JP2011100091A - 有機電界発光表示装置の製造方法 - Google Patents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1216—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being capacitors
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Abstract
【解決手段】
基板上のゲート電極及び下部電極を含む上部に第1絶縁層を形成し、第1絶縁層上に酸化物半導体で活性層を形成し、第1絶縁層上に酸化物半導体で上部電極を形成する段階と、活性層及び上部電極を含む上部に第2絶縁層を形成し、第2絶縁層上に活性層と連結されるソース電極及びドレイン電極を形成し、ソース電極及びドレイン電極を含む上部に有機物で第3絶縁層を形成し、第3絶縁層をパターニングしてソース電極又はドレイン電極を露出させ、水素(H)を含む洗浄液で洗浄する段階と、第3絶縁層上にアノード電極を形成し、アノード電極を含む上部に画素定義膜を形成した後、発光領域のアノード電極を露出させ、露出したアノード電極上に有機発光層を形成し、有機発光層上にカソード電極を形成する。
【選択図】図1
Description
12 バッファ層
14a ゲート電極14a
14b 下部電極14bを
16 第1絶縁層16
Claims (10)
- 基板上にゲート電極及び下部電極を形成する段階と、
前記ゲート電極及び下部電極を含む上部に第1絶縁層を形成する段階と、
前記第1絶縁層上に酸化物半導体層を形成する段階と、
前記酸化物半導体層をパターニングして前記ゲート電極上部の前記第1絶縁層上に活性層を形成し、前記下部電極上部の前記第1絶縁層上に上部電極を形成する段階と、
前記活性層及び前記上部電極を含む上部に第2絶縁層を形成する段階と、
前記第2絶縁層上に前記活性層と連結されるソース電極及びドレイン電極を形成する段階と、
前記ソース電極及びドレイン電極を含む上部に有機物で第3絶縁層を形成する段階と、
前記第3絶縁層をパターニングして前記ソース電極又はドレイン電極を露出させる段階と、
水素(H)を含む洗浄液で洗浄する段階と、
前記第3絶縁層上に前記ソース電極又はドレイン電極と連結されるアノード電極を形成する段階と、
前記アノード電極を含む上部に画素定義膜を形成した後、発光領域の前記アノード電極を露出させる段階と、
露出した前記アノード電極上に有機発光層を形成する段階と、
前記有機発光層上にカソード電極を形成する段階と
を含む、有機電界発光表示装置の製造方法。 - 前記ゲート電極及び前記下部電極を金属で形成することを特徴とする、請求項1に記載の有機電界発光表示装置の製造方法。
- 前記第1絶縁層をシリコン酸化物(SiO)又はシリコン窒化物(SiNx)で形成することを特徴とする、請求項1または2に記載の有機電界発光表示装置の製造方法。
- 前記酸化物半導体層を酸化亜鉛(ZnO)で形成することを特徴とする、請求項1〜3のいずれか1項に記載の有機電界発光表示装置の製造方法。
- 前記酸化物半導体層にガリウム(Ga)、インジウム(In)、ハフニウム(Hf)及び錫(Sn)のうちの少なくとも1つのイオンがドーピングされたことを特徴とする、請求項4に記載の有機電界発光表示装置の製造方法。
- 前記ソース電極及びドレイン電極を形成するためのエッチング過程で前記第2絶縁層をエッチング停止層として用いることを特徴とする、請求項1〜5のいずれか1項に記載の有機電界発光表示装置の製造方法。
- 前記有機物は、アクリル(acrylic)又はポリイミド(polyimid)を含むことを特徴とする、請求項1〜6のいずれか1項に記載の有機電界発光表示装置の製造方法。
- 前記水素を含む洗浄液として水(H2O)を用いることを特徴とする、請求項1〜7のいずれか1項に記載の有機電界発光表示装置の製造方法。
- 前記アノード電極は前記上部電極と重なるように形成することを特徴とする、請求項1〜8のいずれか1項に記載の有機電界発光表示装置の製造方法。
- 前記画素定義膜を形成した後、熱処理する段階を更に含むことを特徴とする、請求項1〜9のいずれか1項に記載の有機電界発光表示装置の製造方法。
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KR10-2009-0105985 | 2009-11-04 | ||
KR1020090105985A KR101073272B1 (ko) | 2009-11-04 | 2009-11-04 | 유기전계발광 표시 장치의 제조 방법 |
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US (1) | US8399274B2 (ja) |
JP (1) | JP5362613B2 (ja) |
KR (1) | KR101073272B1 (ja) |
TW (1) | TWI503965B (ja) |
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TWI489634B (zh) * | 2011-09-27 | 2015-06-21 | Toshiba Kk | 薄膜電晶體、其製造方法及顯示裝置 |
JP2015156486A (ja) * | 2014-02-19 | 2015-08-27 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 有機発光ディスプレイ装置 |
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US20110104833A1 (en) | 2011-05-05 |
TWI503965B (zh) | 2015-10-11 |
KR101073272B1 (ko) | 2011-10-12 |
KR20110049125A (ko) | 2011-05-12 |
JP5362613B2 (ja) | 2013-12-11 |
TW201117371A (en) | 2011-05-16 |
US8399274B2 (en) | 2013-03-19 |
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