JP2009543996A5 - - Google Patents
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- Publication number
- JP2009543996A5 JP2009543996A5 JP2009519570A JP2009519570A JP2009543996A5 JP 2009543996 A5 JP2009543996 A5 JP 2009543996A5 JP 2009519570 A JP2009519570 A JP 2009519570A JP 2009519570 A JP2009519570 A JP 2009519570A JP 2009543996 A5 JP2009543996 A5 JP 2009543996A5
- Authority
- JP
- Japan
- Prior art keywords
- heater
- furnace
- semiconductor processing
- chamber
- printed circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 12
- 238000010438 heat treatment Methods 0.000 claims 8
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 5
- 229910002804 graphite Inorganic materials 0.000 claims 5
- 239000010439 graphite Substances 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 4
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/485,547 US7429717B2 (en) | 2006-07-12 | 2006-07-12 | Multizone heater for furnace |
| US11/485,547 | 2006-07-12 | ||
| PCT/US2007/070964 WO2008008585A2 (en) | 2006-07-12 | 2007-06-12 | Multizone heater for furnace |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009543996A JP2009543996A (ja) | 2009-12-10 |
| JP2009543996A5 true JP2009543996A5 (https=) | 2011-08-18 |
| JP4912463B2 JP4912463B2 (ja) | 2012-04-11 |
Family
ID=38923985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009519570A Active JP4912463B2 (ja) | 2006-07-12 | 2007-06-12 | 炉のためのマルチゾーンヒータ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7429717B2 (https=) |
| EP (1) | EP2054690A2 (https=) |
| JP (1) | JP4912463B2 (https=) |
| KR (1) | KR101046043B1 (https=) |
| CN (1) | CN101490491B (https=) |
| TW (1) | TW200818324A (https=) |
| WO (1) | WO2008008585A2 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012047945A2 (en) | 2010-10-05 | 2012-04-12 | Silcotek Corp. | Wear resistant coating, article, and method |
| KR101828528B1 (ko) * | 2010-06-28 | 2018-02-12 | 한화테크윈 주식회사 | 그래핀의 제조 장치 및 제조 방법 |
| JP5685844B2 (ja) * | 2010-07-16 | 2015-03-18 | 株式会社村田製作所 | 熱処理炉 |
| US20140117005A1 (en) * | 2010-10-27 | 2014-05-01 | Tangteck Equipment Inc. | Diffusion furnace |
| CN103806094B (zh) * | 2012-11-08 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 外延生长设备 |
| EP3108042B1 (en) * | 2014-02-21 | 2022-08-10 | Momentive Performance Materials Quartz, Inc. | Multi-zone variable power density heater apparatus |
| WO2016006500A1 (ja) * | 2014-07-07 | 2016-01-14 | 株式会社Ihi | 熱処理装置 |
| US9915001B2 (en) | 2014-09-03 | 2018-03-13 | Silcotek Corp. | Chemical vapor deposition process and coated article |
| US10876206B2 (en) | 2015-09-01 | 2020-12-29 | Silcotek Corp. | Thermal chemical vapor deposition coating |
| US11161324B2 (en) | 2017-09-13 | 2021-11-02 | Silcotek Corp. | Corrosion-resistant coated article and thermal chemical vapor deposition coating process |
| CN109951906B (zh) * | 2017-12-20 | 2024-05-10 | 长鑫存储技术有限公司 | 半导体炉管机台加热器 |
| TWI743446B (zh) | 2018-02-20 | 2021-10-21 | 美商應用材料股份有限公司 | 用於原子層沉積(ald)溫度均勻性的熱解氮化硼(pbn)加熱器 |
| US11024523B2 (en) * | 2018-09-11 | 2021-06-01 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
| WO2020252306A1 (en) | 2019-06-14 | 2020-12-17 | Silcotek Corp. | Nano-wire growth |
| CN110592557B (zh) * | 2019-10-21 | 2020-06-26 | 山东国晶新材料有限公司 | 一种内cvd沉积立体式复合陶瓷加热器 |
| US12473635B2 (en) | 2020-06-03 | 2025-11-18 | Silcotek Corp. | Dielectric article |
| CN115572172B (zh) * | 2022-09-09 | 2023-06-30 | 攀钢集团攀枝花钢铁研究院有限公司 | 废旧石墨电极的利用方法及电炉 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5414927A (en) | 1993-03-30 | 1995-05-16 | Union Oil Co | Furnace elements made from graphite sheets |
| JPH08186081A (ja) * | 1994-12-29 | 1996-07-16 | F T L:Kk | 半導体装置の製造方法及び半導体装置の製造装置 |
| JPH0940481A (ja) * | 1995-07-25 | 1997-02-10 | Shin Etsu Chem Co Ltd | セラミックヒーター |
| US5947718A (en) | 1997-03-07 | 1999-09-07 | Semitool, Inc. | Semiconductor processing furnace |
| US6352593B1 (en) * | 1997-08-11 | 2002-03-05 | Torrex Equipment Corp. | Mini-batch process chamber |
| JP3515900B2 (ja) * | 1998-05-06 | 2004-04-05 | 京セラ株式会社 | セラミックヒータ |
| IL125690A0 (en) | 1998-08-06 | 1999-04-11 | Reiser Raphael Joshua | Furnace for processing semiconductor wafers |
| US6307184B1 (en) * | 1999-07-12 | 2001-10-23 | Fsi International, Inc. | Thermal processing chamber for heating and cooling wafer-like objects |
| US6496648B1 (en) * | 1999-08-19 | 2002-12-17 | Prodeo Technologies, Inc. | Apparatus and method for rapid thermal processing |
| JP2001223257A (ja) * | 2000-02-10 | 2001-08-17 | Ibiden Co Ltd | 半導体製造・検査装置用セラミック基板 |
| JP3833439B2 (ja) | 2000-05-02 | 2006-10-11 | 株式会社ノリタケカンパニーリミテド | 大型基板用多段加熱炉、及び両面加熱式遠赤外線パネルヒーター、並びに該加熱炉内の給排気方法 |
| JP2003031647A (ja) * | 2001-07-19 | 2003-01-31 | Hitachi Kokusai Electric Inc | 基板処理装置および半導体装置の製造方法 |
| JP2004055880A (ja) * | 2002-07-22 | 2004-02-19 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| WO2004049414A1 (ja) | 2002-11-25 | 2004-06-10 | Koyo Thermo Systems Co., Ltd. | 半導体処理装置用電気ヒータ |
| CN2714581Y (zh) * | 2004-01-13 | 2005-08-03 | 南开大学 | 高真空薄膜沉积室用的外热式高温电加热炉 |
| CN100373119C (zh) * | 2004-04-14 | 2008-03-05 | 浙江大学 | 流水线安全型热风送热系统 |
| US20060127067A1 (en) * | 2004-12-13 | 2006-06-15 | General Electric Company | Fast heating and cooling wafer handling assembly and method of manufacturing thereof |
| JP6052722B2 (ja) * | 2012-06-29 | 2016-12-27 | パナソニックＩｐマネジメント株式会社 | エアーマッサージ装置 |
-
2006
- 2006-07-12 US US11/485,547 patent/US7429717B2/en not_active Expired - Fee Related
-
2007
- 2007-06-12 EP EP07798419A patent/EP2054690A2/en not_active Withdrawn
- 2007-06-12 CN CN2007800262040A patent/CN101490491B/zh not_active Expired - Fee Related
- 2007-06-12 JP JP2009519570A patent/JP4912463B2/ja active Active
- 2007-06-12 KR KR1020097001965A patent/KR101046043B1/ko active Active
- 2007-06-12 WO PCT/US2007/070964 patent/WO2008008585A2/en not_active Ceased
- 2007-06-28 TW TW096123605A patent/TW200818324A/zh unknown
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