JP2010248629A5 - - Google Patents
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- Publication number
- JP2010248629A5 JP2010248629A5 JP2010071754A JP2010071754A JP2010248629A5 JP 2010248629 A5 JP2010248629 A5 JP 2010248629A5 JP 2010071754 A JP2010071754 A JP 2010071754A JP 2010071754 A JP2010071754 A JP 2010071754A JP 2010248629 A5 JP2010248629 A5 JP 2010248629A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- forming material
- forming
- evaporation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 20
- 239000000758 substrate Substances 0.000 claims 16
- 238000001704 evaporation Methods 0.000 claims 10
- 230000008020 evaporation Effects 0.000 claims 8
- 238000000034 method Methods 0.000 claims 4
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010071754A JP5417236B2 (ja) | 2009-03-27 | 2010-03-26 | 照明装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009080199 | 2009-03-27 | ||
| JP2009080199 | 2009-03-27 | ||
| JP2010071754A JP5417236B2 (ja) | 2009-03-27 | 2010-03-26 | 照明装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010248629A JP2010248629A (ja) | 2010-11-04 |
| JP2010248629A5 true JP2010248629A5 (enExample) | 2013-02-14 |
| JP5417236B2 JP5417236B2 (ja) | 2014-02-12 |
Family
ID=42784563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010071754A Expired - Fee Related JP5417236B2 (ja) | 2009-03-27 | 2010-03-26 | 照明装置の作製方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20100247747A1 (enExample) |
| JP (1) | JP5417236B2 (enExample) |
| KR (1) | KR20100108283A (enExample) |
| TW (1) | TWI532861B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5715802B2 (ja) * | 2010-11-19 | 2015-05-13 | 株式会社半導体エネルギー研究所 | 成膜装置 |
| JP5852855B2 (ja) * | 2010-11-24 | 2016-02-03 | 株式会社半導体エネルギー研究所 | 発光素子、発光装置、照明装置、及び電子機器 |
| KR101218346B1 (ko) | 2011-02-09 | 2013-01-21 | 서울대학교산학협력단 | 벌크 이종접합을 갖는 저분자 박막 및 이를 포함하는 유기 태양전지의 형성방법 |
| CN103429783A (zh) * | 2011-03-18 | 2013-12-04 | 东京毅力科创株式会社 | 成膜装置、成膜方法、有机发光元件的制造方法和有机发光元件 |
| CN103871851B (zh) * | 2012-12-18 | 2017-12-19 | 北京创昱科技有限公司 | 一种铜铟镓硒薄膜电池共蒸发线性源阵列的排布 |
| CN103305794B (zh) * | 2013-06-09 | 2016-03-02 | 京东方科技集团股份有限公司 | 一种有机镀膜装置及方法 |
| US9209422B2 (en) * | 2013-12-31 | 2015-12-08 | Lg Display Co., Ltd. | Organic light emitting display device with micro-cavity structure |
| JP6627620B2 (ja) * | 2016-04-05 | 2020-01-08 | 株式会社オートネットワーク技術研究所 | コネクタ、接続状態検知システム、および、端子 |
| KR102353663B1 (ko) | 2016-05-20 | 2022-01-19 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 소자, 발광 장치, 전자 기기, 및 조명 장치 |
| KR20180002505A (ko) | 2016-06-29 | 2018-01-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 소자의 제작 방법 |
| US20180010239A1 (en) | 2016-07-06 | 2018-01-11 | United Technologies Corporation | Vapor deposition apparatus and method |
| CN107799658B (zh) | 2016-08-29 | 2021-05-28 | 株式会社半导体能源研究所 | 发光元件、发光装置、电子设备、照明装置及有机金属配合物 |
| WO2018184949A1 (en) * | 2017-04-07 | 2018-10-11 | Applied Materials, Inc. | Method for cleaning a vacuum chamber, apparatus for vacuum processing of a substrate, and system for the manufacture of devices having organic materials |
| CN108728801B (zh) * | 2018-05-28 | 2019-11-12 | 深圳市华星光电技术有限公司 | 蒸镀装置及蒸镀方法 |
| GB2574401B (en) * | 2018-06-04 | 2022-11-23 | Dyson Technology Ltd | A Device |
| GB2574400B (en) | 2018-06-04 | 2022-11-23 | Dyson Technology Ltd | A Device |
| EP3803960B1 (en) * | 2018-06-07 | 2023-11-08 | Silanna UV Technologies Pte Ltd | Optoelectronic device |
| KR20250044414A (ko) * | 2022-08-04 | 2025-03-31 | 이매진 코퍼레이션 | 개선된 콜리메이션을 갖는 증발 시스템 |
| KR20240069268A (ko) * | 2022-11-11 | 2024-05-20 | 주식회사 야스 | 증착 시스템 |
| US20250250682A1 (en) * | 2024-02-06 | 2025-08-07 | Thin Film Service, Inc. | Systems and Methods for Depositing Alternating Layers for a Diamond-Like Coating |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4681773A (en) * | 1981-03-27 | 1987-07-21 | American Telephone And Telegraph Company At&T Bell Laboratories | Apparatus for simultaneous molecular beam deposition on a plurality of substrates |
| JPS63274756A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| FR2733253B1 (fr) * | 1995-04-24 | 1997-06-13 | Commissariat Energie Atomique | Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface |
| GB9515929D0 (en) * | 1995-08-03 | 1995-10-04 | Fisons Plc | Sources used in molecular beam epitaxy |
| CH692000A5 (de) * | 1995-11-13 | 2001-12-31 | Unaxis Balzers Ag | Beschichtungskammer, Substratträger hierfür, Verfahren zum Vakuumbedampfen sowie Beschichtungsverfahren. |
| TW387152B (en) * | 1996-07-24 | 2000-04-11 | Tdk Corp | Solar battery and manufacturing method thereof |
| US6053981A (en) * | 1998-09-15 | 2000-04-25 | Coherent, Inc. | Effusion cell and method of use in molecular beam epitaxy |
| JP4469430B2 (ja) * | 1998-11-30 | 2010-05-26 | 株式会社アルバック | 蒸着装置 |
| JP2001209981A (ja) * | 1999-02-09 | 2001-08-03 | Ricoh Co Ltd | 光ディスク基板成膜装置、光ディスク基板成膜方法、基板ホルダーの製造方法、基板ホルダー、光ディスクおよび相変化記録型光ディスク |
| JP2001081558A (ja) * | 1999-09-13 | 2001-03-27 | Asahi Optical Co Ltd | 成膜装置および成膜方法 |
| US6082296A (en) * | 1999-09-22 | 2000-07-04 | Xerox Corporation | Thin film deposition chamber |
| JP4268303B2 (ja) * | 2000-02-01 | 2009-05-27 | キヤノンアネルバ株式会社 | インライン型基板処理装置 |
| US20020069970A1 (en) * | 2000-03-07 | 2002-06-13 | Applied Materials, Inc. | Temperature controlled semiconductor processing chamber liner |
| US20020011205A1 (en) * | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| ATE497028T1 (de) * | 2000-06-22 | 2011-02-15 | Panasonic Elec Works Co Ltd | Vorrichtung und verfahren zum vakuum-ausdampfen |
| JP2002071944A (ja) * | 2000-08-24 | 2002-03-12 | Toyo Commun Equip Co Ltd | 光バンドパスフィルタの製造装置及び製造方法 |
| JP2003193217A (ja) * | 2001-12-25 | 2003-07-09 | Nippon Seiki Co Ltd | 蒸着装置 |
| KR100467805B1 (ko) * | 2002-01-22 | 2005-01-24 | 학교법인연세대학교 | 박막두께분포를 조절 가능한 선형 및 평면형 증발원 |
| US6565231B1 (en) * | 2002-05-28 | 2003-05-20 | Eastman Kodak Company | OLED area illumination lighting apparatus |
| US6771021B2 (en) * | 2002-05-28 | 2004-08-03 | Eastman Kodak Company | Lighting apparatus with flexible OLED area illumination light source and fixture |
| US6787990B2 (en) * | 2002-05-28 | 2004-09-07 | Eastman Kodak Company | OLED area illumination light source having flexible substrate on a support |
| TWI277363B (en) * | 2002-08-30 | 2007-03-21 | Semiconductor Energy Lab | Fabrication system, light-emitting device and fabricating method of organic compound-containing layer |
| KR100889758B1 (ko) * | 2002-09-03 | 2009-03-20 | 삼성모바일디스플레이주식회사 | 유기박막 형성장치의 가열용기 |
| DE10316228B3 (de) * | 2003-04-09 | 2004-12-16 | Dr. Eberl Mbe-Komponenten Gmbh | Effusionszelle mit verbesserter Temperaturkontrolle des Tiegels |
| US7339139B2 (en) * | 2003-10-03 | 2008-03-04 | Darly Custom Technology, Inc. | Multi-layered radiant thermal evaporator and method of use |
| US7439208B2 (en) * | 2003-12-01 | 2008-10-21 | Superconductor Technologies, Inc. | Growth of in-situ thin films by reactive evaporation |
| US20050229856A1 (en) * | 2004-04-20 | 2005-10-20 | Malik Roger J | Means and method for a liquid metal evaporation source with integral level sensor and external reservoir |
| JP4653418B2 (ja) * | 2004-05-17 | 2011-03-16 | 芝浦メカトロニクス株式会社 | 真空処理装置および光ディスクの製造方法 |
| JP4027914B2 (ja) * | 2004-05-21 | 2007-12-26 | 株式会社半導体エネルギー研究所 | 照明装置及びそれを用いた機器 |
| JP2006002200A (ja) * | 2004-06-16 | 2006-01-05 | Seiko Epson Corp | 蒸着装置、蒸着方法、有機el装置、および電子機器 |
| US7667389B2 (en) * | 2004-12-06 | 2010-02-23 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting element, light emitting device, and electronic device |
| US20060244373A1 (en) * | 2005-04-28 | 2006-11-02 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method for manufacturing thereof |
| JP2008108611A (ja) * | 2006-10-26 | 2008-05-08 | Fuji Electric Holdings Co Ltd | 蒸着層の製造方法および製造装置 |
| JP4293314B2 (ja) * | 2007-01-26 | 2009-07-08 | 財団法人山形県産業技術振興機構 | 照明装置 |
| US8444926B2 (en) * | 2007-01-30 | 2013-05-21 | Applied Materials, Inc. | Processing chamber with heated chamber liner |
| US20090020070A1 (en) * | 2007-07-19 | 2009-01-22 | Michael Schafer | Vacuum evaporation apparatus for solid materials |
-
2010
- 2010-03-23 US US12/729,881 patent/US20100247747A1/en not_active Abandoned
- 2010-03-24 TW TW099108714A patent/TWI532861B/zh not_active IP Right Cessation
- 2010-03-26 KR KR1020100027140A patent/KR20100108283A/ko not_active Ceased
- 2010-03-26 JP JP2010071754A patent/JP5417236B2/ja not_active Expired - Fee Related
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