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JPS6250490A
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1985-08-29 |
1987-03-05 |
Asahi Chem Ind Co Ltd |
銀もしくは銀メツキ製品の洗浄方法
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1985-10-28 |
1991-01-08 |
Hoechst Celanese Corporation |
Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
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1986-01-17 |
1988-05-24 |
Matsushita Electric Industrial Co., Ltd. |
Treatment method for plate-shaped substrate
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1986-07-23 |
1987-07-28 |
Allied Corporation |
Azeotrope-like compositions of trichlorotrifluoroethane, methanol, nitromethane, acetone, and methyl acetate
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JPH01139539A
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1987-11-25 |
1989-06-01 |
Asahi Glass Co Ltd |
共沸組成物の安定化方法
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JPH01318092A
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1988-06-17 |
1989-12-22 |
Asahi Glass Co Ltd |
混合溶剤組成物
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JPH02200789A
(ja)
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1989-01-31 |
1990-08-09 |
Asahi Glass Co Ltd |
脱脂洗浄剤
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JPH02200788A
(ja)
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1989-01-31 |
1990-08-09 |
Asahi Glass Co Ltd |
バフ研磨洗浄剤
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CA2008882A1
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1989-02-01 |
1990-08-01 |
Takamasa Tsumoto |
Washing agent, washing method and process for preparing semiconductor integrated circuit device by use thereof
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ES2083978T3
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1989-02-01 |
1996-05-01 |
Asahi Glass Co Ltd |
Mezcla azeotropica o similar a una mezcla azeotropica a base de hidrocarburos hidrogenados, clorados y fluorados.
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JPH02202998A
(ja)
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1989-02-02 |
1990-08-13 |
Asahi Glass Co Ltd |
混合溶剤組成物
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JPH03179097A
(ja)
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1989-12-07 |
1991-08-05 |
Daikin Ind Ltd |
洗浄剤組成物
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AU635362B2
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1989-12-07 |
1993-03-18 |
Daikin Industries, Ltd. |
Cleaning composition
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FR2658532B1
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1990-02-20 |
1992-05-15 |
Atochem |
Application des (perfluoroalkyl)-ethylenes comme agents de nettoyage ou de sechage, et compositions utilisables a cet effet.
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1990-02-20 |
1995-10-17 |
Societe Atochem |
Use of (perfluoroalkyl) ethylenes as cleaning or drying agents, and compositions which can be used for this purpose
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1990-05-31 |
1995-06-20 |
Hoechst Celanese Corporation |
Composition and method for removing photoresist composition from substrates surfaces
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BE1005163A3
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1991-08-01 |
1993-05-11 |
Solvay |
Compositions contenant un ether fluore et utilisation de ces compositions.
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1992-01-21 |
1998-06-30 |
Olympus Optical Co., Ltd. |
Cleaning and drying solvent
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JPH06179897A
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1992-12-15 |
1994-06-28 |
Asahi Chem Ind Co Ltd |
洗浄用溶剤
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JPH06179896A
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1992-12-15 |
1994-06-28 |
Asahi Chem Ind Co Ltd |
洗浄剤
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JPH06184595A
(ja)
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1992-12-18 |
1994-07-05 |
Nitto Chem Ind Co Ltd |
レジスト剥離工程用洗浄剤
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JPH06212193A
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1992-12-21 |
1994-08-02 |
Nitto Chem Ind Co Ltd |
レジスト剥離剤除去用洗浄剤
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WO1994014858A1
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1992-12-29 |
1994-07-07 |
Hoechst Celanese Corporation |
Metal ion reduction in polyhydroxystyrene and photoresists
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JPH06293899A
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1993-04-08 |
1994-10-21 |
Nitto Chem Ind Co Ltd |
フラックス除去用洗浄剤
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JP3619261B2
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1993-06-15 |
2005-02-09 |
三菱レイヨン株式会社 |
溶剤組成物
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JP2816928B2
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1993-09-16 |
1998-10-27 |
花王株式会社 |
洗浄方法
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JP3264405B2
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1994-01-07 |
2002-03-11 |
三菱瓦斯化学株式会社 |
半導体装置洗浄剤および半導体装置の製造方法
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JP3074634B2
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1994-03-28 |
2000-08-07 |
三菱瓦斯化学株式会社 |
フォトレジスト用剥離液及び配線パターンの形成方法
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JPH08151600A
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1994-11-28 |
1996-06-11 |
Central Glass Co Ltd |
混合洗浄溶剤
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JPH08211592A
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1995-02-07 |
1996-08-20 |
Nikon Corp |
洗浄乾燥方法及び洗浄乾燥装置
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JPH1055993A
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1996-08-09 |
1998-02-24 |
Hitachi Ltd |
半導体素子製造用洗浄液及びそれを用いた半導体素子の製造方法
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JPH10289891A
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1997-04-11 |
1998-10-27 |
Mitsubishi Gas Chem Co Inc |
半導体回路用洗浄剤及びそれを用いた半導体回路の製造方法
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JP3978255B2
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1997-06-24 |
2007-09-19 |
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リソグラフィー用洗浄剤
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JPH1121187A
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1997-07-02 |
1999-01-26 |
Ngk Insulators Ltd |
セラミックス製品の洗浄方法
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1997-07-30 |
2004-02-10 |
Kyzen Corporation |
Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications
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JP3975301B2
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1997-08-22 |
2007-09-12 |
三菱瓦斯化学株式会社 |
半導体素子製造用洗浄液及びこれを用いた半導体素子 の製造方法
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BE1011609A3
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1997-12-15 |
1999-11-09 |
Solvay |
Compositions comprenant du perfluorobutyl methyl ether et utilisation de ces compositions.
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JPH11212276A
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1998-01-26 |
1999-08-06 |
Daicel Chem Ind Ltd |
電子部品用基板のリンス液、及びこのリンス液を用いた電子部品用基板のリンス処理法
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JPH11218933A
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1998-01-30 |
1999-08-10 |
Fuji Film Olin Kk |
レジスト洗浄除去用溶剤および電子部品製造用基材の製造方法
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JPH11323394A
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1998-05-14 |
1999-11-26 |
Texas Instr Japan Ltd |
半導体素子製造用洗浄剤及びそれを用いた半導体素子の製造方法
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1999-01-05 |
2003-02-11 |
Cfmt, Inc. |
Method for reducing particle contamination during the wet processing of semiconductor substrates
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1999-02-25 |
2009-02-18 |
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レジスト剥離剤およびそれを用いた半導体素子の製造方法
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KR100434485B1
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1999-10-08 |
2004-06-05 |
삼성전자주식회사 |
포토레지스트 스트립퍼 조성물 및 이를 이용한 포토레지스트 스트립 방법
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2000-02-11 |
2003-07-15 |
Ausimont Spa |
Composizioni solventi.
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2000-06-30 |
2002-12-03 |
Lam Research Corporation |
Capillary proximity heads for single wafer cleaning and drying
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2000-07-10 |
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半導体デバイスの有機及びプラズマエッチング残さの洗浄用組成物
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2000-08-22 |
2002-11-26 |
Advanced Micro Devices, Inc. |
Super critical drying of low k materials
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2000-11-15 |
2002-06-11 |
Taiwan Semiconductor Manufacturing Co., Ltd |
Apparatus and method for drying wafers by a solvent
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2001-10-05 |
2004-07-20 |
International Business Machines Corporation |
Process for removing dopant ions from a substrate
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2001-12-28 |
2004-05-18 |
Texas Instruments Incorporated |
Method of undercutting micro-mechanical device with super-critical carbon dioxide
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2002-02-06 |
2007-12-05 |
Fujifilm Electronic Materials |
IMPROVED COMPOSITIONS FOR REMOVING BORED BEADS OF SEMICONDUCTOR LOADING BUFFER COATINGS AND METHOD FOR THEIR USE
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2002-06-07 |
2004-03-02 |
Kyzen Corporation |
Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds
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2002-08-22 |
2010-11-16 |
Daikin Industries, Ltd. |
Removing solution
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2003-06-03 |
2010-04-08 |
주식회사 동진쎄미켐 |
포토레지스트 제거용 씬너 조성물
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2003-10-02 |
2005-04-08 |
주식회사 동진쎄미켐 |
포토레지스트 제거용 씬너 조성물
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KR101142868B1
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2004-05-25 |
2012-05-10 |
주식회사 동진쎄미켐 |
포토레지스트 제거용 씬너 조성물
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2004-06-25 |
2005-08-09 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Method of improving device performance
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2004-09-16 |
2006-03-30 |
Nippon Zeon Co Ltd |
洗浄剤組成物
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JP4442376B2
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2004-09-22 |
2010-03-31 |
東ソー株式会社 |
レジスト除去用組成物
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2005-01-21 |
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2007-01-03 |
2011-09-27 |
Az Electronic Materials Usa Corp. |
Stripper for coating layer
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2007-01-04 |
2011-09-20 |
Eastman Chemical Company |
Substrate cleaning processes through the use of solvents and systems
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