JP2010187025A - 露光装置及びデバイス製造方法 - Google Patents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract
【解決手段】液浸露光装置が開示される。投影系と基板との間に液体を供給する液体供給システムの少なくとも一部が走査中に基板上面に実質的に平行な面内に移動可能である。この一部は、この一部と基板との間の相対速度を低減させるよう運動する。これにより投影系に対する基板の速度を増加させることができる。
【選択図】図6
Description
投影系と、
前記投影系により像が形成される基板を保持するテーブルと、
前記投影系と基板との間の空間に液体を供給する液体供給システムと、を備え、
前記液体供給システムの少なくとも一部は、前記投影系及び基板に独立して前記投影系及び基板に対して基板上面に実質的に平行な少なくとも1つの方向に移動可能である露光装置が提供される。
投影系と、
前記投影系により像が形成される基板を保持するテーブルと、
前記投影系を取り巻き、前記投影系と基板との間の空間を含む容積に液体を少なくとも部分的に保持するバリア部材を備える液体供給システムと、を備え、
前記バリア部材は、基板上面に実質的に平行な面内で第1の方向に基板に独立して移動可能であり、
前記バリア部材は、露光装置のスリット長さに等しい距離を前記第1の方向に少なくとも移動可能であるような大きさ及び形状とされている露光装置が提供される。
投影系と、
前記投影系により像が形成される基板を保持するテーブルと、
前記投影系と基板との間の空間に液体を供給する液体供給システムと、
使用時には液体中において前記投影系の周囲に位置しており、前記液体供給システムから液体を通じての前記投影系への力の伝達を少なくとも低減する力分離部材と、を備える露光装置が提供される。
液体供給システムの一部と基板との間にシールを形成する液体供給システムを用いて投影系と基板との間に液体を供給し、
パターンが付与された放射ビームを基板に投影する投影系を使用し、
前記投影系の下方で基板を移動し、
基板の移動中に、基板と液体供給システムの一部との相対速度を低減させるような速度及び方向に液体供給システムの当該一部を移動するデバイス製造方法が提供される。
Claims (5)
- 投影系と、
前記投影系により像が形成される基板を保持するテーブルと、
前記投影系と基板との間の空間に液体を供給する液体供給システムと、
使用時には液体中において前記投影系の周囲に位置しており、前記液体供給システムから液体を通じての前記投影系への力の伝達を少なくとも低減する力分離部材と、を備えることを特徴とする露光装置。 - 前記力分離部材はリング形状を有することを特徴とする請求項1に記載の露光装置。
- 基板または前記投影系を支持するフレームをさらに備え、前記力分離部材は前記フレームに取り付けられていることを特徴とする請求項1または2に記載の露光装置。
- 前記力分離部材は前記投影系から動的に分離されていることを特徴とする請求項1から3のいずれかに記載の露光装置。
- 前記液体供給システムは、前記空間を取り巻いており、かつ露光装置の光軸から半径方向外側に向けて前記空間から液体が漏れ出すのに対して物理的な障壁を形成するバリア部材を含むことを特徴とする請求項1から4のいずれかに記載の露光装置。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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US11/274,888 US7656501B2 (en) | 2005-11-16 | 2005-11-16 | Lithographic apparatus |
US11/274,888 | 2005-11-16 | ||
US11/404,091 US7864292B2 (en) | 2005-11-16 | 2006-04-14 | Lithographic apparatus and device manufacturing method |
US11/404,091 | 2006-04-14 |
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JP2006310702A Division JP4567651B2 (ja) | 2005-11-16 | 2006-11-16 | 露光装置及びデバイス製造方法 |
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JP2010187025A true JP2010187025A (ja) | 2010-08-26 |
JP5008750B2 JP5008750B2 (ja) | 2012-08-22 |
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JP2008163625A Active JP4870726B2 (ja) | 2005-11-16 | 2008-06-23 | リソグラフィ装置 |
JP2010114261A Active JP5008750B2 (ja) | 2005-11-16 | 2010-05-18 | 露光装置 |
JP2011124242A Expired - Fee Related JP5180347B2 (ja) | 2005-11-16 | 2011-06-02 | リソグラフィ装置及びデバイス製造方法 |
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JP (3) | JP4870726B2 (ja) |
CN (1) | CN101361024B (ja) |
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JP2011205121A (ja) | 2011-10-13 |
US20070109512A1 (en) | 2007-05-17 |
CN101361024B (zh) | 2011-06-29 |
JP4870726B2 (ja) | 2012-02-08 |
CN101361024A (zh) | 2009-02-04 |
US7656501B2 (en) | 2010-02-02 |
JP2008277856A (ja) | 2008-11-13 |
JP5180347B2 (ja) | 2013-04-10 |
JP5008750B2 (ja) | 2012-08-22 |
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