JP2010526445A5 - - Google Patents
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- Publication number
- JP2010526445A5 JP2010526445A5 JP2010506708A JP2010506708A JP2010526445A5 JP 2010526445 A5 JP2010526445 A5 JP 2010526445A5 JP 2010506708 A JP2010506708 A JP 2010506708A JP 2010506708 A JP2010506708 A JP 2010506708A JP 2010526445 A5 JP2010526445 A5 JP 2010526445A5
- Authority
- JP
- Japan
- Prior art keywords
- precursor
- poly
- solvent
- pattern
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002243 precursor Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 230000001376 precipitating effect Effects 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 239000013626 chemical specie Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229920000548 poly(silane) polymer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US92798407P | 2007-05-04 | 2007-05-04 | |
| US60/927,984 | 2007-05-04 | ||
| US99733507P | 2007-10-01 | 2007-10-01 | |
| US60/997,335 | 2007-10-01 | ||
| US12/114,741 | 2008-05-02 | ||
| US12/114,741 US8530589B2 (en) | 2007-05-04 | 2008-05-02 | Print processing for patterned conductor, semiconductor and dielectric materials |
| PCT/US2008/062586 WO2008137811A2 (en) | 2007-05-04 | 2008-05-03 | Print processing for patterned conductor, semiconductor and dielectric materials |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010526445A JP2010526445A (ja) | 2010-07-29 |
| JP2010526445A5 true JP2010526445A5 (enExample) | 2011-09-29 |
| JP5681878B2 JP5681878B2 (ja) | 2015-03-11 |
Family
ID=39944222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010506708A Active JP5681878B2 (ja) | 2007-05-04 | 2008-05-03 | パターン化導体、半導体及び誘電体材料のための印刷処理 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8530589B2 (enExample) |
| EP (1) | EP2145350B1 (enExample) |
| JP (1) | JP5681878B2 (enExample) |
| KR (1) | KR101526021B1 (enExample) |
| CN (1) | CN101681800B (enExample) |
| WO (1) | WO2008137811A2 (enExample) |
Families Citing this family (41)
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| US7494903B2 (en) * | 2007-01-29 | 2009-02-24 | Eastman Kodak Company | Doped nanoparticle semiconductor charge transport layer |
| US8424176B2 (en) * | 2008-11-25 | 2013-04-23 | Kovio, Inc. | Methods of forming tunable capacitors |
| KR101134448B1 (ko) | 2009-03-10 | 2012-04-09 | 서울대학교산학협력단 | 게르마늄 계열의 필름 제조 방법 |
| DE102009002758A1 (de) * | 2009-04-30 | 2010-11-11 | Evonik Degussa Gmbh | Bandgap Tailoring von Solarzellen aus Flüssigsilan mittels Germanium-Zugabe |
| KR20100128897A (ko) * | 2009-05-29 | 2010-12-08 | 주식회사 동진디스플레이재료 | 인쇄 패턴 형성 방법 |
| US7910393B2 (en) * | 2009-06-17 | 2011-03-22 | Innovalight, Inc. | Methods for forming a dual-doped emitter on a silicon substrate with a sub-critical shear thinning nanoparticle fluid |
| MX2011013434A (es) * | 2009-06-22 | 2012-03-06 | Basf Se | Proceso para producir un revestimiento estructurado de metal. |
| DE102009056731A1 (de) * | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
| WO2011127147A1 (en) * | 2010-04-06 | 2011-10-13 | Kovio, Inc | Epitaxial structures, methods of forming the same, and devices including the same |
| GB201007669D0 (en) * | 2010-05-07 | 2010-06-23 | Epigem Ltd | Composite electrode for molecular electronic devices and method of manufacture thereof |
| US8895962B2 (en) * | 2010-06-29 | 2014-11-25 | Nanogram Corporation | Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods |
| US8377738B2 (en) * | 2010-07-01 | 2013-02-19 | Sunpower Corporation | Fabrication of solar cells with counter doping prevention |
| DE102010031187A1 (de) * | 2010-07-09 | 2012-01-12 | Robert Bosch Gmbh | Schichtdicken optimierendes Jettlayout |
| KR20120052043A (ko) * | 2010-11-15 | 2012-05-23 | 삼성전자주식회사 | 잉크젯 프린트용 기판의 표면 개질 방법 |
| TWI488321B (zh) | 2010-12-10 | 2015-06-11 | Teijin Ltd | Semiconductor laminates, semiconductor devices, and the like |
| JP5578128B2 (ja) * | 2011-03-31 | 2014-08-27 | コニカミノルタ株式会社 | 導電性パターン部材形成方法 |
| WO2012145473A1 (en) * | 2011-04-21 | 2012-10-26 | Linde Aktiengesellschaft | Dry fluorine texturing of crystalline silicon surfaces for enhanced photovoltaic production efficiency |
| US8900654B2 (en) * | 2011-07-29 | 2014-12-02 | Thin Film Electronics, Inc. | Methods of polymerizing silanes and cyclosilanes using N-heterocyclic carbenes, metal complexes having N-heterocyclic carbene ligands, and lanthanide compounds |
| KR20140090275A (ko) * | 2012-11-21 | 2014-07-17 | 삼성전자주식회사 | 잉크젯 프린팅 기법을 이용한 도전성 패턴 형성 방법 |
| US20140179056A1 (en) * | 2012-12-21 | 2014-06-26 | Michael MORSE | Laser-absorbing seed layer for solar cell conductive contact |
| US9132622B2 (en) | 2013-03-04 | 2015-09-15 | Uni-Pixel Displays, Inc. | Method of printing uniform line widths with angle effect |
| JP2016519640A (ja) * | 2013-03-15 | 2016-07-07 | エヌディーエスユー リサーチ ファウンデーション | 液体シランおよびヘテロ原子添加物を処理により形成されるシリコン材料 |
| JP2016519039A (ja) | 2013-03-15 | 2016-06-30 | エヌディーエスユー リサーチ ファウンデーション | 直接注入による液状ヒドロロシラン組成物を用いたシリコン含有材料の合成方法 |
| WO2014188982A1 (en) | 2013-05-20 | 2014-11-27 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP6400336B2 (ja) | 2013-06-05 | 2018-10-03 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| DE102013010099B4 (de) | 2013-06-18 | 2015-07-09 | Evonik Industries Ag | Verfahren zur Herstellung strukturierter Beschichtungen, mit dem Verfahren hergestellte strukturierte Beschichtungen und ihre Verwendung |
| DE102013010102A1 (de) | 2013-06-18 | 2014-12-18 | Evonik Industries Ag | Formulierungen umfassend Hydridosilane und Hydridosilan-Oligomere, Verfahren zu ihrer Herstellung und ihrer Verwendung |
| DE102013010101A1 (de) | 2013-06-18 | 2014-12-18 | Evonik Industries Ag | Formulierungen umfassend Hydridosilane und Hydridosilan-Oligomere, Verfahren zu ihrer Herstellung und ihrer Verwendung |
| JP6322503B2 (ja) | 2013-07-16 | 2018-05-09 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| TWI548005B (zh) * | 2014-01-24 | 2016-09-01 | 環旭電子股份有限公司 | 選擇性電子封裝模組的製造方法 |
| US11267012B2 (en) | 2014-06-25 | 2022-03-08 | Universal Display Corporation | Spatial control of vapor condensation using convection |
| EP2960059B1 (en) | 2014-06-25 | 2018-10-24 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| US11220737B2 (en) * | 2014-06-25 | 2022-01-11 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| US10287689B2 (en) | 2014-12-12 | 2019-05-14 | Toyo Kohan Co., Ltd. | Method for producing metal-plated stainless material |
| WO2016150549A2 (de) * | 2015-03-23 | 2016-09-29 | Merck Patent Gmbh | Druckbare tinte zur verwendung als diffusions- und legierungsbarriere zur herstellung von hocheffizienten kristallinen siliziumsolarzellen |
| KR102570137B1 (ko) * | 2015-03-30 | 2023-08-23 | 메르크 파텐트 게엠베하 | 실록산 용매를 포함하는 유기 기능성 재료의 제형 |
| EP3304558B1 (en) * | 2015-06-05 | 2023-09-06 | Australian Advanced Materials Pty Ltd | A memory structure for use in resistive random access memory devices and method for use in manufacturing a data storage device |
| US10566534B2 (en) | 2015-10-12 | 2020-02-18 | Universal Display Corporation | Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP) |
| US10691270B2 (en) * | 2015-12-24 | 2020-06-23 | Fujikura Ltd. | Method for manufacturing wiring board and wiring board |
| CN108467628A (zh) * | 2018-04-18 | 2018-08-31 | 湖南省国银新材料有限公司 | 一种半导体纳米墨水 |
| CN110970308B (zh) * | 2018-09-30 | 2023-07-21 | 中国科学院苏州纳米技术与纳米仿生研究所 | 薄膜晶体管及其异质结有源层的制作方法 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5652019A (en) | 1995-10-10 | 1997-07-29 | Rockwell International Corporation | Method for producing resistive gradients on substrates and articles produced thereby |
| JPH09237927A (ja) | 1995-12-26 | 1997-09-09 | Toshiba Corp | 半導体薄膜形成方法および太陽電池の製造方法 |
| US6014121A (en) * | 1995-12-28 | 2000-01-11 | Canon Kabushiki Kaisha | Display panel and apparatus capable of resolution conversion |
| US6200508B1 (en) | 1996-10-25 | 2001-03-13 | Massachusetts Institute Of Technology | Method of fabricating electro-mechanical devices by multilayer deposition |
| US5874197A (en) | 1997-09-18 | 1999-02-23 | E. I. Du Pont De Nemours And Company | Thermal assisted photosensitive composition and method thereof |
| CA2306384A1 (en) | 1997-10-14 | 1999-04-22 | Patterning Technologies Limited | Method of forming an electronic device |
| US6294401B1 (en) | 1998-08-19 | 2001-09-25 | Massachusetts Institute Of Technology | Nanoparticle-based electrical, chemical, and mechanical structures and methods of making same |
| KR20010072835A (ko) | 1998-08-21 | 2001-07-31 | 추후제출 | 전기 회로 및 구성요소의 프린팅 |
| WO2000059014A1 (fr) | 1999-03-30 | 2000-10-05 | Seiko Epson Corporation | cROCEDE PRODUCTION D'UN FILM DE SILICIUM ET COMPOSITION D'ENCRE POUR IMPRIMANTE A JET D'ENCRE |
| TWI281921B (en) | 2000-03-13 | 2007-06-01 | Jsr Corp | Novel cyclosilane compound, and solution composition and process for forming a silicon film |
| KR100627203B1 (ko) | 2001-08-14 | 2006-09-22 | 제이에스알 가부시끼가이샤 | 실란 조성물, 실리콘막의 형성법 및 태양 전지의 제조법 |
| US20060001726A1 (en) | 2001-10-05 | 2006-01-05 | Cabot Corporation | Printable conductive features and processes for making same |
| US7629017B2 (en) | 2001-10-05 | 2009-12-08 | Cabot Corporation | Methods for the deposition of conductive electronic features |
| US6951666B2 (en) | 2001-10-05 | 2005-10-04 | Cabot Corporation | Precursor compositions for the deposition of electrically conductive features |
| JP2003313299A (ja) * | 2002-04-22 | 2003-11-06 | Seiko Epson Corp | 高次シラン組成物及び該組成物を用いたシリコン膜の形成方法 |
| US7390597B2 (en) | 2002-06-13 | 2008-06-24 | Dai Nippon Printing Co., Ltd. | Method for manufacturing color filter |
| GB2391385A (en) | 2002-07-26 | 2004-02-04 | Seiko Epson Corp | Patterning method by forming indent region to control spreading of liquid material deposited onto substrate |
| GB0301089D0 (en) | 2003-01-17 | 2003-02-19 | Plastic Logic Ltd | Active layer islands |
| JP4042685B2 (ja) * | 2003-03-26 | 2008-02-06 | セイコーエプソン株式会社 | トランジスタの製造方法 |
| US7879696B2 (en) | 2003-07-08 | 2011-02-01 | Kovio, Inc. | Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom |
| US7618704B2 (en) | 2003-09-29 | 2009-11-17 | E.I. Du Pont De Nemours And Company | Spin-printing of electronic and display components |
| JP2005219981A (ja) | 2004-02-06 | 2005-08-18 | Seiko Epson Corp | 高次シラン溶液の製造方法、シリコン膜の形成方法、シリコン膜、tft及び電気光学装置 |
| JP2005223268A (ja) | 2004-02-09 | 2005-08-18 | Seiko Epson Corp | 薄膜トランジスタの製造方法、ディスプレイの製造方法及びディスプレイ |
| US7531294B2 (en) | 2004-03-25 | 2009-05-12 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming film pattern, method for manufacturing semiconductor device, liquid crystal television, and EL television |
| WO2006076610A2 (en) | 2005-01-14 | 2006-07-20 | Cabot Corporation | Controlling ink migration during the formation of printable electronic features |
| EP1853671B1 (en) * | 2005-03-04 | 2013-07-31 | Inktec Co., Ltd. | Conductive inks and manufacturing method thereof |
| JP4725146B2 (ja) * | 2005-03-17 | 2011-07-13 | セイコーエプソン株式会社 | 高次シラン組成物、膜付基板の製造方法、電気光学装置および電子デバイス |
| US7390745B2 (en) * | 2005-09-23 | 2008-06-24 | International Business Machines Corporation | Pattern enhancement by crystallographic etching |
| WO2007044429A2 (en) | 2005-10-05 | 2007-04-19 | Nanogram Corporation | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
| US20070096057A1 (en) | 2005-10-28 | 2007-05-03 | Cabot Corporation | Luminescent compositions, methods for making luminescent compositions and inks incorporating the same |
| US7709307B2 (en) * | 2006-08-24 | 2010-05-04 | Kovio, Inc. | Printed non-volatile memory |
| US20100022078A1 (en) * | 2008-07-24 | 2010-01-28 | Joerg Rockenberger | Aluminum Inks and Methods of Making the Same, Methods for Depositing Aluminum Inks, and Films Formed by Printing and/or Depositing an Aluminum Ink |
-
2008
- 2008-05-02 US US12/114,741 patent/US8530589B2/en active Active
- 2008-05-03 CN CN2008800147418A patent/CN101681800B/zh active Active
- 2008-05-03 EP EP08755038.0A patent/EP2145350B1/en active Active
- 2008-05-03 JP JP2010506708A patent/JP5681878B2/ja active Active
- 2008-05-03 KR KR1020097022967A patent/KR101526021B1/ko active Active
- 2008-05-03 WO PCT/US2008/062586 patent/WO2008137811A2/en not_active Ceased
-
2013
- 2013-08-23 US US13/975,231 patent/US9045653B2/en active Active
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