JP2010539714A5 - - Google Patents

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Publication number
JP2010539714A5
JP2010539714A5 JP2010525079A JP2010525079A JP2010539714A5 JP 2010539714 A5 JP2010539714 A5 JP 2010539714A5 JP 2010525079 A JP2010525079 A JP 2010525079A JP 2010525079 A JP2010525079 A JP 2010525079A JP 2010539714 A5 JP2010539714 A5 JP 2010539714A5
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JP
Japan
Prior art keywords
tip
patch
debris
surface energy
coating
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Application number
JP2010525079A
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English (en)
Japanese (ja)
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JP2010539714A (ja
JP5386490B2 (ja
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Priority claimed from US11/898,836 external-priority patent/US8287653B2/en
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Publication of JP2010539714A publication Critical patent/JP2010539714A/ja
Publication of JP2010539714A5 publication Critical patent/JP2010539714A5/ja
Application granted granted Critical
Publication of JP5386490B2 publication Critical patent/JP5386490B2/ja
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JP2010525079A 2007-09-17 2008-09-16 高アスペクト構造における破片除去 Active JP5386490B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/898,836 US8287653B2 (en) 2007-09-17 2007-09-17 Debris removal in high aspect structures
US11/898,836 2007-09-17
PCT/US2008/076514 WO2009039088A1 (en) 2007-09-17 2008-09-16 Debris removal in high aspect structures

Publications (3)

Publication Number Publication Date
JP2010539714A JP2010539714A (ja) 2010-12-16
JP2010539714A5 true JP2010539714A5 (enExample) 2012-11-08
JP5386490B2 JP5386490B2 (ja) 2014-01-15

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ID=40453164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010525079A Active JP5386490B2 (ja) 2007-09-17 2008-09-16 高アスペクト構造における破片除去

Country Status (7)

Country Link
US (3) US8287653B2 (enExample)
EP (4) EP4239407A3 (enExample)
JP (1) JP5386490B2 (enExample)
KR (1) KR101428137B1 (enExample)
PL (1) PL3726566T3 (enExample)
TW (1) TWI460773B (enExample)
WO (1) WO2009039088A1 (enExample)

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US10330581B2 (en) 2007-09-17 2019-06-25 Rave Llc Debris removal from high aspect structures
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DE102018010436B4 (de) 2018-06-21 2025-01-23 Carl Zeiss Smt Gmbh Vorrichtung zum Untersuchen und/oder zum Bearbeiten einer Probe
DE102018210098B4 (de) 2018-06-21 2022-02-03 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Untersuchen und/oder zum Bearbeiten einer Probe
DE102020208568A1 (de) 2020-07-08 2022-01-13 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Entfernen eines einzelnen Partikels von einem Substrat
CN112834786B (zh) * 2021-01-08 2022-05-17 南京大学 基于扫描探针的纳米颗粒三维操控方法
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