JP2009540556A - 基板を輸送し、貯蔵しかつ移送するための装置 - Google Patents
基板を輸送し、貯蔵しかつ移送するための装置 Download PDFInfo
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
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Abstract
Description
−プレート固定システムを受けることができる、外側に開いた側面凹部と、
−隣接するプレートと協働し、かつプレートが基板の平面に対し平行な相対的な横断方向移動を確実に防止するための、輪郭嵌合形状を有する対向する主表面と、
−基板の周囲部分の第1の表面を受けるための支持表面と、
−別の基板の周囲部分の第2の表面に当接するための保持表面と、
−2つの隣接するプレートの間の基板の周囲部分を掴むように設計される支持および保持表面とを備える。
−ガスケットを使用して優先的にシール方式で輸送ポッドに連結するためのアクセス孔、および設備と接触している貫通孔とを備えるインターフェース・チャンバと、
−輸送ポッドの扉がアクセス孔に対面する状態で、輸送ポッドを受けかつ保持するための受け手段と、
−基板を収容するバスケットを、輸送ポッドとインターフェース・チャンバとの間で移動させるためのバスケット制御手段と、
−基板を掴み、かつインターフェース・チャンバの内側のバスケットと設備との間で基板を移送するためのロボットと、
−ロボットが選択的にある基板を取り、それを選ばれたプレートに向かってまたはプレートから離れて移動させることができるように、選ばれたプレートを1つまたは複数の隣接するプレートから、それらの移動方向に沿って、選択的に引き離すように設計されるプレート制御手段とを備える、輸送ポッドが基板処理設備の一部片と連結され得るように、少なくとも1つの輸送ポッドと協働することを目的とするインターフェースを開示する。
Claims (15)
- バスケット(3)をポッド・ケーシング(1a)内に挿入でき、かつポッド・ケーシング(1a)から取り外すことができるように、前記バスケット(3)が開口部(1b)を通り移動させることができ、
前記バスケット(3)が、各自が基板(4)を支持する平行なプレート(3a〜3f)の一連の積み重ねから構成され、扉(1c)が閉じられるとき前記プレート(3a〜3f)は互いの上に積み重ねられ、前記扉(1c)が開かれるとき、前記プレートは、前記基板(4)の平面に対して直角な移動方向に沿って、互いから離れて移動可能であることを特徴とする、壁を備える前記ポッド・ケーシング(1a)を有し、かつ前記開口部(1b)、シール方式で前記開口部(1b)を閉鎖する前記扉(1c)、および前記基板(4)を中に貯蔵することができる前記ポッド・ケーシング(1a)内に挿入される前記バスケット(3)を備える、半導体基板などの基板(4)用の輸送ポッド(1)。 - 前記プレート(3a〜3f)が積み重ねられた位置にあるとき、前記隣接する基板(4)の間の距離(E)が約5mm未満である、請求項1に記載の輸送ポッド。
- 前記バスケット(3)が前記扉(1c)と一体である、請求項1および2のいずれか1項に記載の輸送ポッド。
- 前記プレート(3a〜3f)が積み重ねられた位置にあるとき、前記隣接するプレートの周囲領域が、前記基板(4)の縁部のうちの少なくとも1つの部分の上で直ぐそばにある、請求項1乃至3のいずれか1項に記載の輸送ポッド。
- 前記ポッド・ケーシングが前記扉(1c)によって閉じられるとき、前記プレート(3a〜3f)を前記ポッド・ケーシング(1a)内で互いに対し圧縮するための手段(1c、1h、1i)をさらに備える、請求項1乃至4のいずれか1項に記載の輸送ポッド。
- 各プレート(3a〜3f)が、
プレート固定システム(2f〜2i)を受けることができる、外側に開いた側面凹部(34a)と、
前記隣接するプレートと協働し、かつ前記プレートが前記基板(4)の平面に対し平行な相対的な横断方向移動を確実に防止するように互いに噛み合う形状を有する対向する主表面(35a、36a)と、
基板(4)の周囲部分の第1の表面を受けるための支持表面(236a)と、
別の基板の周囲部分の第2の表面を押すための保持表面(235a)と、
2つの隣接するプレートの間で基板(4)の周囲部分を固定するように設計される前記支持表面(236a)と前記保持表面(235a)とを備える、請求項1乃至5のいずれか1項に記載の輸送ポッド。 - 前記保持表面(235a)が丸くされた縁部(335a)を備える、請求項6に記載の輸送ポッド。
- 前記保持表面(235a)が弾性緩衝材(335)を備える、請求項6または7のいずれか1項に記載の輸送ポッド。
- 前記プレート(3a〜3f)が、それらの平面内で、それらが担持する前記基板(4)の位置合わせを修正するのを可能にするある角度範囲に沿って、それらが互いに対して相対的に回転できるように設計される、請求項1乃至8のいずれか1項に記載の輸送ポッド。
- ガスケット(2m)を使用して優先的にシール方式で前記輸送ポッド(1)に連結するためのアクセス孔(2b)と、前記設備(200)と協働する貫通孔(2c)とを備えるインターフェース・チャンバ(2a)と、
前記輸送ポッドの扉(1c)が前記アクセス孔(2b)に対面した状態で、前記輸送ポッド(1)を受けかつ保持するための受け手段(2k)と、
前記基板(4)を収容する前記バスケット(3)を、前記輸送ポッド(1)と前記インターフェース・チャンバ(2a)との間で移動させるためのバスケット制御手段と、
前記基板(4)を掴み、かつ前記インターフェース(2)の前記チャンバ(2a)の内側の前記バスケット(3)と前記設備(200)との間で前記基板(4)を移送するためのロボット(5)と、
前記ロボット(5)が選択的に基板(4a)を取り、それを選ばれたプレート(3c)に向かってまたはプレート(3c)から離れて移動させることができるように、前記選ばれたプレート(3c)を1つまたは複数の隣接するプレート(3b、3d)から、それらの移動方向に沿って、選択的に引き離すように設計されるプレート制御手段(2e、2f〜2i)とを備える、請求項1乃至13のいずれか1項に記載の少なくとも1つの輸送ポッド(1)と基板処理設備(200)の一部片との間のインターフェース(2)。 - 前記輸送ポッド(1)の前記扉(1c)を開閉するための扉制御手段(2e)をさらに備える、請求項10に記載のインターフェース。
- 前記プレート制御手段が、選ばれたプレート(3c)をその下の隣接するプレート(3b)から引き離すために、前記選ばれたプレート(3c)の下向きの移動を選択的に防止するように設計されるプレート固定手段(2f〜2i)、および/または前記選ばれたプレート(3c)をその上の隣接するプレート(3d)から引き離すために、前記選ばれたプレート(3c)の上の前記隣接するプレート(3d)の下向きの移動を選択的に防止するように設計されるプレート固定手段(2f〜2i)を備える、水平プレートを有する少なくとも1つの輸送ポッドと協働することを目的とする、請求項10または11のいずれか1項に記載のインターフェース。
- 前記プレート固定手段(2f〜2i)が、シリンダ(2j)の作動によって対応するプレート(3a)の凹部(34a)内にピンの端部が係合する固定ピンを備える、請求項12に記載のインターフェース。
- 前記プレート固定手段がモータ化された固定ピン(2f〜2i)を備える、請求項12に記載のインターフェース。
- 前記プレート固定手段(2f〜2i)が、固定を確実にするために前記プレート(3a〜3f)の磁気部分に作用する1つまたは複数の電磁石を備える、請求項12に記載のインターフェース。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0652080A FR2902235B1 (fr) | 2006-06-09 | 2006-06-09 | Dispositif de transport, de stockage et de transfert de substrats |
FR0652080 | 2006-06-09 | ||
PCT/FR2007/051363 WO2007141447A1 (fr) | 2006-06-09 | 2007-05-31 | Dispositif de transport, de stockage et de transfert de substrats |
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JP2009540556A true JP2009540556A (ja) | 2009-11-19 |
JP5244097B2 JP5244097B2 (ja) | 2013-07-24 |
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JP2009513735A Active JP5244097B2 (ja) | 2006-06-09 | 2007-05-31 | 基板用の輸送ポッド及びインターフェースを備えた装置 |
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US (1) | US20090196714A1 (ja) |
EP (1) | EP2033215B1 (ja) |
JP (1) | JP5244097B2 (ja) |
KR (1) | KR101373970B1 (ja) |
CN (1) | CN101496157B (ja) |
FR (1) | FR2902235B1 (ja) |
SG (1) | SG186501A1 (ja) |
WO (1) | WO2007141447A1 (ja) |
Cited By (8)
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KR101409687B1 (ko) | 2011-07-04 | 2014-06-19 | 실트로닉 아게 | 다수의 웨이퍼형 가공물을 완충 보관하기 위한 장치 및 방법 |
JPWO2016084882A1 (ja) * | 2014-11-27 | 2017-09-07 | アキレス株式会社 | リングスペーサー |
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Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140091768A (ko) * | 2005-11-07 | 2014-07-22 | 브룩스 오토메이션 인코퍼레이티드 | 반도체 작업대상물 공정처리 시스템 |
US8267634B2 (en) | 2005-11-07 | 2012-09-18 | Brooks Automation, Inc. | Reduced capacity carrier, transport, load port, buffer system |
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FR2915831B1 (fr) * | 2007-05-04 | 2009-09-25 | Alcatel Lucent Sas | Interface d'enceinte de transport |
FR2933812B1 (fr) * | 2008-07-11 | 2010-09-10 | Alcatel Lucent | Dispositif de chargement/dechargement de substrats |
US9296560B2 (en) * | 2011-06-28 | 2016-03-29 | Murata Machinery, Ltd. | Storage device and storage method |
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CN103715121B (zh) * | 2012-09-29 | 2016-07-06 | 无锡华润上华半导体有限公司 | 一种晶圆装载方法 |
TWI765789B (zh) * | 2013-01-22 | 2022-05-21 | 美商布魯克斯自動機械美國公司 | 基材運送 |
JP6451453B2 (ja) * | 2015-03-31 | 2019-01-16 | Tdk株式会社 | ガスパージ装置、ロードポート装置、パージ対象容器の設置台およびガスパージ方法 |
JP6744709B2 (ja) * | 2015-11-30 | 2020-08-19 | キヤノン株式会社 | 情報処理装置、情報処理方法 |
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US10153282B1 (en) * | 2017-08-11 | 2018-12-11 | Lam Research Corporation | Ultra-high vacuum transport and storage |
WO2019046477A1 (en) * | 2017-08-29 | 2019-03-07 | Daewon Semiconductor Packaging Industrial Company | SEPARATORS FOR HANDLING, TRANSPORTING OR STORING SEMICONDUCTOR WAFERS |
US11469124B2 (en) | 2019-03-05 | 2022-10-11 | Applied Materials, Inc. | Contactless latch and coupling for vacuum wafer transfer cassette |
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CN116368605A (zh) * | 2020-10-02 | 2023-06-30 | 恩特格里斯公司 | 晶片容器及其尺寸调适系统 |
CN115148651B (zh) * | 2022-08-01 | 2023-05-02 | 弥费科技(上海)股份有限公司 | 晶圆盒交换传输设备及其驱动装置、存储库 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08340043A (ja) * | 1995-06-13 | 1996-12-24 | Shinko Electric Co Ltd | ウエハ保管装置 |
JP2004241705A (ja) * | 2003-02-07 | 2004-08-26 | Daifuku Co Ltd | 被支持体積層支持装置 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4431404A (en) * | 1982-08-26 | 1984-02-14 | Whirlpool Corporation | Method and apparatus for heating plastic sheet material |
US4532970A (en) * | 1983-09-28 | 1985-08-06 | Hewlett-Packard Company | Particle-free dockable interface for integrated circuit processing |
US5255797A (en) * | 1992-02-26 | 1993-10-26 | Fluoroware, Inc. | Wafer carrier with wafer retaining cushions |
FR2697004B1 (fr) * | 1992-10-16 | 1994-11-18 | Commissariat Energie Atomique | Système de stockage et de transport d'objets plats tels que des boîtes extra-plates et son ratelier portatif. |
JP3543987B2 (ja) * | 1993-12-03 | 2004-07-21 | 東京エレクトロン株式会社 | 処理装置 |
US5562387A (en) * | 1993-10-04 | 1996-10-08 | Tokyo Electron Limited | Device for transferring plate-like objects |
JP2850279B2 (ja) * | 1994-02-22 | 1999-01-27 | ティーディーケイ株式会社 | クリーン搬送方法及び装置 |
US5586585A (en) * | 1995-02-27 | 1996-12-24 | Asyst Technologies, Inc. | Direct loadlock interface |
US6224312B1 (en) * | 1996-11-18 | 2001-05-01 | Applied Materials, Inc. | Optimal trajectory robot motion |
JPH1187459A (ja) * | 1997-07-09 | 1999-03-30 | Canon Inc | 基板搬送装置、半導体製造システムおよびデバイス製造方法 |
GB2349204B (en) * | 1999-04-19 | 2004-03-03 | Applied Materials Inc | A method of detecting the position of a wafer |
JP2001298068A (ja) * | 2000-04-18 | 2001-10-26 | Natl Inst Of Advanced Industrial Science & Technology Meti | 局所清浄化法及び局所清浄化加工処理装置 |
JP2002305239A (ja) * | 2001-04-06 | 2002-10-18 | Shin Etsu Polymer Co Ltd | 基板収納容器及びその製造方法 |
US20020159864A1 (en) * | 2001-04-30 | 2002-10-31 | Applied Materials, Inc. | Triple chamber load lock |
US6663333B2 (en) * | 2001-07-13 | 2003-12-16 | Axcelis Technologies, Inc. | Wafer transport apparatus |
WO2003042073A1 (en) * | 2001-11-14 | 2003-05-22 | Entegris, Inc. | Wafer support attachment for a semi-conductor wafer transport container |
KR100491161B1 (ko) * | 2002-11-26 | 2005-05-24 | 주식회사 테라세미콘 | 반도체 제조장치 |
KR101229132B1 (ko) * | 2003-07-11 | 2013-02-01 | 테크-셈 아크티엔게젤샤프트 | 전자부품들을 제조하는 동안 판형상의 기질들을 저장하고 전달하기 위한 장치 |
US20060105498A1 (en) * | 2004-08-13 | 2006-05-18 | Cheng-Chung Huang | Wafer stack separator |
TWI399823B (zh) * | 2005-07-09 | 2013-06-21 | Tec Sem Ag | 用以存放基板之裝置 |
US7748542B2 (en) * | 2005-08-31 | 2010-07-06 | Applied Materials, Inc. | Batch deposition tool and compressed boat |
-
2006
- 2006-06-09 FR FR0652080A patent/FR2902235B1/fr not_active Expired - Fee Related
-
2007
- 2007-05-31 KR KR1020097000343A patent/KR101373970B1/ko active IP Right Grant
- 2007-05-31 US US12/308,033 patent/US20090196714A1/en not_active Abandoned
- 2007-05-31 CN CN2007800214761A patent/CN101496157B/zh active Active
- 2007-05-31 SG SG2011042223A patent/SG186501A1/en unknown
- 2007-05-31 EP EP07766130.4A patent/EP2033215B1/fr active Active
- 2007-05-31 JP JP2009513735A patent/JP5244097B2/ja active Active
- 2007-05-31 WO PCT/FR2007/051363 patent/WO2007141447A1/fr active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08340043A (ja) * | 1995-06-13 | 1996-12-24 | Shinko Electric Co Ltd | ウエハ保管装置 |
JP2004241705A (ja) * | 2003-02-07 | 2004-08-26 | Daifuku Co Ltd | 被支持体積層支持装置 |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101409687B1 (ko) | 2011-07-04 | 2014-06-19 | 실트로닉 아게 | 다수의 웨이퍼형 가공물을 완충 보관하기 위한 장치 및 방법 |
JP2014067770A (ja) * | 2012-09-25 | 2014-04-17 | Dainippon Printing Co Ltd | 基板保持用枠体と基板保持用枠体の搬送方法 |
US10658212B2 (en) | 2014-11-27 | 2020-05-19 | Achilles Corporation | Ring spacer |
JPWO2016084882A1 (ja) * | 2014-11-27 | 2017-09-07 | アキレス株式会社 | リングスペーサー |
JP7061857B2 (ja) | 2017-09-21 | 2022-05-02 | アキレス株式会社 | リングスペーサー |
JP2019057612A (ja) * | 2017-09-21 | 2019-04-11 | アキレス株式会社 | リングスペーサー |
CN111164745B (zh) * | 2017-10-11 | 2023-09-12 | 日商乐华股份有限公司 | 盒开启器 |
CN111164745A (zh) * | 2017-10-11 | 2020-05-15 | 日商乐华股份有限公司 | 盒开启器 |
WO2019073823A1 (ja) * | 2017-10-11 | 2019-04-18 | ローツェ株式会社 | ポッドオープナー |
JPWO2019073823A1 (ja) * | 2017-10-11 | 2020-11-19 | ローツェ株式会社 | ポッドオープナー |
US11232964B2 (en) | 2017-10-11 | 2022-01-25 | Rorze Corporation | Pod opener |
JP7321095B2 (ja) | 2017-10-11 | 2023-08-04 | ローツェ株式会社 | ポッドオープナー |
JP7195080B2 (ja) | 2018-07-31 | 2022-12-23 | 日本電産サンキョー株式会社 | 搬送システム |
JP2020021795A (ja) * | 2018-07-31 | 2020-02-06 | 日本電産サンキョー株式会社 | 搬送システム |
JP7174560B2 (ja) | 2018-08-01 | 2022-11-17 | 平田機工株式会社 | 搬送装置 |
JP2020021853A (ja) * | 2018-08-01 | 2020-02-06 | 平田機工株式会社 | 搬送装置及び搬送システム |
JP2022043645A (ja) * | 2020-09-04 | 2022-03-16 | 村田機械株式会社 | 物品収容装置 |
JP7384132B2 (ja) | 2020-09-04 | 2023-11-21 | 村田機械株式会社 | 物品収容装置 |
Also Published As
Publication number | Publication date |
---|---|
FR2902235B1 (fr) | 2008-10-31 |
FR2902235A1 (fr) | 2007-12-14 |
KR101373970B1 (ko) | 2014-03-12 |
CN101496157B (zh) | 2011-05-25 |
SG186501A1 (en) | 2013-01-30 |
JP5244097B2 (ja) | 2013-07-24 |
CN101496157A (zh) | 2009-07-29 |
KR20090028623A (ko) | 2009-03-18 |
US20090196714A1 (en) | 2009-08-06 |
EP2033215A1 (fr) | 2009-03-11 |
WO2007141447A1 (fr) | 2007-12-13 |
EP2033215B1 (fr) | 2019-12-18 |
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