JP2010118559A - 窒化物半導体デバイス - Google Patents
窒化物半導体デバイス Download PDFInfo
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Abstract
【解決手段】本発明の窒化物半導体デバイスは、(0001)面と、(0001)面以外の面とを有するGaN層103と、GaN層103と接し、インジウムを含むInGaN層104とを備え、InGaN層104において、(0001)面以外の面と接する部分のインジウムの組成比は、(0001)面と接する部分のインジウムの組成比に比べて高いことを特徴とする。
【選択図】図1
Description
Babara Neubert、他2名、"GaInN quantum wells grown on facets of selectively grown GaN stripes"、APPLIED PHYSICS LETTERS 87,182111(2005)、American Institute of Physics
上記構成により、特に(1−101)面に対する転位及び歪を大幅に低減することができるため、高効率かつ高輝度なレーザ素子を実現することができる。
この窒化物半導体デバイスは、サファイア基板101、GaN層102、GaN層103及びInGaN層104を備える。
InGaN層中に取り込まれたインジウム量を調べるため、窒化物半導体デバイスに対してカソードルミネッセンス(CL)法によるライン分析を行なった。このCL法による測定結果を図3A及び図3Bに示す。図3AはInGaN層形成に際してNEt3を用いた本実施の形態に係る窒化物半導体デバイスの測定結果を示す図であり、図3BはInGaN層形成に際してNEt3を用いない従来の窒化物半導体デバイスの測定結果を示す図である。図3A及び図3Bでは測定位置を横軸とし、縦軸を測定で観測された発光波長(CL発光波長)としている。また、CL法による測定の位置は各図にある挿し絵内に矢印にて示している。図3A及び図3Bでは見やすいために各領域の境界、つまりInGaN層における凸部上面の(0001)面の領域(図において(0001)top)と、凸部側面の(1−101)面の領域(図において(1−101))と、凸部以外の(0001)面の領域(図において(0001)bottom)との境界を破線にて示しており、一点鎖線は従来の窒化物半導体デバイスのInGaNのCL発光波長(約405nm)を表している。
図11Aは本実施例に係る窒化物半導体発光ダイオード(発光デバイス)の構造を示す断面図である。
図12Aは本実施例に係る窒化物半導体レーザ素子(発光デバイス)の構造を示す断面図である。
AlGaN/GaN超格子層908を構成するGaNは、不純物として炭素を含み、p型導電性とされている。そして、AlGaN/GaN超格子層908のGaNにおける炭素濃度は、(0001)面上に位置する部分で(11−22)面上に位置する部分に比べて高くなっており、(11−22)面の上方に位置する部分において1×1018cm-3以上とされている。このように、炭素濃度を設定することにより、(11−22)面の上方に位置するGaNをp型層として有効に機能させることができる。
102、103、202、204、205、804、806、808、810、902、904、906、909 GaN層
104、206 InGaN層
203、802、910 SiO2膜
801 シリコン基板
803 AlN層
805、809 AlGaN層
807 活性層
811、911 p側電極
812、912 n側電極
901 GaN自立基板
903、908 AlGaN/GaN超格子層
905 InGaN/InGaN多重量子井戸活性層
907 OFS層
908a、909a 領域
Claims (11)
- (0001)面と、(0001)面以外の面とを有する第1の窒化物半導体と、
前記第1の窒化物半導体に接し、インジウムを含む第2の窒化物半導体とを備え、
前記第2の窒化物半導体において、前記(0001)面以外の面と接する部分のインジウムの組成比は、前記(0001)面と接する部分のインジウムの組成比に比べて高い
窒化物半導体デバイス。 - 前記第2の窒化物半導体において、前記(0001)面以外の面と接する部分の厚さは、前記(0001)面と接する部分の厚さに比べて厚い
請求項1に記載の窒化物半導体デバイス。 - 前記(0001)面以外の面は、(1−101)面、(11−22)面、(1−102)面及び(11−24)面のいずれかである
請求項1に記載の窒化物半導体デバイス。 - 前記窒化物半導体デバイスは、前記第2の窒化物半導体を発光層とする発光デバイスである
請求項1に記載の窒化物半導体デバイス。 - 前記第2の窒化物半導体を挟んで前記第1の窒化物半導体と反対側、あるいは前記第1の窒化物半導体を挟んで前記第2の窒化物半導体と反対側に設けられ、且つアルミニウムを含む第3の窒化物半導体層をさらに有し、
前記第3の窒化物半導体において、前記(0001)面上に位置する部分の厚さは、前記(0001)面以外の面上に位置する部分の厚さに比べて厚い
請求項4に記載の窒化物半導体デバイス。 - 前記発光デバイスは、レーザ素子であり、
前記第3の窒化物半導体は、アルミニウムを含む複数の層が周期的に並んでなる周期構造体であり、
前記第3の窒化物半導体において、前記(0001)面上に位置する部分の前記周期構造体の周期は、前記(0001)面以外の面上に位置する部分の前記周期構造体の周期に比べて長い
請求項5に記載の窒化物半導体デバイス。 - 前記第3の窒化物半導体において、前記(0001)面以外の面上に位置する部分は、前記(0001)面上に位置する部分に比べて炭素濃度が高い
請求項6に記載の窒化物半導体デバイス。 - 前記周期構造体は、アルミニウムを1%未満含む層を有する
請求項6に記載の窒化物半導体デバイス。 - 前記第2の窒化物半導体は、導電性を有しており、
前記窒化物半導体デバイスは、さらに、前記第2の窒化物半導体の上方に接する形で設けられた電極を備える
請求項1に記載の窒化物半導体デバイス。 - 窒素及びインジウムを含むガスにトリエチルアミンを添加したガスを用いて、窒化物半導体の(0001)面以外の面上にインジウムを含む窒化物半導体を結晶成長させる
窒化物半導体デバイスの製造方法。 - トリエチルアミンを添加しないガスを用いて窒化物半導体を結晶成長させる工程をさらに含み、
トリエチルアミンを添加したガスを用いて結晶成長した窒化物半導体は、トリエチルアミンを添加しないガスを用いて結晶成長した窒化物半導体に比べ、炭素濃度が高いか、水素濃度が低い
請求項10に記載の窒化物半導体デバイスの製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008291544A JP5167081B2 (ja) | 2008-11-13 | 2008-11-13 | 窒化物半導体デバイス |
PCT/JP2009/005969 WO2010055635A1 (ja) | 2008-11-13 | 2009-11-10 | 窒化物半導体デバイス |
CN2009801451509A CN102217153A (zh) | 2008-11-13 | 2009-11-10 | 氮化物半导体器件 |
US13/105,337 US8816366B2 (en) | 2008-11-13 | 2011-05-11 | Nitride semiconductor device |
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JP2008291544A JP5167081B2 (ja) | 2008-11-13 | 2008-11-13 | 窒化物半導体デバイス |
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JP2010118559A true JP2010118559A (ja) | 2010-05-27 |
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KR20130118270A (ko) * | 2012-04-19 | 2013-10-29 | 서울반도체 주식회사 | 반도체 장치 및 이를 제조하는 방법 |
JP2014179584A (ja) * | 2013-02-14 | 2014-09-25 | Seoul Semiconductor Co Ltd | 半導体装置及びこれの製造方法 |
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KR20130081956A (ko) * | 2012-01-10 | 2013-07-18 | 삼성전자주식회사 | 질화물 반도체층 성장 방법 |
CN112420816A (zh) | 2013-09-23 | 2021-02-26 | 量子半导体有限公司 | 超晶格材料和应用 |
JP2015176936A (ja) * | 2014-03-13 | 2015-10-05 | 株式会社東芝 | 半導体装置 |
US9608103B2 (en) | 2014-10-02 | 2017-03-28 | Toshiba Corporation | High electron mobility transistor with periodically carbon doped gallium nitride |
KR20210064856A (ko) * | 2019-11-26 | 2021-06-03 | 삼성전자주식회사 | Led 소자 및 그 제조방법과, led 소자를 포함하는 디스플레이 장치 |
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US8816366B2 (en) | 2014-08-26 |
CN102217153A (zh) | 2011-10-12 |
US20110211607A1 (en) | 2011-09-01 |
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