JP2010248629A5 - - Google Patents

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Publication number
JP2010248629A5
JP2010248629A5 JP2010071754A JP2010071754A JP2010248629A5 JP 2010248629 A5 JP2010248629 A5 JP 2010248629A5 JP 2010071754 A JP2010071754 A JP 2010071754A JP 2010071754 A JP2010071754 A JP 2010071754A JP 2010248629 A5 JP2010248629 A5 JP 2010248629A5
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JP
Japan
Prior art keywords
film
substrate
forming material
forming
evaporation source
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JP2010071754A
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English (en)
Japanese (ja)
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JP5417236B2 (ja
JP2010248629A (ja
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Priority to JP2010071754A priority Critical patent/JP5417236B2/ja
Priority claimed from JP2010071754A external-priority patent/JP5417236B2/ja
Publication of JP2010248629A publication Critical patent/JP2010248629A/ja
Publication of JP2010248629A5 publication Critical patent/JP2010248629A5/ja
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Publication of JP5417236B2 publication Critical patent/JP5417236B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010071754A 2009-03-27 2010-03-26 照明装置の作製方法 Expired - Fee Related JP5417236B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010071754A JP5417236B2 (ja) 2009-03-27 2010-03-26 照明装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009080199 2009-03-27
JP2009080199 2009-03-27
JP2010071754A JP5417236B2 (ja) 2009-03-27 2010-03-26 照明装置の作製方法

Publications (3)

Publication Number Publication Date
JP2010248629A JP2010248629A (ja) 2010-11-04
JP2010248629A5 true JP2010248629A5 (enExample) 2013-02-14
JP5417236B2 JP5417236B2 (ja) 2014-02-12

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Family Applications (1)

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JP2010071754A Expired - Fee Related JP5417236B2 (ja) 2009-03-27 2010-03-26 照明装置の作製方法

Country Status (4)

Country Link
US (1) US20100247747A1 (enExample)
JP (1) JP5417236B2 (enExample)
KR (1) KR20100108283A (enExample)
TW (1) TWI532861B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5715802B2 (ja) * 2010-11-19 2015-05-13 株式会社半導体エネルギー研究所 成膜装置
JP5852855B2 (ja) * 2010-11-24 2016-02-03 株式会社半導体エネルギー研究所 発光素子、発光装置、照明装置、及び電子機器
KR101218346B1 (ko) 2011-02-09 2013-01-21 서울대학교산학협력단 벌크 이종접합을 갖는 저분자 박막 및 이를 포함하는 유기 태양전지의 형성방법
CN103429783A (zh) * 2011-03-18 2013-12-04 东京毅力科创株式会社 成膜装置、成膜方法、有机发光元件的制造方法和有机发光元件
CN103871851B (zh) * 2012-12-18 2017-12-19 北京创昱科技有限公司 一种铜铟镓硒薄膜电池共蒸发线性源阵列的排布
CN103305794B (zh) * 2013-06-09 2016-03-02 京东方科技集团股份有限公司 一种有机镀膜装置及方法
US9209422B2 (en) * 2013-12-31 2015-12-08 Lg Display Co., Ltd. Organic light emitting display device with micro-cavity structure
JP6627620B2 (ja) * 2016-04-05 2020-01-08 株式会社オートネットワーク技術研究所 コネクタ、接続状態検知システム、および、端子
KR102353663B1 (ko) 2016-05-20 2022-01-19 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광 소자, 발광 장치, 전자 기기, 및 조명 장치
KR20180002505A (ko) 2016-06-29 2018-01-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광 소자의 제작 방법
US20180010239A1 (en) 2016-07-06 2018-01-11 United Technologies Corporation Vapor deposition apparatus and method
CN107799658B (zh) 2016-08-29 2021-05-28 株式会社半导体能源研究所 发光元件、发光装置、电子设备、照明装置及有机金属配合物
WO2018184949A1 (en) * 2017-04-07 2018-10-11 Applied Materials, Inc. Method for cleaning a vacuum chamber, apparatus for vacuum processing of a substrate, and system for the manufacture of devices having organic materials
CN108728801B (zh) * 2018-05-28 2019-11-12 深圳市华星光电技术有限公司 蒸镀装置及蒸镀方法
GB2574401B (en) * 2018-06-04 2022-11-23 Dyson Technology Ltd A Device
GB2574400B (en) 2018-06-04 2022-11-23 Dyson Technology Ltd A Device
EP3803960B1 (en) * 2018-06-07 2023-11-08 Silanna UV Technologies Pte Ltd Optoelectronic device
KR20250044414A (ko) * 2022-08-04 2025-03-31 이매진 코퍼레이션 개선된 콜리메이션을 갖는 증발 시스템
KR20240069268A (ko) * 2022-11-11 2024-05-20 주식회사 야스 증착 시스템
US20250250682A1 (en) * 2024-02-06 2025-08-07 Thin Film Service, Inc. Systems and Methods for Depositing Alternating Layers for a Diamond-Like Coating

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681773A (en) * 1981-03-27 1987-07-21 American Telephone And Telegraph Company At&T Bell Laboratories Apparatus for simultaneous molecular beam deposition on a plurality of substrates
JPS63274756A (ja) * 1987-04-28 1988-11-11 Toda Kogyo Corp 真空蒸着多層薄膜形成装置
FR2733253B1 (fr) * 1995-04-24 1997-06-13 Commissariat Energie Atomique Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface
GB9515929D0 (en) * 1995-08-03 1995-10-04 Fisons Plc Sources used in molecular beam epitaxy
CH692000A5 (de) * 1995-11-13 2001-12-31 Unaxis Balzers Ag Beschichtungskammer, Substratträger hierfür, Verfahren zum Vakuumbedampfen sowie Beschichtungsverfahren.
TW387152B (en) * 1996-07-24 2000-04-11 Tdk Corp Solar battery and manufacturing method thereof
US6053981A (en) * 1998-09-15 2000-04-25 Coherent, Inc. Effusion cell and method of use in molecular beam epitaxy
JP4469430B2 (ja) * 1998-11-30 2010-05-26 株式会社アルバック 蒸着装置
JP2001209981A (ja) * 1999-02-09 2001-08-03 Ricoh Co Ltd 光ディスク基板成膜装置、光ディスク基板成膜方法、基板ホルダーの製造方法、基板ホルダー、光ディスクおよび相変化記録型光ディスク
JP2001081558A (ja) * 1999-09-13 2001-03-27 Asahi Optical Co Ltd 成膜装置および成膜方法
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
JP4268303B2 (ja) * 2000-02-01 2009-05-27 キヤノンアネルバ株式会社 インライン型基板処理装置
US20020069970A1 (en) * 2000-03-07 2002-06-13 Applied Materials, Inc. Temperature controlled semiconductor processing chamber liner
US20020011205A1 (en) * 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
ATE497028T1 (de) * 2000-06-22 2011-02-15 Panasonic Elec Works Co Ltd Vorrichtung und verfahren zum vakuum-ausdampfen
JP2002071944A (ja) * 2000-08-24 2002-03-12 Toyo Commun Equip Co Ltd 光バンドパスフィルタの製造装置及び製造方法
JP2003193217A (ja) * 2001-12-25 2003-07-09 Nippon Seiki Co Ltd 蒸着装置
KR100467805B1 (ko) * 2002-01-22 2005-01-24 학교법인연세대학교 박막두께분포를 조절 가능한 선형 및 평면형 증발원
US6565231B1 (en) * 2002-05-28 2003-05-20 Eastman Kodak Company OLED area illumination lighting apparatus
US6771021B2 (en) * 2002-05-28 2004-08-03 Eastman Kodak Company Lighting apparatus with flexible OLED area illumination light source and fixture
US6787990B2 (en) * 2002-05-28 2004-09-07 Eastman Kodak Company OLED area illumination light source having flexible substrate on a support
TWI277363B (en) * 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
KR100889758B1 (ko) * 2002-09-03 2009-03-20 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
DE10316228B3 (de) * 2003-04-09 2004-12-16 Dr. Eberl Mbe-Komponenten Gmbh Effusionszelle mit verbesserter Temperaturkontrolle des Tiegels
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
US7439208B2 (en) * 2003-12-01 2008-10-21 Superconductor Technologies, Inc. Growth of in-situ thin films by reactive evaporation
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
JP4653418B2 (ja) * 2004-05-17 2011-03-16 芝浦メカトロニクス株式会社 真空処理装置および光ディスクの製造方法
JP4027914B2 (ja) * 2004-05-21 2007-12-26 株式会社半導体エネルギー研究所 照明装置及びそれを用いた機器
JP2006002200A (ja) * 2004-06-16 2006-01-05 Seiko Epson Corp 蒸着装置、蒸着方法、有機el装置、および電子機器
US7667389B2 (en) * 2004-12-06 2010-02-23 Semiconductor Energy Laboratory Co., Ltd. Light emitting element, light emitting device, and electronic device
US20060244373A1 (en) * 2005-04-28 2006-11-02 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and method for manufacturing thereof
JP2008108611A (ja) * 2006-10-26 2008-05-08 Fuji Electric Holdings Co Ltd 蒸着層の製造方法および製造装置
JP4293314B2 (ja) * 2007-01-26 2009-07-08 財団法人山形県産業技術振興機構 照明装置
US8444926B2 (en) * 2007-01-30 2013-05-21 Applied Materials, Inc. Processing chamber with heated chamber liner
US20090020070A1 (en) * 2007-07-19 2009-01-22 Michael Schafer Vacuum evaporation apparatus for solid materials

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