JP2011146506A5 - - Google Patents
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- Publication number
- JP2011146506A5 JP2011146506A5 JP2010005749A JP2010005749A JP2011146506A5 JP 2011146506 A5 JP2011146506 A5 JP 2011146506A5 JP 2010005749 A JP2010005749 A JP 2010005749A JP 2010005749 A JP2010005749 A JP 2010005749A JP 2011146506 A5 JP2011146506 A5 JP 2011146506A5
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- vapor phase
- phase growth
- growth apparatus
- glassy carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 10
- 229910021397 glassy carbon Inorganic materials 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000011247 coating layer Substances 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010005749A JP2011146506A (ja) | 2010-01-14 | 2010-01-14 | 気相成長装置用サセプタ及び気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010005749A JP2011146506A (ja) | 2010-01-14 | 2010-01-14 | 気相成長装置用サセプタ及び気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011146506A JP2011146506A (ja) | 2011-07-28 |
| JP2011146506A5 true JP2011146506A5 (enExample) | 2013-02-28 |
Family
ID=44461108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010005749A Pending JP2011146506A (ja) | 2010-01-14 | 2010-01-14 | 気相成長装置用サセプタ及び気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2011146506A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5928133B2 (ja) * | 2012-04-27 | 2016-06-01 | 株式会社Sumco | エピタキシャルシリコンウェーハの製造方法 |
| JP5880974B2 (ja) * | 2013-02-25 | 2016-03-09 | 信越半導体株式会社 | エピタキシャル成長装置の汚染検出方法及びエピタキシャルウェーハの製造方法 |
| US9799548B2 (en) * | 2013-03-15 | 2017-10-24 | Applied Materials, Inc. | Susceptors for enhanced process uniformity and reduced substrate slippage |
| TWI615917B (zh) * | 2015-04-27 | 2018-02-21 | Ｓｕｍｃｏ股份有限公司 | 承托器及磊晶生長裝置 |
| JP6424726B2 (ja) | 2015-04-27 | 2018-11-21 | 株式会社Sumco | サセプタ及びエピタキシャル成長装置 |
| US20210040643A1 (en) * | 2017-05-12 | 2021-02-11 | Toyo Tanso Co., Ltd. | Susceptor, method for producing epitaxial substrate, and epitaxial substrate |
| JP7220845B2 (ja) * | 2019-04-18 | 2023-02-13 | 住友金属鉱山株式会社 | サセプタ、サセプタの再生方法、及び、成膜方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2938926B2 (ja) * | 1990-04-13 | 1999-08-25 | 東芝セラミツクス株式会社 | 炭化珪素質部材及びその製造方法 |
| JPH092895A (ja) * | 1995-06-15 | 1997-01-07 | Toshiba Ceramics Co Ltd | ガラス状カーボン製サセプタ |
| JP2002373930A (ja) * | 2001-06-14 | 2002-12-26 | Hitachi Chem Co Ltd | サセプタ− |
| JP2003324106A (ja) * | 2002-03-01 | 2003-11-14 | Hitachi Kokusai Electric Inc | 熱処理装置、半導体デバイスの製造方法及び基板の製造方法 |
| JP4019998B2 (ja) * | 2003-04-14 | 2007-12-12 | 信越半導体株式会社 | サセプタ及び気相成長装置 |
-
2010
- 2010-01-14 JP JP2010005749A patent/JP2011146506A/ja active Pending
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