JP2010232494A - 裏面入射型固体撮像素子 - Google Patents
裏面入射型固体撮像素子 Download PDFInfo
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- JP2010232494A JP2010232494A JP2009079556A JP2009079556A JP2010232494A JP 2010232494 A JP2010232494 A JP 2010232494A JP 2009079556 A JP2009079556 A JP 2009079556A JP 2009079556 A JP2009079556 A JP 2009079556A JP 2010232494 A JP2010232494 A JP 2010232494A
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- 239000004065 semiconductor Substances 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 238000001514 detection method Methods 0.000 claims abstract description 19
- 238000003384 imaging method Methods 0.000 claims description 43
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 abstract description 10
- 230000006866 deterioration Effects 0.000 abstract description 2
- 238000001444 catalytic combustion detection Methods 0.000 description 22
- 239000012535 impurity Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000002955 isolation Methods 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000000635 electron micrograph Methods 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000005380 borophosphosilicate glass Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
- H01L27/14607—Geometry of the photosensitive area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1464—Back illuminated imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14806—Structural or functional details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
【解決手段】 この裏面入射型固体撮像素子は、裏面側に光入射面を有する半導体基板4と、半導体基板4の光入射面とは反対側の光検出面に設けられた電荷転送電極2とを備えた裏面入射型固体撮像素子において、光検出面は凹凸面を有している。光検出面が凹凸面を有していることにより、入射光の位相に対して、凹凸面で反射される光が分散した位相差を有するので、これらの干渉光同士が相殺され、エタロン現象が抑制される。したがって、この裏面入射型固体撮像素子によれば、高品質な画像を取得することができる。
【選択図】 図4
Description
「Etaloning in Back-Illuminated CCDs」, ROPER SCIENTIFIC TECHINICAL NOTE(ロパー・サイエンティフィック・テクニカルノート)、ROPER SCIENTIFIC(ロパー・サイエンティフィック社)発行、2000年、No.7
入射光Lは、半導体基板の裏面(光入射面)から入射する。すなわち、半導体基板は光入射面を有している。この画素は、基板表面側から順番に保護膜1、電荷転送電極2(=図3に示した各電荷転送電極m1〜mM)、絶縁層3、Siからなる半導体基板4、反射防止膜5を備えている。半導体基板4は、P型半導体基板4Cと、P型半導体基板4C上に形成されたN型半導体層4Aと、P型半導体基板4Cの裏面側に形成されたアキュムレーション層4Dと、CCDチャネルの両側に形成されたアイソレーション領域4Bとを備えている。P型半導体基板4CとN型半導体層4Aとは接触してPN接合を形成しており、埋め込みチャネル型CCDが構成されている。なお、N型半導体層4A(PN接合)は省略することもでき、この場合には、当該CCDは表面チャネル型CCDとして機能する。
Claims (3)
- 裏面側に光入射面を有する半導体基板と、
前記半導体基板の前記光入射面とは反対側の光検出面に設けられた電荷転送電極と、
を備えた裏面入射型固体撮像素子において、
前記光検出面は凹凸面を有していることを特徴とする裏面入射型固体撮像素子。 - 前記凹凸面は、前記光検出面のみに形成されていることを特徴とする請求項1に記載の裏面入射型固体撮像素子。
- 前記凹凸面内の各凹凸のパターンは、前記裏面入射型固体撮像素子の各画素内において同一であることを特徴とする請求項1又は2に記載の裏面入射型固体撮像素子。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009079556A JP5394791B2 (ja) | 2009-03-27 | 2009-03-27 | 裏面入射型固体撮像素子 |
KR1020117024972A KR101688249B1 (ko) | 2009-03-27 | 2010-03-24 | 이면 입사형 고체 촬상 소자 |
CN201080014112.2A CN102365741B (zh) | 2009-03-27 | 2010-03-24 | 背面入射型固体摄像元件 |
PCT/JP2010/055084 WO2010110317A1 (ja) | 2009-03-27 | 2010-03-24 | 裏面入射型固体撮像素子 |
EP10756113.6A EP2413362B1 (en) | 2009-03-27 | 2010-03-24 | Back-illuminated solid-state image pickup device |
US13/258,680 US9000492B2 (en) | 2009-03-27 | 2010-03-24 | Back-illuminated solid-state image pickup device |
TW099109165A TWI482273B (zh) | 2009-03-27 | 2010-03-26 | Back-emitting type solid-state imaging element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009079556A JP5394791B2 (ja) | 2009-03-27 | 2009-03-27 | 裏面入射型固体撮像素子 |
Publications (2)
Publication Number | Publication Date |
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JP2010232494A true JP2010232494A (ja) | 2010-10-14 |
JP5394791B2 JP5394791B2 (ja) | 2014-01-22 |
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JP2009079556A Active JP5394791B2 (ja) | 2009-03-27 | 2009-03-27 | 裏面入射型固体撮像素子 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9000492B2 (ja) |
EP (1) | EP2413362B1 (ja) |
JP (1) | JP5394791B2 (ja) |
KR (1) | KR101688249B1 (ja) |
CN (1) | CN102365741B (ja) |
TW (1) | TWI482273B (ja) |
WO (1) | WO2010110317A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016039046A1 (ja) * | 2014-09-09 | 2016-03-17 | 浜松ホトニクス株式会社 | 裏面入射型固体撮像装置 |
JPWO2018138851A1 (ja) * | 2017-01-26 | 2019-12-12 | 国立大学法人東北大学 | 固体光検出器 |
WO2021149686A1 (ja) | 2020-01-21 | 2021-07-29 | 浜松ホトニクス株式会社 | 裏面入射型固体撮像装置の製造方法 |
WO2021199597A1 (ja) * | 2020-04-03 | 2021-10-07 | 浜松ホトニクス株式会社 | 固体撮像装置 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9911781B2 (en) * | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
JP6054069B2 (ja) * | 2012-06-18 | 2016-12-27 | 浜松ホトニクス株式会社 | 固体撮像装置 |
US11791432B2 (en) | 2013-05-22 | 2023-10-17 | W&Wsens Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
US11309444B1 (en) | 2015-11-20 | 2022-04-19 | W&W Sens Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
JP2016001633A (ja) | 2014-06-11 | 2016-01-07 | ソニー株式会社 | 固体撮像素子、および電子装置 |
EP3407386B1 (en) | 2016-01-21 | 2021-10-20 | Sony Group Corporation | Image capturing element and electronic device |
JP7089931B2 (ja) | 2018-04-16 | 2022-06-23 | 浜松ホトニクス株式会社 | 裏面入射型半導体光検出素子の製造方法 |
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JPH06104414A (ja) * | 1992-09-18 | 1994-04-15 | Toshiba Corp | 固体撮像装置 |
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2009
- 2009-03-27 JP JP2009079556A patent/JP5394791B2/ja active Active
-
2010
- 2010-03-24 KR KR1020117024972A patent/KR101688249B1/ko active IP Right Grant
- 2010-03-24 US US13/258,680 patent/US9000492B2/en active Active
- 2010-03-24 CN CN201080014112.2A patent/CN102365741B/zh active Active
- 2010-03-24 WO PCT/JP2010/055084 patent/WO2010110317A1/ja active Application Filing
- 2010-03-24 EP EP10756113.6A patent/EP2413362B1/en active Active
- 2010-03-26 TW TW099109165A patent/TWI482273B/zh active
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Publication number | Priority date | Publication date | Assignee | Title |
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WO2016039046A1 (ja) * | 2014-09-09 | 2016-03-17 | 浜松ホトニクス株式会社 | 裏面入射型固体撮像装置 |
JP2016058507A (ja) * | 2014-09-09 | 2016-04-21 | 浜松ホトニクス株式会社 | 裏面入射型固体撮像装置 |
US10811459B2 (en) | 2014-09-09 | 2020-10-20 | Hamamatsu Photonics K.K. | Backside incidence type solid-state image pickup device |
JPWO2018138851A1 (ja) * | 2017-01-26 | 2019-12-12 | 国立大学法人東北大学 | 固体光検出器 |
WO2021149686A1 (ja) | 2020-01-21 | 2021-07-29 | 浜松ホトニクス株式会社 | 裏面入射型固体撮像装置の製造方法 |
KR20220129011A (ko) | 2020-01-21 | 2022-09-22 | 하마마츠 포토닉스 가부시키가이샤 | 이면 입사형 고체 촬상 장치의 제조 방법 |
WO2021199597A1 (ja) * | 2020-04-03 | 2021-10-07 | 浜松ホトニクス株式会社 | 固体撮像装置 |
Also Published As
Publication number | Publication date |
---|---|
KR101688249B1 (ko) | 2016-12-20 |
US9000492B2 (en) | 2015-04-07 |
EP2413362A1 (en) | 2012-02-01 |
EP2413362B1 (en) | 2016-02-17 |
CN102365741B (zh) | 2015-06-03 |
US20120038016A1 (en) | 2012-02-16 |
EP2413362A4 (en) | 2013-05-01 |
TW201104857A (en) | 2011-02-01 |
KR20110137813A (ko) | 2011-12-23 |
TWI482273B (zh) | 2015-04-21 |
JP5394791B2 (ja) | 2014-01-22 |
WO2010110317A1 (ja) | 2010-09-30 |
CN102365741A (zh) | 2012-02-29 |
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