JP2011109108A5 - - Google Patents

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Publication number
JP2011109108A5
JP2011109108A5 JP2010259876A JP2010259876A JP2011109108A5 JP 2011109108 A5 JP2011109108 A5 JP 2011109108A5 JP 2010259876 A JP2010259876 A JP 2010259876A JP 2010259876 A JP2010259876 A JP 2010259876A JP 2011109108 A5 JP2011109108 A5 JP 2011109108A5
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JP
Japan
Prior art keywords
semiconductor material
layer
deposited
substrate
deposition
Prior art date
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Application number
JP2010259876A
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English (en)
Japanese (ja)
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JP2011109108A (ja
JP5731171B2 (ja
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Publication date
Priority claimed from US12/622,789 external-priority patent/US8319299B2/en
Application filed filed Critical
Publication of JP2011109108A publication Critical patent/JP2011109108A/ja
Publication of JP2011109108A5 publication Critical patent/JP2011109108A5/ja
Application granted granted Critical
Publication of JP5731171B2 publication Critical patent/JP5731171B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010259876A 2009-11-20 2010-11-22 薄膜トランジスタ組成物およびこれに関する方法 Expired - Fee Related JP5731171B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/622,789 US8319299B2 (en) 2009-11-20 2009-11-20 Thin film transistor compositions, and methods relating thereto
US12/622,789 2009-11-20

Publications (3)

Publication Number Publication Date
JP2011109108A JP2011109108A (ja) 2011-06-02
JP2011109108A5 true JP2011109108A5 (enExample) 2014-01-16
JP5731171B2 JP5731171B2 (ja) 2015-06-10

Family

ID=43902287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010259876A Expired - Fee Related JP5731171B2 (ja) 2009-11-20 2010-11-22 薄膜トランジスタ組成物およびこれに関する方法

Country Status (5)

Country Link
US (1) US8319299B2 (enExample)
JP (1) JP5731171B2 (enExample)
KR (1) KR20110056241A (enExample)
CN (1) CN102074480B (enExample)
DE (1) DE102010051851A1 (enExample)

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KR101728486B1 (ko) * 2010-03-31 2017-04-20 삼성디스플레이 주식회사 박막 트랜지스터, 그 제조 방법 및 이를 포함하는 플렉시블 디스플레이 장치
CN103354243B (zh) * 2013-06-28 2016-01-06 京东方科技集团股份有限公司 一种薄膜晶体管、其制备方法及相关装置
CN106893121B (zh) * 2015-12-17 2020-07-03 深圳瑞华泰薄膜科技股份有限公司 一种高尺寸稳定型聚酰亚胺薄膜及其制备方法
US10424670B2 (en) 2016-12-30 2019-09-24 Intel Corporation Display panel with reduced power consumption
CN119212488A (zh) * 2020-03-31 2024-12-27 华为技术有限公司 一种显示组件、显示装置和指纹识别方法
CN116067241B (zh) * 2023-03-02 2023-08-29 中国工程物理研究院激光聚变研究中心 一种纤维改性的三明治飞片结构及其制备方法

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