JP2011108592A5 - - Google Patents

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Publication number
JP2011108592A5
JP2011108592A5 JP2009265285A JP2009265285A JP2011108592A5 JP 2011108592 A5 JP2011108592 A5 JP 2011108592A5 JP 2009265285 A JP2009265285 A JP 2009265285A JP 2009265285 A JP2009265285 A JP 2009265285A JP 2011108592 A5 JP2011108592 A5 JP 2011108592A5
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JP
Japan
Prior art keywords
substrate
metal plate
copper
superconducting compound
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009265285A
Other languages
English (en)
Japanese (ja)
Other versions
JP5517196B2 (ja
JP2011108592A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2009265285A external-priority patent/JP5517196B2/ja
Priority to JP2009265285A priority Critical patent/JP5517196B2/ja
Priority to RU2012125607/07A priority patent/RU2012125607A/ru
Priority to IN4891DEN2012 priority patent/IN2012DN04891A/en
Priority to CN201080051041.3A priority patent/CN102667968B/zh
Priority to EP10831308.1A priority patent/EP2503560A4/en
Priority to CN201410324551.3A priority patent/CN104091647B/zh
Priority to KR1020177005588A priority patent/KR101834356B1/ko
Priority to US13/510,406 priority patent/US8993064B2/en
Priority to PCT/JP2010/006649 priority patent/WO2011061909A1/ja
Priority to KR1020127012288A priority patent/KR101763850B1/ko
Publication of JP2011108592A publication Critical patent/JP2011108592A/ja
Publication of JP2011108592A5 publication Critical patent/JP2011108592A5/ja
Publication of JP5517196B2 publication Critical patent/JP5517196B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009265285A 2009-11-20 2009-11-20 超電導化合物用基板及びその製造方法 Active JP5517196B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2009265285A JP5517196B2 (ja) 2009-11-20 2009-11-20 超電導化合物用基板及びその製造方法
KR1020177005588A KR101834356B1 (ko) 2009-11-20 2010-11-12 초전도 화합물용 기판
PCT/JP2010/006649 WO2011061909A1 (ja) 2009-11-20 2010-11-12 超電導化合物用基板及びその製造方法
CN201080051041.3A CN102667968B (zh) 2009-11-20 2010-11-12 超导化合物用基板及其制造方法
EP10831308.1A EP2503560A4 (en) 2009-11-20 2010-11-12 Substrate for superconducting compound and method for manufacturing the substrate
CN201410324551.3A CN104091647B (zh) 2009-11-20 2010-11-12 超导化合物用基板及其制造方法
RU2012125607/07A RU2012125607A (ru) 2009-11-20 2010-11-12 Подложка для сверхпроводящего соединения и способ ее получения
US13/510,406 US8993064B2 (en) 2009-11-20 2010-11-12 Substrate for superconducting compound and method for manufacturing the substrate
IN4891DEN2012 IN2012DN04891A (cg-RX-API-DMAC7.html) 2009-11-20 2010-11-12
KR1020127012288A KR101763850B1 (ko) 2009-11-20 2010-11-12 초전도 화합물용 기판의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009265285A JP5517196B2 (ja) 2009-11-20 2009-11-20 超電導化合物用基板及びその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014063666A Division JP5918920B2 (ja) 2014-03-26 2014-03-26 超電導化合物用基板及びその製造方法

Publications (3)

Publication Number Publication Date
JP2011108592A JP2011108592A (ja) 2011-06-02
JP2011108592A5 true JP2011108592A5 (cg-RX-API-DMAC7.html) 2012-12-20
JP5517196B2 JP5517196B2 (ja) 2014-06-11

Family

ID=44059396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009265285A Active JP5517196B2 (ja) 2009-11-20 2009-11-20 超電導化合物用基板及びその製造方法

Country Status (8)

Country Link
US (1) US8993064B2 (cg-RX-API-DMAC7.html)
EP (1) EP2503560A4 (cg-RX-API-DMAC7.html)
JP (1) JP5517196B2 (cg-RX-API-DMAC7.html)
KR (2) KR101834356B1 (cg-RX-API-DMAC7.html)
CN (2) CN104091647B (cg-RX-API-DMAC7.html)
IN (1) IN2012DN04891A (cg-RX-API-DMAC7.html)
RU (1) RU2012125607A (cg-RX-API-DMAC7.html)
WO (1) WO2011061909A1 (cg-RX-API-DMAC7.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101306181B1 (ko) * 2008-11-12 2013-09-09 도요 고한 가부시키가이샤 반도체 소자 형성의 에피택셜 성장막 형성용 금속 적층 기판의 제조 방법 및 반도체 소자 형성의 에피택셜 성장막 형성용 금속 적층 기판
JP2013101832A (ja) * 2011-11-08 2013-05-23 Toyo Kohan Co Ltd エピタキシャル成長用基板及びその製造方法、並びに超電導線材用基板
JP5650098B2 (ja) * 2011-11-22 2015-01-07 Jx日鉱日石金属株式会社 超電導膜形成用圧延銅箔
JP5650099B2 (ja) * 2011-11-22 2015-01-07 Jx日鉱日石金属株式会社 超電導膜形成用圧延銅箔
US9002424B2 (en) * 2012-04-16 2015-04-07 Furukawa Electric Co., Ltd. Superconducting film-forming substrate, superconducting wire, and superconducting wire manufacturing method
JP6543439B2 (ja) * 2014-04-01 2019-07-10 東洋鋼鈑株式会社 金属積層材の製造方法
JP6381944B2 (ja) * 2014-04-01 2018-08-29 東洋鋼鈑株式会社 金属積層材の製造方法
KR102403087B1 (ko) * 2014-10-27 2022-05-27 도요 고한 가부시키가이샤 초전도 선재용 기판 및 그 제조 방법과 초전도 선재
US10832843B2 (en) * 2015-03-17 2020-11-10 The University Of Houston System Superconductor compositions
JP6074527B2 (ja) * 2016-03-08 2017-02-01 東洋鋼鈑株式会社 エピタキシャル成長用基板及びその製造方法、並びに超電導線材用基板
US11840045B2 (en) * 2017-03-29 2023-12-12 Toyo Kohan Co., Ltd. Roll-bonded laminate
JP7162960B2 (ja) * 2018-08-06 2022-10-31 東洋鋼鈑株式会社 圧延接合体及びその製造方法、並びに電子機器用の放熱補強部材
KR20210122784A (ko) * 2019-02-08 2021-10-12 스미토모 덴키 고교 가부시키가이샤 초전도 선재 및 영구 전류 스위치
KR102174616B1 (ko) * 2019-09-18 2020-11-05 황교찬 결제시스템 및 이의 결제방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003193211A (ja) * 2001-12-27 2003-07-09 Nippon Mining & Metals Co Ltd 銅張積層板用圧延銅箔
CN100365741C (zh) * 2003-03-31 2008-01-30 财团法人国际超电导产业技术研究中心 氧化物超导线材用金属基材、氧化物超导线材及其制造方法
JP4155124B2 (ja) * 2003-06-30 2008-09-24 住友金属工業株式会社 金属クラッド板およびその製造方法
JP5123462B2 (ja) * 2004-10-27 2013-01-23 住友電気工業株式会社 膜形成用配向基板および超電導線材ならびに膜形成用配向基板の製造方法
KR101441139B1 (ko) * 2005-07-29 2014-09-17 아메리칸 수퍼컨덕터 코포레이션 고온 초전도 와이어 및 코일
JP4800740B2 (ja) * 2005-10-21 2011-10-26 財団法人国際超電導産業技術研究センター 希土類系テープ状酸化物超電導体及びその製造方法
JP5074083B2 (ja) * 2007-04-17 2012-11-14 中部電力株式会社 エピタキシャル薄膜形成用のクラッド配向金属基板及びその製造方法
JP5203626B2 (ja) * 2007-04-17 2013-06-05 中部電力株式会社 エピタキシャル薄膜形成用のクラッド配向金属基板及びその製造方法
JP5324763B2 (ja) * 2007-08-21 2013-10-23 中部電力株式会社 エピタキシャル膜形成用配向基板及びエピタキシャル膜形成用配向基板の表面改質方法
JP5382911B2 (ja) * 2008-11-12 2014-01-08 東洋鋼鈑株式会社 酸化物超電導線材用金属積層基板の製造方法及び該基板を用いた酸化物超電導線材
IN2012DN00632A (cg-RX-API-DMAC7.html) * 2009-07-17 2015-08-21 Toyo Kohan Co Ltd

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