JP2010501655A5 - - Google Patents
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- Publication number
- JP2010501655A5 JP2010501655A5 JP2009525024A JP2009525024A JP2010501655A5 JP 2010501655 A5 JP2010501655 A5 JP 2010501655A5 JP 2009525024 A JP2009525024 A JP 2009525024A JP 2009525024 A JP2009525024 A JP 2009525024A JP 2010501655 A5 JP2010501655 A5 JP 2010501655A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- phenyl
- composition
- coating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 9
- 239000011248 coating agent Substances 0.000 claims 6
- 238000000576 coating method Methods 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- -1 sulfonyl oxime ester compound Chemical class 0.000 claims 5
- 238000000034 method Methods 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 150000002431 hydrogen Chemical class 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- 239000003086 colorant Substances 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 125000001188 haloalkyl group Chemical group 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 239000000178 monomer Substances 0.000 claims 2
- 125000001624 naphthyl group Chemical group 0.000 claims 2
- 229920006254 polymer film Polymers 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 229920001187 thermosetting polymer Polymers 0.000 claims 2
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 1
- 125000004641 (C1-C12) haloalkyl group Chemical group 0.000 claims 1
- VCMLCMCXCRBSQO-UHFFFAOYSA-N 3h-benzo[f]chromene Chemical compound C1=CC=CC2=C(C=CCO3)C3=CC=C21 VCMLCMCXCRBSQO-UHFFFAOYSA-N 0.000 claims 1
- 231100000987 absorbed dose Toxicity 0.000 claims 1
- 125000004414 alkyl thio group Chemical group 0.000 claims 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000005562 fading Methods 0.000 claims 1
- 239000011888 foil Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 150000002596 lactones Chemical class 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 125000005561 phenanthryl group Chemical group 0.000 claims 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06119455 | 2006-08-24 | ||
| PCT/EP2007/058422 WO2008022952A1 (en) | 2006-08-24 | 2007-08-15 | Uv-dosis indicators |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010501655A JP2010501655A (ja) | 2010-01-21 |
| JP2010501655A5 true JP2010501655A5 (https=) | 2010-09-30 |
Family
ID=38293999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009525024A Pending JP2010501655A (ja) | 2006-08-24 | 2007-08-15 | Ｕｖ線量インジケータ |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8049186B2 (https=) |
| EP (1) | EP2054769A1 (https=) |
| JP (1) | JP2010501655A (https=) |
| KR (1) | KR20090043591A (https=) |
| CN (1) | CN101506734B (https=) |
| BR (1) | BRPI0715723A2 (https=) |
| RU (1) | RU2453886C2 (https=) |
| WO (1) | WO2008022952A1 (https=) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2247983A1 (en) * | 2008-02-21 | 2010-11-10 | Basf Se | Uv-dose indicator films |
| DE102008049848A1 (de) * | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| EP2358840B1 (en) * | 2008-10-02 | 2012-12-26 | Basf Se | Multi color, photoactive, color changing compositions and uv dosimeters |
| EP2414894B1 (en) | 2009-03-30 | 2014-02-12 | Basf Se | Uv-dose indicator films |
| US9121776B2 (en) | 2009-11-13 | 2015-09-01 | Lincoln Global, Inc. | Welding arc apparel with UV or thermochromic activated images |
| US8284385B2 (en) * | 2009-11-13 | 2012-10-09 | Lincoln Global, Inc. | Welding arc apparel with UV activated images |
| WO2011060152A2 (en) * | 2009-11-16 | 2011-05-19 | Basf Se | Multi color, photoactive, color changing compositions |
| CN102162997A (zh) * | 2010-02-24 | 2011-08-24 | 中国科学院大连化学物理研究所 | 一种以太阳光为曝光光源制作微流控芯片的方法及其应用 |
| US20120050520A1 (en) * | 2010-08-24 | 2012-03-01 | Raytheon Company | Method and Apparatus for Anti-Biofouling of Optics in Liquid Environments |
| US8445864B2 (en) | 2011-08-26 | 2013-05-21 | Raytheon Company | Method and apparatus for anti-biofouling of a protected surface in liquid environments |
| US9776219B2 (en) | 2013-01-17 | 2017-10-03 | Raytheon Company | Method and apparatus for removing biofouling from a protected surface in a liquid environment |
| JP2014153259A (ja) * | 2013-02-12 | 2014-08-25 | Fuji Xerox Co Ltd | 曝露量判定用媒体、曝露量判定装置、曝露量判定システム及びプログラム |
| TWI624890B (zh) | 2013-08-22 | 2018-05-21 | 櫻花彩色筆股份有限公司 | Indicator for electronic component manufacturing apparatus, and design and/or management method of the same |
| WO2015122425A1 (ja) | 2014-02-14 | 2015-08-20 | 株式会社サクラクレパス | プラズマ処理検知インジケータ |
| JP2015205995A (ja) | 2014-04-21 | 2015-11-19 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ |
| JP6474390B2 (ja) | 2014-05-09 | 2019-02-27 | 株式会社サクラクレパス | 変色層として無機物質を使用したプラズマ処理検知インジケータ |
| JP6686299B2 (ja) * | 2014-05-22 | 2020-04-22 | 大日本印刷株式会社 | 積層体の製造方法及びそれに用いる接着シート |
| JP6567863B2 (ja) * | 2014-09-16 | 2019-08-28 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ |
| JP6567817B2 (ja) | 2014-12-02 | 2019-08-28 | 株式会社サクラクレパス | プラズマ処理検知インキ組成物及びそれを用いたプラズマ処理検知インジケータ |
| CN109476946A (zh) | 2016-04-13 | 2019-03-15 | 西甘产业股份有限公司 | 光学渐逝变色组合物及其制备和使用的方法 |
| WO2018070360A1 (ja) * | 2016-10-11 | 2018-04-19 | 株式会社村田製作所 | 揮発性有機物検知体及びその製造方法、揮発性有機物の検知方法並びに揮発性有機物検知装置 |
| US10725002B2 (en) | 2016-11-03 | 2020-07-28 | Microsoft Technology Licensing, Llc | Chemical sensors for detection and display of environmental hazards |
| EP3327088A1 (en) | 2016-11-28 | 2018-05-30 | Agfa-Gevaert Nv | A multicolour laser marking method |
| JPWO2022181285A1 (https=) * | 2021-02-26 | 2022-09-01 | ||
| WO2022181392A1 (ja) * | 2021-02-26 | 2022-09-01 | 富士フイルム株式会社 | 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット |
| WO2022181321A1 (ja) * | 2021-02-26 | 2022-09-01 | 富士フイルム株式会社 | 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット |
| EP4299691A4 (en) * | 2021-02-26 | 2024-07-31 | FUJIFILM Corporation | UV RADIATION INSPECTION TOOL, UV RADIATION INSPECTION KIT, AND UV RADIATION INSPECTION METHOD |
| EP4299690A4 (en) * | 2021-02-26 | 2024-07-31 | FUJIFILM Corporation | Uv radiation sensitive member and uv radiation sensitive kit |
| WO2022181332A1 (ja) * | 2021-02-26 | 2022-09-01 | 富士フイルム株式会社 | 紫外線感知キット、紫外線測定方法、および、紫外線感知キット用ユニット |
| WO2022209858A1 (ja) * | 2021-03-31 | 2022-10-06 | 富士フイルム株式会社 | 紫外線感知部材、紫外線感知キット |
| GB2617847B (en) | 2022-04-21 | 2024-05-22 | Intellego Tech Ab Sweden | Stable UV indicator |
| EP4508042A4 (en) * | 2022-05-13 | 2026-04-08 | Quadratic 3D Inc | PHOTO-INITIATORS, COMPOSITIONS AND PROCESSES OF OBJECT FORMATION |
| WO2023220841A1 (en) * | 2022-05-19 | 2023-11-23 | Jianguo Wen | A detecting element for visualizing the intensity distribution of microwave field, and method of preparation and use thereof |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1164710A (en) * | 1978-05-09 | 1984-04-03 | Edward J. Reardon, Jr. | Phototropic photosensitive compositions containing fluoran colorformer |
| DE2914427A1 (de) | 1979-04-10 | 1980-10-23 | Bayer Ag | Beschichtung fuer thermoplasten |
| US4339240A (en) * | 1980-05-07 | 1982-07-13 | Allied Corporation | Color changing polyacetylenic compounds |
| JPS6086540A (ja) * | 1983-10-18 | 1985-05-16 | Pilot Pen Co Ltd:The | フオトクロミツク材料 |
| JPS61137876A (ja) * | 1984-12-07 | 1986-06-25 | Hodogaya Chem Co Ltd | キサンテン化合物、キサンテン化合物の製造方法及びキサンテン化合物を含有する画像形成組成物 |
| EP0199672B1 (de) * | 1985-04-12 | 1988-06-01 | Ciba-Geigy Ag | Oximsulfonate mit reaktiven Gruppen |
| US5028792A (en) * | 1987-03-19 | 1991-07-02 | Xytronyx, Inc. | System for the visualization of exposure to ultraviolet radiation |
| JPH01272930A (ja) * | 1988-04-26 | 1989-10-31 | Tomoegawa Paper Co Ltd | エネルギー線線量測定シート |
| JPH04295458A (ja) * | 1991-03-22 | 1992-10-20 | Fuji Photo Film Co Ltd | 光照射により酸を発生する化合物 |
| RU2046302C1 (ru) * | 1991-06-28 | 1995-10-20 | Владимир Наумович Генкин | Датчик для определения дозы облучения ультрафиолетовым излучением и фоточувствительный элемент для индикации облучения |
| JPH05318909A (ja) * | 1992-05-15 | 1993-12-03 | Fuji Photo Film Co Ltd | 感熱記録材料 |
| EP0571330B1 (de) * | 1992-05-22 | 1999-04-07 | Ciba SC Holding AG | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| US5296275A (en) * | 1992-07-01 | 1994-03-22 | Xytronyx, Inc. | Phototranschromic ink |
| DE4338361A1 (de) | 1993-11-10 | 1995-05-11 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Zusammensetzungen auf der Basis von Epoxidgruppen-haltigen Silanen |
| JP3456808B2 (ja) * | 1995-09-29 | 2003-10-14 | 東京応化工業株式会社 | ホトレジスト組成物 |
| MY117352A (en) * | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| US20010037037A1 (en) * | 1995-10-31 | 2001-11-01 | Kurt Dietliker | Oximesulfonic acid esters and the use thereof as latent sulfonic acids |
| JP3875271B2 (ja) * | 1996-09-02 | 2007-01-31 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類 |
| DE19724397A1 (de) | 1997-06-10 | 1999-01-14 | Bayer Ag | UV-Stabilisatoren für Siloxan-Systeme |
| DE19724396A1 (de) | 1997-06-10 | 1998-12-24 | Bayer Ag | UV-Stabilisatoren für Siloxan-Systeme |
| RU2116634C1 (ru) * | 1997-06-10 | 1998-07-27 | Виктор Федорович Иванов | Индикатор ультрафиолетового излучения |
| TW550439B (en) * | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
| SG78412A1 (en) * | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
| US6406914B1 (en) * | 1999-03-31 | 2002-06-18 | Nichiyu Giken Kogyo Co., Ltd. | Radiation exposure dose-history indicator |
| US7091257B2 (en) | 1999-07-27 | 2006-08-15 | Alcatel | Radiation-curable composition with simultaneous color formation during cure |
| SG98433A1 (en) * | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
| US20020022008A1 (en) * | 2000-07-10 | 2002-02-21 | Forest Susan Ellen | UV indicator to signal the reduction of sunscreen efficiency |
| JP4226803B2 (ja) * | 2000-08-08 | 2009-02-18 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| GB0114265D0 (en) | 2001-06-12 | 2001-08-01 | Ciba Sc Holding Ag | Polymeric material containing a latent acid |
| GB0114266D0 (en) | 2001-06-12 | 2001-08-01 | Ciba Sc Holding Ag | Laser marking method |
| US6824954B2 (en) * | 2001-08-23 | 2004-11-30 | Jsr Corporation | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same |
| AU2003206787A1 (en) | 2002-02-06 | 2003-09-02 | Ciba Specialty Chemicals Holding Inc. | Sulfonate derivatives and the use therof as latent acids |
| EP1354640A1 (de) | 2002-04-19 | 2003-10-22 | Dürr Systems GmbH | Verfahren und Vorrichtung zum Härten einer Beschichtung |
| US8003169B2 (en) | 2002-04-19 | 2011-08-23 | Basf Se | Curing of coating induced by plasma |
| GB0228647D0 (en) | 2002-12-09 | 2003-01-15 | Ciba Sc Holding Ag | Polyeric material containing a latent acid |
| EP1595182B1 (en) | 2003-02-19 | 2015-09-30 | Basf Se | Halogenated oxime derivatives and the use thereof as latent acids |
| EP1599744A2 (en) * | 2003-02-27 | 2005-11-30 | Jp Laboratories, Inc. | Self-indicating radiation alert dosimeter |
| US7147801B2 (en) * | 2003-03-13 | 2006-12-12 | Videojet Technologies Inc. | Ink jet ink composition and method for security marking |
| JP4231741B2 (ja) * | 2003-06-27 | 2009-03-04 | 富士フイルム株式会社 | 光感応性高分子組成物、それを用いた着色方法及び記録方法 |
| EP1818091B1 (en) * | 2003-12-03 | 2011-06-08 | Kyodo Printing Co., Ltd. | Moisture absorbent material with indicator function, humidity indicator and packaging bag |
| US20050196616A1 (en) * | 2004-03-04 | 2005-09-08 | Stewart Kevin J. | Photochromic optical article |
| CN1938370B (zh) | 2004-04-07 | 2011-01-26 | 西巴特殊化学品控股有限公司 | 涂料组合物显色方法 |
| WO2006008250A2 (en) | 2004-07-20 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use therof as latent acids |
-
2007
- 2007-08-15 BR BRPI0715723-1A2A patent/BRPI0715723A2/pt not_active IP Right Cessation
- 2007-08-15 KR KR1020097005933A patent/KR20090043591A/ko not_active Ceased
- 2007-08-15 WO PCT/EP2007/058422 patent/WO2008022952A1/en not_active Ceased
- 2007-08-15 RU RU2009110250/05A patent/RU2453886C2/ru not_active IP Right Cessation
- 2007-08-15 JP JP2009525024A patent/JP2010501655A/ja active Pending
- 2007-08-15 EP EP07819939A patent/EP2054769A1/en not_active Withdrawn
- 2007-08-15 CN CN2007800315688A patent/CN101506734B/zh not_active Expired - Fee Related
- 2007-08-15 US US12/310,260 patent/US8049186B2/en not_active Expired - Fee Related
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