks for deposition of In—Se, Ga—Se and In—Ga—Se |
| US8999746B2 (en) | 2013-08-08 | 2015-04-07 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming metal chalcogenide dispersion, metal chalcogenide dispersion, method of producing light absorbing layer of solar cell, method of producing solar cell |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9315771D0 (en) * | 1993-07-30 | 1993-09-15 | Epichem Ltd | Method of depositing thin metal films |
| US6197366B1 (en) * | 1997-05-06 | 2001-03-06 | Takamatsu Research Laboratory | Metal paste and production process of metal film |
| US6268014B1 (en) * | 1997-10-02 | 2001-07-31 | Chris Eberspacher | Method for forming solar cell materials from particulars |
| US6090926A (en) * | 1998-06-05 | 2000-07-18 | Rhodia Rare Earths Inc. | Powdery, solid rare earth carboxylates with improved solubility in aliphatic solvents which are highly active catalysts in Ziegler-Natta systems |
| US6127202A (en) * | 1998-07-02 | 2000-10-03 | International Solar Electronic Technology, Inc. | Oxide-based method of making compound semiconductor films and making related electronic devices |
| US7524528B2 (en) * | 2001-10-05 | 2009-04-28 | Cabot Corporation | Precursor compositions and methods for the deposition of passive electrical components on a substrate |
| US7629017B2 (en) * | 2001-10-05 | 2009-12-08 | Cabot Corporation | Methods for the deposition of conductive electronic features |
| JP2003137512A (ja) * | 2001-11-02 | 2003-05-14 | Rigaku Corp | 金属酸化物の製造方法，半導体装置及び金属酸化物製造装置 |
| JP4090298B2 (ja) | 2002-07-11 | 2008-05-28 | 富士フイルム株式会社 | 微粒化分散液、インクジェット記録用シート色材受容層塗布液および微粒化分散液の製造方法 |
| US20060083694A1 (en) * | 2004-08-07 | 2006-04-20 | Cabot Corporation | Multi-component particles comprising inorganic nanoparticles distributed in an organic matrix and processes for making and using same |
| EP1853671B1 (en) * | 2005-03-04 | 2013-07-31 | Inktec Co., Ltd. | Conductive inks and manufacturing method thereof |
| US7968008B2 (en) * | 2006-08-03 | 2011-06-28 | Fry's Metals, Inc. | Particles and inks and films using them |
| US8597548B2 (en) * | 2006-09-22 | 2013-12-03 | Alpha Metals, Inc. | Solvent systems for metals and inks |
| US20080280030A1 (en) * | 2007-01-31 | 2008-11-13 | Van Duren Jeoren K J | Solar cell absorber layer formed from metal ion precursors |
| JP2009227736A (ja) * | 2008-03-19 | 2009-10-08 | Mitsuboshi Belting Ltd | インクジェット印刷用インキ組成物 |
| JP2009229593A (ja) * | 2008-03-19 | 2009-10-08 | Mitsuboshi Belting Ltd | フォトマスク補修用インキ組成物及びフォトマスク補修方法 |
| US20090260670A1 (en) * | 2008-04-18 | 2009-10-22 | Xiao-Chang Charles Li | Precursor ink for producing IB-IIIA-VIA semiconductors |
| DE102009015470A1 (de) * | 2008-12-12 | 2010-06-17 | Byk-Chemie Gmbh | Verfahren zur Herstellung von Metallnanopartikeln und auf diese Weise erhaltene Metallnanopartikel und ihre Verwendung |
-
2009
- 2009-11-20 US US12/622,754 patent/US8894760B2/en active Active
-
2010
- 2010-11-17 EP EP10191581.7A patent/EP2325352A3/en not_active Withdrawn
- 2010-11-19 JP JP2010258566A patent/JP5733957B2/ja active Active
- 2010-11-19 KR KR1020100115430A patent/KR101766318B1/ko active Active
- 2010-11-19 TW TW099139872A patent/TWI417353B/zh active
- 2010-11-22 CN CN201010573616XA patent/CN102070952B/zh active Active
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