JP2009533696A - 偏光ベースの干渉型検出器 - Google Patents

偏光ベースの干渉型検出器 Download PDF

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Publication number
JP2009533696A
JP2009533696A JP2009506707A JP2009506707A JP2009533696A JP 2009533696 A JP2009533696 A JP 2009533696A JP 2009506707 A JP2009506707 A JP 2009506707A JP 2009506707 A JP2009506707 A JP 2009506707A JP 2009533696 A JP2009533696 A JP 2009533696A
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light
light beam
sample
sample material
wave
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JP2009533696A5 (https=
Inventor
ホール，ジョン
ペトロパブロフスキイ，ヴィアチェスラフ
ニルセン，オイヴィンド
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バイオプティックス，エルエルシー
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/251—Colorimeters; Construction thereof
    • G01N21/253—Colorimeters; Construction thereof for batch operation, i.e. multisample apparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G01N21/553—Attenuated total reflection and using surface plasmons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/212—Arrangement with total internal reflection

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
JP2009506707A 2006-04-17 2007-04-16 偏光ベースの干渉型検出器 Pending JP2009533696A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/379,026 US7233396B1 (en) 2006-04-17 2006-04-17 Polarization based interferometric detector
PCT/US2007/066723 WO2007121406A2 (en) 2006-04-17 2007-04-16 Polarization based interferometric detector

Publications (2)

Publication Number Publication Date
JP2009533696A true JP2009533696A (ja) 2009-09-17
JP2009533696A5 JP2009533696A5 (https=) 2010-06-03

Family

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JP2009506707A Pending JP2009533696A (ja) 2006-04-17 2007-04-16 偏光ベースの干渉型検出器

Country Status (6)

Country Link
US (4) US7233396B1 (https=)
EP (1) EP2010877B1 (https=)
JP (1) JP2009533696A (https=)
CN (1) CN101449135B (https=)
CA (1) CA2649421C (https=)
WO (1) WO2007121406A2 (https=)

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JP2016505828A (ja) * 2012-12-06 2016-02-25 リーハイ・ユニバーシティー 空間分割多重光コヒーレンストモグラフィー装置
WO2018043194A1 (ja) * 2016-08-29 2018-03-08 国立大学法人 鹿児島大学 屈折率測定装置及び屈折率測定方法

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