JP2011080042A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011080042A5 JP2011080042A5 JP2010194140A JP2010194140A JP2011080042A5 JP 2011080042 A5 JP2011080042 A5 JP 2011080042A5 JP 2010194140 A JP2010194140 A JP 2010194140A JP 2010194140 A JP2010194140 A JP 2010194140A JP 2011080042 A5 JP2011080042 A5 JP 2011080042A5
- Authority
- JP
- Japan
- Prior art keywords
- hydroxyquinoline
- amino
- group
- alkanolamine
- formulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23826809P | 2009-08-31 | 2009-08-31 | |
| US61/238,268 | 2009-08-31 | ||
| US12/859,624 | 2010-08-19 | ||
| US12/859,624 US8518865B2 (en) | 2009-08-31 | 2010-08-19 | Water-rich stripping and cleaning formulation and method for using same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011080042A JP2011080042A (ja) | 2011-04-21 |
| JP2011080042A5 true JP2011080042A5 (https=) | 2012-05-24 |
| JP5385231B2 JP5385231B2 (ja) | 2014-01-08 |
Family
ID=43066059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010194140A Expired - Fee Related JP5385231B2 (ja) | 2009-08-31 | 2010-08-31 | 水系ストリッピング及び洗浄配合物、並びにその使用方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8518865B2 (https=) |
| EP (1) | EP2290046B1 (https=) |
| JP (1) | JP5385231B2 (https=) |
| KR (1) | KR101277129B1 (https=) |
| CN (1) | CN102004399B (https=) |
| TW (1) | TWI433930B (https=) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8263539B2 (en) | 2005-10-28 | 2012-09-11 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and methods for its use |
| US7632796B2 (en) | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| US9329486B2 (en) | 2005-10-28 | 2016-05-03 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| US8889609B2 (en) * | 2011-03-16 | 2014-11-18 | Air Products And Chemicals, Inc. | Cleaning formulations and method of using the cleaning formulations |
| CN112553017A (zh) | 2011-05-20 | 2021-03-26 | 艺康美国股份有限公司 | 非腐蚀性炉具除脂剂浓缩物 |
| CN103182384B (zh) * | 2011-12-31 | 2015-07-08 | 中芯国际集成电路制造(上海)有限公司 | 一种对焊盘表面进行清洗的方法 |
| US9158202B2 (en) | 2012-11-21 | 2015-10-13 | Dynaloy, Llc | Process and composition for removing substances from substrates |
| JP6198384B2 (ja) | 2012-11-28 | 2017-09-20 | 富士フイルム株式会社 | 半導体基板のエッチング方法及び半導体素子の製造方法 |
| CN103308654B (zh) * | 2013-06-13 | 2016-08-10 | 深圳市华星光电技术有限公司 | 用于测试光阻剥离液中水分含量的方法 |
| EP3104398B1 (en) | 2013-12-06 | 2020-03-11 | Fujifilm Electronic Materials USA, Inc. | Cleaning formulation and method for removing residues on surfaces |
| US20150219996A1 (en) * | 2014-02-06 | 2015-08-06 | Dynaloy, Llc | Composition for removing substances from substrates |
| KR20160094640A (ko) | 2015-02-02 | 2016-08-10 | 동우 화인켐 주식회사 | 티타늄막 식각액 조성물 |
| CN106919011B (zh) * | 2015-12-25 | 2021-12-17 | 安集微电子科技（上海）股份有限公司 | 一种富含水的羟胺剥离清洗液 |
| KR101697336B1 (ko) | 2016-03-03 | 2017-01-17 | 주식회사 엘지화학 | 액정 배향막의 제조방법 |
| TWI608311B (zh) * | 2016-03-25 | 2017-12-11 | 達興材料股份有限公司 | 一種光阻脫除組成物及一種利用該光阻脫除組成物進行微影製程的電子元件的製造方法 |
| US11035044B2 (en) | 2017-01-23 | 2021-06-15 | Versum Materials Us, Llc | Etching solution for tungsten and GST films |
| WO2019108990A1 (en) | 2017-12-01 | 2019-06-06 | Ecolab Usa Inc. | Cleaning compositions and methods for removing baked on grease from fryers and other hot surfaces |
| SG11202008828VA (en) | 2018-03-28 | 2020-10-29 | Fujifilm Electronic Materials Usa Inc | Cleaning compositions |
| CN112424327A (zh) * | 2018-07-20 | 2021-02-26 | 恩特格里斯公司 | 含腐蚀抑制剂的清洗组合物 |
| JP6858209B2 (ja) * | 2019-02-20 | 2021-04-14 | 東京応化工業株式会社 | リソグラフィー用洗浄液、及び基板の洗浄方法 |
| TWI719648B (zh) * | 2019-09-23 | 2021-02-21 | 達興材料股份有限公司 | 一種樹脂清洗劑 |
| WO2021061922A1 (en) * | 2019-09-27 | 2021-04-01 | Versum Materials Us, Llc | Compositions for removing etch residues, methods of using and use thereof |
| CN114502708A (zh) | 2019-09-30 | 2022-05-13 | 弗萨姆材料美国有限责任公司 | 光致抗蚀剂去除剂 |
| KR102334425B1 (ko) * | 2019-11-21 | 2021-12-01 | 엘티씨 (주) | 디스플레이 제조용 포토레지스트 박리액 조성물 |
| EP4656602A3 (en) * | 2020-10-02 | 2026-02-25 | Entegris, Inc. | Membranes for removing metallic species from amines |
| US12460157B2 (en) | 2021-03-12 | 2025-11-04 | Ecolab Usa Inc. | Multipurpose acidic compositions and methods of use |
| US12247185B2 (en) | 2020-11-25 | 2025-03-11 | Ecolab Usa Inc. | Multipurpose alkaline compositions and methods of use |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4428871A (en) | 1981-09-23 | 1984-01-31 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4395479A (en) | 1981-09-23 | 1983-07-26 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4401748A (en) | 1982-09-07 | 1983-08-30 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US5279771A (en) * | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
| US6110881A (en) * | 1990-11-05 | 2000-08-29 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US7205265B2 (en) * | 1990-11-05 | 2007-04-17 | Ekc Technology, Inc. | Cleaning compositions and methods of use thereof |
| US5981454A (en) * | 1993-06-21 | 1999-11-09 | Ekc Technology, Inc. | Post clean treatment composition comprising an organic acid and hydroxylamine |
| US5556482A (en) * | 1991-01-25 | 1996-09-17 | Ashland, Inc. | Method of stripping photoresist with composition containing inhibitor |
| US5496491A (en) * | 1991-01-25 | 1996-03-05 | Ashland Oil Company | Organic stripping composition |
| EP0578507B1 (en) | 1992-07-09 | 2005-09-28 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US5308745A (en) | 1992-11-06 | 1994-05-03 | J. T. Baker Inc. | Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins |
| US7144849B2 (en) * | 1993-06-21 | 2006-12-05 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US20040134873A1 (en) * | 1996-07-25 | 2004-07-15 | Li Yao | Abrasive-free chemical mechanical polishing composition and polishing process containing same |
| US6030932A (en) | 1996-09-06 | 2000-02-29 | Olin Microelectronic Chemicals | Cleaning composition and method for removing residues |
| US5798323A (en) * | 1997-05-05 | 1998-08-25 | Olin Microelectronic Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
| JP3773227B2 (ja) | 1997-10-16 | 2006-05-10 | 東京応化工業株式会社 | レジスト用剥離液組成物およびこれを用いたレジスト剥離方法 |
| US6465403B1 (en) * | 1998-05-18 | 2002-10-15 | David C. Skee | Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| US6328943B1 (en) * | 1998-07-09 | 2001-12-11 | Betzdearborn Inc. | Inhibition of pyrophoric iron sulfide activity |
| JP2000056480A (ja) | 1998-08-10 | 2000-02-25 | Tokyo Ohka Kogyo Co Ltd | レジスト用剥離液組成物およびこれを用いたレジスト剥離方法 |
| JP2000199971A (ja) | 1999-01-07 | 2000-07-18 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト用剥離液組成物およびこれを用いたホトレジスト剥離方法 |
| JP4224651B2 (ja) | 1999-02-25 | 2009-02-18 | 三菱瓦斯化学株式会社 | レジスト剥離剤およびそれを用いた半導体素子の製造方法 |
| US6475966B1 (en) * | 2000-02-25 | 2002-11-05 | Shipley Company, L.L.C. | Plasma etching residue removal |
| US6599370B2 (en) * | 2000-10-16 | 2003-07-29 | Mallinckrodt Inc. | Stabilized alkaline compositions for cleaning microelectronic substrates |
| MY131912A (en) * | 2001-07-09 | 2007-09-28 | Avantor Performance Mat Inc | Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| MY143399A (en) * | 2001-07-09 | 2011-05-13 | Avantor Performance Mat Inc | Microelectronic cleaning compositons containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning |
| US7393819B2 (en) * | 2002-07-08 | 2008-07-01 | Mallinckrodt Baker, Inc. | Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| JP3953476B2 (ja) * | 2003-06-26 | 2007-08-08 | ドングウー ファイン−ケム カンパニー、 リミテッド | フォトレジスト剥離液組成物及びそれを用いたフォトレジストの剥離方法 |
| JP4620680B2 (ja) | 2003-10-29 | 2011-01-26 | マリンクロッド・ベイカー・インコーポレイテッド | ハロゲン化金属の腐食阻害剤を含有するアルカリ性のプラズマエッチング／灰化後の残渣の除去剤およびフォトレジスト剥離組成物 |
| US8338087B2 (en) | 2004-03-03 | 2012-12-25 | Advanced Technology Materials, Inc | Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate |
| KR20050110955A (ko) * | 2004-05-20 | 2005-11-24 | 금호석유화학 주식회사 | 포토레지스트용 스트리퍼 조성물 및 이를 포토레지스트박리에 사용하는 방법 |
| KR101088568B1 (ko) | 2005-04-19 | 2011-12-05 | 아반토르 퍼포먼스 머티리얼스, 인크. | 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼 |
| US7727420B2 (en) * | 2005-05-17 | 2010-06-01 | Ppt Research | Corrosion inhibiting compositions |
| US7879782B2 (en) * | 2005-10-13 | 2011-02-01 | Air Products And Chemicals, Inc. | Aqueous cleaning composition and method for using same |
| US20070179072A1 (en) * | 2006-01-30 | 2007-08-02 | Rao Madhukar B | Cleaning formulations |
| US7879783B2 (en) * | 2007-01-11 | 2011-02-01 | Air Products And Chemicals, Inc. | Cleaning composition for semiconductor substrates |
| US20090107520A1 (en) * | 2007-10-29 | 2009-04-30 | Wai Mun Lee | Amidoxime compounds as chelating agents in semiconductor processes |
| KR101569338B1 (ko) * | 2007-11-13 | 2015-11-17 | 사켐,인코포레이티드 | 손상 없이 반도체를 습식 세척하기 위한 높은 네거티브 제타 전위 다면체 실세스퀴옥산 조성물과 방법 |
-
2010
- 2010-08-19 US US12/859,624 patent/US8518865B2/en active Active
- 2010-08-25 TW TW099128531A patent/TWI433930B/zh not_active IP Right Cessation
- 2010-08-27 EP EP10174406.8A patent/EP2290046B1/en not_active Not-in-force
- 2010-08-30 KR KR1020100084270A patent/KR101277129B1/ko not_active Expired - Fee Related
- 2010-08-31 JP JP2010194140A patent/JP5385231B2/ja not_active Expired - Fee Related
- 2010-08-31 CN CN201010269271.9A patent/CN102004399B/zh not_active Expired - Fee Related
-
2013
- 2013-07-08 US US13/936,656 patent/US9201308B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011080042A5 (https=) | ||
| CN102732393B (zh) | 清洁制剂和使用该清洁制剂的方法 | |
| JP5385231B2 (ja) | 水系ストリッピング及び洗浄配合物、並びにその使用方法 | |
| KR101818563B1 (ko) | 개선된 실리콘 부동태화 성질을 지니는 반-수성 포토레지스트 또는 반도체 제조 잔류물 스트리핑 및 클리닝 조성물 | |
| TWI293646B (en) | Semiconductor process residue removal composition and process | |
| JP6612891B2 (ja) | 洗浄配合 | |
| KR101230319B1 (ko) | 금속 기판용 준수계 스트립핑 및 세정 포뮬레이션, 및 이를 이용하는 방법 | |
| JP6546080B2 (ja) | クリーニング用組成物 | |
| CN106547178A (zh) | 清洁制剂 | |
| JP6006711B2 (ja) | １級アルカノールアミンを含むｌｃｄ製造用フォトレジスト剥離液組成物 | |
| JP2008129571A5 (https=) | ||
| JP2006503972A (ja) | 半導体デバイスを洗浄するための水性リン酸組成物 | |
| TW200943004A (en) | Stripper for dry film removal | |
| JP2012500421A (ja) | Ｌｃｄを製造するためのフォトレジスト剥離組成物 | |
| CN103975052B (zh) | 具有铜/唑类聚合物抑制作用的微电子衬底清洁组合物 | |
| JP2018530774A (ja) | Ｌｃｄ製造用フォトレジスト剥離液組成物 | |
| TWI752528B (zh) | 用於半導體基材的清潔組合物 | |
| TWI297725B (en) | Non-corrosive cleaning compositions for pemoving etch residues | |
| KR20170078589A (ko) | 포토레지스트 잔사 및/또는 폴리머 잔사를 제거하기 위한 조성물 | |
| CN101452227A (zh) | 含氟化物的光致抗蚀剂剥离剂或残余物移除清洁组合物以及用其清洁微电子基板的方法 | |
| TW201536912A (zh) | 低蝕刻的去除光阻蝕刻殘留物的清洗液以及低蝕刻的去除光阻蝕刻殘留物的清洗液應用 | |
| JP2012018982A (ja) | レジスト剥離剤及びそれを用いた剥離法 | |
| JP2012505293A5 (https=) | ||
| TW200715074A (en) | Aqueous cleaning composition and method for using same | |
| CN103590055A (zh) | 一种金属镀锌件环保清洗剂 |