JP2010285403A - 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 - Google Patents
架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 Download PDFInfo
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- JP2010285403A JP2010285403A JP2009141844A JP2009141844A JP2010285403A JP 2010285403 A JP2010285403 A JP 2010285403A JP 2009141844 A JP2009141844 A JP 2009141844A JP 2009141844 A JP2009141844 A JP 2009141844A JP 2010285403 A JP2010285403 A JP 2010285403A
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- resist underlayer
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- VGZKCAUAQHHGDK-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 VGZKCAUAQHHGDK-UHFFFAOYSA-M 0.000 description 1
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
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- SBQIJPBUMNWUKN-UHFFFAOYSA-M diphenyliodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C=1C=CC=CC=1[I+]C1=CC=CC=C1 SBQIJPBUMNWUKN-UHFFFAOYSA-M 0.000 description 1
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- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
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- 238000000206 photolithography Methods 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
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- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 239000001818 polyoxyethylene sorbitan monostearate Substances 0.000 description 1
- 235000010989 polyoxyethylene sorbitan monostearate Nutrition 0.000 description 1
- 239000001816 polyoxyethylene sorbitan tristearate Substances 0.000 description 1
- 235000010988 polyoxyethylene sorbitan tristearate Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
- 239000001593 sorbitan monooleate Substances 0.000 description 1
- 235000011069 sorbitan monooleate Nutrition 0.000 description 1
- 229940035049 sorbitan monooleate Drugs 0.000 description 1
- 239000001570 sorbitan monopalmitate Substances 0.000 description 1
- 235000011071 sorbitan monopalmitate Nutrition 0.000 description 1
- 229940031953 sorbitan monopalmitate Drugs 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 239000001589 sorbitan tristearate Substances 0.000 description 1
- 235000011078 sorbitan tristearate Nutrition 0.000 description 1
- 229960004129 sorbitan tristearate Drugs 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
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| JP2009141844A JP2010285403A (ja) | 2009-06-15 | 2009-06-15 | 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 |
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| JP2009141844A JP2010285403A (ja) | 2009-06-15 | 2009-06-15 | 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 |
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| JP2010285403A true JP2010285403A (ja) | 2010-12-24 |
| JP2010285403A5 JP2010285403A5 (enrdf_load_stackoverflow) | 2012-06-21 |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011012098A (ja) * | 2009-06-30 | 2011-01-20 | Tokyo Ohka Kogyo Co Ltd | 接着剤組成物および接着フィルム |
| JP2013145368A (ja) * | 2011-12-16 | 2013-07-25 | Jsr Corp | レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法 |
| JP2017119670A (ja) * | 2015-12-24 | 2017-07-06 | 信越化学工業株式会社 | 有機膜形成用化合物、有機膜形成用組成物、有機膜形成方法、及びパターン形成方法 |
| JP2017226837A (ja) * | 2016-06-21 | 2017-12-28 | 東京応化工業株式会社 | 樹脂の製造方法、及び相分離構造を含む構造体の製造方法 |
| US10444628B2 (en) * | 2015-12-24 | 2019-10-15 | Shin-Etsu Chemical Co., Ltd. | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process |
| KR20220152194A (ko) | 2020-03-10 | 2022-11-15 | 디아이씨 가부시끼가이샤 | (메타)아크릴레이트 수지, 활성 에너지선 경화성 (메타)아크릴레이트 수지 조성물, 및 레지스트 하층막, 그리고 (메타)아크릴레이트 수지의 제조 방법 |
| KR20230021721A (ko) | 2020-09-28 | 2023-02-14 | 디아이씨 가부시끼가이샤 | 페놀성 수산기 함유 수지, 알칼리 현상성 레지스트용 수지 조성물, 및 레지스트 경화성 수지 조성물, 그리고, 페놀성 수산기 함유 수지의 제조 방법 |
| KR20230051687A (ko) | 2020-12-15 | 2023-04-18 | 디아이씨 가부시끼가이샤 | 중합성 화합물, 활성 에너지선 경화성 수지 조성물, 경화물, 레지스트용 조성물, 및 레지스트막 |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011012098A (ja) * | 2009-06-30 | 2011-01-20 | Tokyo Ohka Kogyo Co Ltd | 接着剤組成物および接着フィルム |
| JP2013145368A (ja) * | 2011-12-16 | 2013-07-25 | Jsr Corp | レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法 |
| JP2017119670A (ja) * | 2015-12-24 | 2017-07-06 | 信越化学工業株式会社 | 有機膜形成用化合物、有機膜形成用組成物、有機膜形成方法、及びパターン形成方法 |
| US10429739B2 (en) | 2015-12-24 | 2019-10-01 | Shin-Etsu Chemical Co., Ltd. | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process |
| US10444628B2 (en) * | 2015-12-24 | 2019-10-15 | Shin-Etsu Chemical Co., Ltd. | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process |
| JP2017226837A (ja) * | 2016-06-21 | 2017-12-28 | 東京応化工業株式会社 | 樹脂の製造方法、及び相分離構造を含む構造体の製造方法 |
| JP7126338B2 (ja) | 2016-06-21 | 2022-08-26 | 東京応化工業株式会社 | 樹脂の製造方法、及び相分離構造を含む構造体の製造方法 |
| KR20220152194A (ko) | 2020-03-10 | 2022-11-15 | 디아이씨 가부시끼가이샤 | (메타)아크릴레이트 수지, 활성 에너지선 경화성 (메타)아크릴레이트 수지 조성물, 및 레지스트 하층막, 그리고 (메타)아크릴레이트 수지의 제조 방법 |
| KR20230021721A (ko) | 2020-09-28 | 2023-02-14 | 디아이씨 가부시끼가이샤 | 페놀성 수산기 함유 수지, 알칼리 현상성 레지스트용 수지 조성물, 및 레지스트 경화성 수지 조성물, 그리고, 페놀성 수산기 함유 수지의 제조 방법 |
| KR20230051687A (ko) | 2020-12-15 | 2023-04-18 | 디아이씨 가부시끼가이샤 | 중합성 화합물, 활성 에너지선 경화성 수지 조성물, 경화물, 레지스트용 조성물, 및 레지스트막 |
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