CN101506734B - Uv量指示剂 - Google Patents

Uv量指示剂 Download PDF

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Publication number
CN101506734B
CN101506734B CN2007800315688A CN200780031568A CN101506734B CN 101506734 B CN101506734 B CN 101506734B CN 2007800315688 A CN2007800315688 A CN 2007800315688A CN 200780031568 A CN200780031568 A CN 200780031568A CN 101506734 B CN101506734 B CN 101506734B
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CN
China
Prior art keywords
alkyl
phenyl
methyl
composition
color
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2007800315688A
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English (en)
Chinese (zh)
Other versions
CN101506734A (zh
Inventor
K·斯图德
T·琼格
K·迪特利克
U·雷曼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of CN101506734A publication Critical patent/CN101506734A/zh
Application granted granted Critical
Publication of CN101506734B publication Critical patent/CN101506734B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Measurement Of Radiation (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Laminated Bodies (AREA)
CN2007800315688A 2006-08-24 2007-08-15 Uv量指示剂 Expired - Fee Related CN101506734B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06119455 2006-08-24
EP06119455.1 2006-08-24
PCT/EP2007/058422 WO2008022952A1 (en) 2006-08-24 2007-08-15 Uv-dosis indicators

Publications (2)

Publication Number Publication Date
CN101506734A CN101506734A (zh) 2009-08-12
CN101506734B true CN101506734B (zh) 2012-04-11

Family

ID=38293999

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800315688A Expired - Fee Related CN101506734B (zh) 2006-08-24 2007-08-15 Uv量指示剂

Country Status (8)

Country Link
US (1) US8049186B2 (https=)
EP (1) EP2054769A1 (https=)
JP (1) JP2010501655A (https=)
KR (1) KR20090043591A (https=)
CN (1) CN101506734B (https=)
BR (1) BRPI0715723A2 (https=)
RU (1) RU2453886C2 (https=)
WO (1) WO2008022952A1 (https=)

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DE102008049848A1 (de) * 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
EP2358840B1 (en) * 2008-10-02 2012-12-26 Basf Se Multi color, photoactive, color changing compositions and uv dosimeters
EP2414894B1 (en) 2009-03-30 2014-02-12 Basf Se Uv-dose indicator films
US9121776B2 (en) 2009-11-13 2015-09-01 Lincoln Global, Inc. Welding arc apparel with UV or thermochromic activated images
US8284385B2 (en) * 2009-11-13 2012-10-09 Lincoln Global, Inc. Welding arc apparel with UV activated images
WO2011060152A2 (en) * 2009-11-16 2011-05-19 Basf Se Multi color, photoactive, color changing compositions
CN102162997A (zh) * 2010-02-24 2011-08-24 中国科学院大连化学物理研究所 一种以太阳光为曝光光源制作微流控芯片的方法及其应用
US20120050520A1 (en) * 2010-08-24 2012-03-01 Raytheon Company Method and Apparatus for Anti-Biofouling of Optics in Liquid Environments
US8445864B2 (en) 2011-08-26 2013-05-21 Raytheon Company Method and apparatus for anti-biofouling of a protected surface in liquid environments
US9776219B2 (en) 2013-01-17 2017-10-03 Raytheon Company Method and apparatus for removing biofouling from a protected surface in a liquid environment
JP2014153259A (ja) * 2013-02-12 2014-08-25 Fuji Xerox Co Ltd 曝露量判定用媒体、曝露量判定装置、曝露量判定システム及びプログラム
TWI624890B (zh) 2013-08-22 2018-05-21 櫻花彩色筆股份有限公司 Indicator for electronic component manufacturing apparatus, and design and/or management method of the same
WO2015122425A1 (ja) 2014-02-14 2015-08-20 株式会社サクラクレパス プラズマ処理検知インジケータ
JP2015205995A (ja) 2014-04-21 2015-11-19 株式会社サクラクレパス プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ
JP6474390B2 (ja) 2014-05-09 2019-02-27 株式会社サクラクレパス 変色層として無機物質を使用したプラズマ処理検知インジケータ
JP6686299B2 (ja) * 2014-05-22 2020-04-22 大日本印刷株式会社 積層体の製造方法及びそれに用いる接着シート
JP6567863B2 (ja) * 2014-09-16 2019-08-28 株式会社サクラクレパス プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ
JP6567817B2 (ja) 2014-12-02 2019-08-28 株式会社サクラクレパス プラズマ処理検知インキ組成物及びそれを用いたプラズマ処理検知インジケータ
CN109476946A (zh) 2016-04-13 2019-03-15 西甘产业股份有限公司 光学渐逝变色组合物及其制备和使用的方法
WO2018070360A1 (ja) * 2016-10-11 2018-04-19 株式会社村田製作所 揮発性有機物検知体及びその製造方法、揮発性有機物の検知方法並びに揮発性有機物検知装置
US10725002B2 (en) 2016-11-03 2020-07-28 Microsoft Technology Licensing, Llc Chemical sensors for detection and display of environmental hazards
EP3327088A1 (en) 2016-11-28 2018-05-30 Agfa-Gevaert Nv A multicolour laser marking method
JPWO2022181285A1 (https=) * 2021-02-26 2022-09-01
WO2022181392A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
WO2022181321A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
EP4299691A4 (en) * 2021-02-26 2024-07-31 FUJIFILM Corporation UV RADIATION INSPECTION TOOL, UV RADIATION INSPECTION KIT, AND UV RADIATION INSPECTION METHOD
EP4299690A4 (en) * 2021-02-26 2024-07-31 FUJIFILM Corporation Uv radiation sensitive member and uv radiation sensitive kit
WO2022181332A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知キット、紫外線測定方法、および、紫外線感知キット用ユニット
WO2022209858A1 (ja) * 2021-03-31 2022-10-06 富士フイルム株式会社 紫外線感知部材、紫外線感知キット
GB2617847B (en) 2022-04-21 2024-05-22 Intellego Tech Ab Sweden Stable UV indicator
EP4508042A4 (en) * 2022-05-13 2026-04-08 Quadratic 3D Inc PHOTO-INITIATORS, COMPOSITIONS AND PROCESSES OF OBJECT FORMATION
WO2023220841A1 (en) * 2022-05-19 2023-11-23 Jianguo Wen A detecting element for visualizing the intensity distribution of microwave field, and method of preparation and use thereof

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US5237059A (en) * 1991-03-22 1993-08-17 Fuji Photo Film Co., Ltd. Compounds capable of generating an acid by light irradiation
US5296275A (en) * 1992-07-01 1994-03-22 Xytronyx, Inc. Phototranschromic ink
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Also Published As

Publication number Publication date
WO2008022952A1 (en) 2008-02-28
RU2453886C2 (ru) 2012-06-20
KR20090043591A (ko) 2009-05-06
EP2054769A1 (en) 2009-05-06
BRPI0715723A2 (pt) 2013-09-17
RU2009110250A (ru) 2010-09-27
CN101506734A (zh) 2009-08-12
US20090194708A1 (en) 2009-08-06
US8049186B2 (en) 2011-11-01
JP2010501655A (ja) 2010-01-21

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