JP2011014892A - 光電変換装置 - Google Patents
光電変換装置 Download PDFInfo
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Abstract
【解決手段】支持基板の一方の面に設けられた絶縁膜に密接して光電変換層が設けられ、光電変換層の一方の面と接触する電極(裏面電極)は、支持基板及び絶縁膜を貫通する貫通口に合わせて設けられている。当該電極は光電変換層及び支持基板と電気的に接触している。光電変換層の他方の面には光入射側の電極(表面電極)が設けられている。光電変換層は半導体材料で構成され、好ましくは単結晶半導体又は多結晶半導体が用いられる。
【選択図】図1
Description
102 導電性支持基板
104 第1絶縁膜
106 光電変換層
106a 第1光電変換層
106b 第2光電変換層
112 貫通口
114 裏面電極
114a 第1裏面電極
114b 第2裏面電極
120 第1不純物半導体層
122 第2不純物半導体層
124 反射防止膜
126 表面電極
126a 第1表面電極
126b 第2表面電極
132 絶縁性支持基板
132a 第1光電変換セル
132b 第2光電変換セル
138 接続部
140 半導体基板
142 脆化層
144 第2絶縁膜
146 半導体層
148 自動車
150 充電制御回路
152 蓄電装置
154 制御回路
156 駆動装置
158 コンピュータ
160 空調装置
Claims (12)
- 導電性支持基板の一方の面に設けられた第1絶縁膜と、
前記第1絶縁膜上に密接して設けられた光電変換層と、
前記導電性支持基板及び前記第1絶縁膜を貫通し前記光電変換層を露出させる貫通口に合わせて設けられ該導電性支持基板及び該光電変換層と接触する裏面電極と、
前記光電変換層の前記導電性支持基板とは反対側の面に設けられた表面電極とを有することを特徴とするとする光電変換装置。 - 請求項1において、前記第1絶縁膜と前記光電変換層との間に第2絶縁膜が介在していることを特徴とする光電変換装置。
- 請求項1又は2において、前記導電性支持基板が可撓性を有することを特徴とする光電変換装置。
- 請求項1乃至3のいずれか一項において、前記光電変換層が単結晶半導体であることを特徴とする光電変換装置。
- 絶縁性支持基板の一方の面に設けられた第1絶縁膜と、
前記第1絶縁膜上に密接して設けられた光電変換層と、
前記絶縁性支持基板及び前記第1絶縁膜を貫通し前記光電変換層を露出させる貫通口に合わせて設けられ該光電変換層と接触する裏面電極と、
前記光電変換層の前記絶縁性支持基板とは反対側の面に設けられた表面電極とを有することを特徴とするとする光電変換装置。 - 請求項5において、前記第1絶縁膜と前記光電変換層との間に第2絶縁膜が介在していることを特徴とする光電変換装置。
- 請求項5又は6において、前記絶縁性支持基板が可撓性を有することを特徴とする光電変換装置。
- 請求項5乃至7のいずれか一項において、前記光電変換層が単結晶半導体であることを特徴とする光電変換装置。
- 絶縁性支持基板の一方の面に設けられた第1絶縁膜と、
前記第1絶縁膜上に密接して設けられた第1光電変換層及び第2光電変換層と、
前記絶縁性支持基板及び前記第1絶縁膜を貫通し前記第1光電変換層と接触する第1裏面電極及び前記第2光電変換層と接触する第2裏面電極と、
前記第1光電変換層及び前記第2光電変換層の前記絶縁性支持基板とは反対側の面に設けられ該第1光電変換層と接触する第1表面電極及び該第2光電変換層と接触する第2表面電極と、
前記絶縁性支持基板を貫通し前記第1表面電極と前記第2裏面電極とが接触する接続部とを有することを特徴とするとする光電変換装置。 - 請求項9において、前記第1絶縁膜と前記第1光電変換層及び前記第2光電変換層との間に第2絶縁膜が介在していることを特徴とする光電変換装置。
- 請求項9又は10において、前記絶縁性支持基板が可撓性を有することを特徴とする光電変換装置。
- 請求項9乃至11のいずれか一項において、前記第1光電変換層及び前記第2光電変換層が単結晶半導体であることを特徴とする光電変換装置。
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JP2010126417A JP2011014892A (ja) | 2009-06-05 | 2010-06-02 | 光電変換装置 |
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JP (1) | JP2011014892A (ja) |
KR (1) | KR20100131372A (ja) |
TW (1) | TWI504002B (ja) |
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JP2016157807A (ja) * | 2015-02-24 | 2016-09-01 | 京セラ株式会社 | 光電変換装置 |
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JP4905474B2 (ja) * | 2009-02-04 | 2012-03-28 | ソニー株式会社 | 映像処理装置、映像処理方法及びプログラム |
JP2010182764A (ja) * | 2009-02-04 | 2010-08-19 | Sony Corp | 半導体素子とその製造方法、及び電子機器 |
DE102011055754B4 (de) | 2011-06-01 | 2022-12-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Solarzellenmodul und Verfahren zum Verschalten von Solarzellen |
TWI474492B (zh) * | 2011-08-01 | 2015-02-21 | Ind Tech Res Inst | 增強光捕捉之太陽光電模組 |
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JP6056772B2 (ja) | 2014-01-07 | 2017-01-11 | 株式会社Sumco | エピタキシャルウェーハの製造方法およびエピタキシャルウェーハ |
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TWI504002B (zh) | 2015-10-11 |
TW201119062A (en) | 2011-06-01 |
KR20100131372A (ko) | 2010-12-15 |
US20100307582A1 (en) | 2010-12-09 |
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