JP2010181453A5 - - Google Patents
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- Publication number
- JP2010181453A5 JP2010181453A5 JP2009022492A JP2009022492A JP2010181453A5 JP 2010181453 A5 JP2010181453 A5 JP 2010181453A5 JP 2009022492 A JP2009022492 A JP 2009022492A JP 2009022492 A JP2009022492 A JP 2009022492A JP 2010181453 A5 JP2010181453 A5 JP 2010181453A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- underlayer film
- formula
- resist underlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims description 41
- 125000000962 organic group Chemical group 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000004414 alkyl thio group Chemical group 0.000 claims description 8
- 238000001459 lithography Methods 0.000 claims description 7
- 125000002723 alicyclic group Chemical group 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000004653 anthracenylene group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000004957 naphthylene group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 3
- 125000005138 alkoxysulfonyl group Chemical group 0.000 claims description 3
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000005278 alkyl sulfonyloxy group Chemical group 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical group OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- -1 1,4-dimethylbutylene group Chemical group 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000004810 2-methylpropylene group Chemical group [H]C([H])([H])C([H])(C([H])([H])[*:2])C([H])([H])[*:1] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004712 n-pentylthio group Chemical group C(CCCC)S* 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009022492A JP5333737B2 (ja) | 2009-02-03 | 2009-02-03 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009022492A JP5333737B2 (ja) | 2009-02-03 | 2009-02-03 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010181453A JP2010181453A (ja) | 2010-08-19 |
| JP2010181453A5 true JP2010181453A5 (enExample) | 2012-01-19 |
| JP5333737B2 JP5333737B2 (ja) | 2013-11-06 |
Family
ID=42763065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009022492A Active JP5333737B2 (ja) | 2009-02-03 | 2009-02-03 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5333737B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101804392B1 (ko) * | 2011-03-15 | 2017-12-04 | 닛산 가가쿠 고교 가부시키 가이샤 | 레지스트 하층막 형성 조성물 및 이를 이용한 레지스트 패턴의 형성 방법 |
| JP6083537B2 (ja) * | 2012-03-23 | 2017-02-22 | 日産化学工業株式会社 | Ｅｕｖリソグラフィー用レジスト下層膜形成組成物 |
| JP6132105B2 (ja) * | 2012-05-07 | 2017-05-24 | 日産化学工業株式会社 | レジスト下層膜形成組成物 |
| CN104885010B (zh) * | 2013-01-09 | 2019-06-04 | 日产化学工业株式会社 | 抗蚀剂下层膜形成用组合物 |
| JP6458952B2 (ja) * | 2013-09-27 | 2019-01-30 | 日産化学株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| US20190079397A1 (en) * | 2016-03-10 | 2019-03-14 | Nissan Chemical Corporation | Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms |
| JP2021042312A (ja) | 2019-09-11 | 2021-03-18 | キオクシア株式会社 | 化合物、ポリマー、パターン形成材料、パターン形成方法および半導体装置の製造方法 |
| US20250155813A1 (en) * | 2022-02-02 | 2025-05-15 | Nissan Chemical Corporation | Protective film forming composition |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10316894A (ja) * | 1997-05-20 | 1998-12-02 | Nippon Kayaku Co Ltd | 粉体塗料組成物 |
| US6846612B2 (en) * | 2002-02-01 | 2005-01-25 | Brewer Science Inc. | Organic anti-reflective coating compositions for advanced microlithography |
| JP2006182961A (ja) * | 2004-12-28 | 2006-07-13 | Stanley Electric Co Ltd | 熱硬化性透明樹脂組成物、該組成物を熱硬化してなる透光性硬化物、該硬化物で封止された発光ダイオード |
| CN101473270B (zh) * | 2006-06-19 | 2014-08-06 | 日产化学工业株式会社 | 含有具有羟基的缩合系树脂的形成抗蚀剂下层膜的组合物 |
| JP5158381B2 (ja) * | 2007-07-11 | 2013-03-06 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
-
2009
- 2009-02-03 JP JP2009022492A patent/JP5333737B2/ja active Active
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