JP2009532521A5 - - Google Patents

Download PDF

Info

Publication number
JP2009532521A5
JP2009532521A5 JP2009502810A JP2009502810A JP2009532521A5 JP 2009532521 A5 JP2009532521 A5 JP 2009532521A5 JP 2009502810 A JP2009502810 A JP 2009502810A JP 2009502810 A JP2009502810 A JP 2009502810A JP 2009532521 A5 JP2009532521 A5 JP 2009532521A5
Authority
JP
Japan
Prior art keywords
bis
dianhydride
dispersant
polyimide
aminophenoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009502810A
Other languages
English (en)
Japanese (ja)
Other versions
JP5357749B2 (ja
JP2009532521A (ja
Filing date
Publication date
Priority claimed from US11/395,735 external-priority patent/US20070232734A1/en
Application filed filed Critical
Publication of JP2009532521A publication Critical patent/JP2009532521A/ja
Publication of JP2009532521A5 publication Critical patent/JP2009532521A5/ja
Application granted granted Critical
Publication of JP5357749B2 publication Critical patent/JP5357749B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2009502810A 2006-03-31 2007-03-01 高周波数回路用途において有用なポリイミド系組成物を調製する方法 Active JP5357749B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/395,735 US20070232734A1 (en) 2006-03-31 2006-03-31 Polyimide based compositions useful in high frequency circuitry applications and methods relating thereto
US11/395,735 2006-03-31
PCT/US2007/005461 WO2007117372A1 (en) 2006-03-31 2007-03-01 Process for preparing polyimide based compositions useful in high frequency circuitry applications

Publications (3)

Publication Number Publication Date
JP2009532521A JP2009532521A (ja) 2009-09-10
JP2009532521A5 true JP2009532521A5 (https=) 2010-04-22
JP5357749B2 JP5357749B2 (ja) 2013-12-04

Family

ID=38197818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009502810A Active JP5357749B2 (ja) 2006-03-31 2007-03-01 高周波数回路用途において有用なポリイミド系組成物を調製する方法

Country Status (4)

Country Link
US (2) US20070232734A1 (https=)
EP (1) EP2001942A1 (https=)
JP (1) JP5357749B2 (https=)
WO (1) WO2007117372A1 (https=)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201037035A (en) * 2009-04-01 2010-10-16 Microcosm Technology Co Ltd Polyimide film having sheltering property and application thereof and preparation method thereof
KR101064816B1 (ko) * 2009-04-03 2011-09-14 주식회사 두산 폴리아믹산 용액, 폴리이미드 수지 및 이를 이용한 연성 금속박 적층판
KR101101347B1 (ko) * 2010-04-06 2012-01-02 한국세라믹기술원 무소결 mim 커패시터 및 그 제조 방법
JP5636224B2 (ja) * 2010-08-06 2014-12-03 三井金属鉱業株式会社 フィラー含有樹脂層付金属箔及びフィラー含有樹脂層付金属箔の製造方法
US8853723B2 (en) 2010-08-18 2014-10-07 E. I. Du Pont De Nemours And Company Light emitting diode assembly and thermal control blanket and methods relating thereto
US8969909B2 (en) 2010-08-18 2015-03-03 E I Du Pont De Nemours And Company Light emitting diode assembly and thermal control blanket and methods relating thereto
JP5517162B2 (ja) 2010-09-22 2014-06-11 インターナショナル・ビジネス・マシーンズ・コーポレーション 文書情報の機密ラベルを判定する方法、コンピュータ・プログラム、装置、及びシステム
TW201302858A (zh) * 2011-06-24 2013-01-16 Du Pont 有色聚醯亞胺膜及與其有關之方法
US8673462B2 (en) 2011-09-02 2014-03-18 International Business Machines Corporation Low viscosity electrostatic discharge (ESD) dissipating adhesive substantially free of agglomerates
JP5905739B2 (ja) * 2012-02-27 2016-04-20 京セラ株式会社 コンデンサ
JP2013182908A (ja) * 2012-02-29 2013-09-12 Kyocera Corp コンデンサ
JP2013189568A (ja) * 2012-03-14 2013-09-26 Du Pont-Toray Co Ltd グラファイト粉体含有高熱伝導性ポリイミドフィルム
CN103454609B (zh) * 2013-09-11 2015-10-07 国家电网公司 一种容性设备在线监测装置调试平台
WO2015048065A1 (en) 2013-09-26 2015-04-02 Polyone Corporation Preparation of imide oligomers via concurrent reactive extrusion
CN105579492B (zh) * 2013-09-26 2017-10-27 普立万公司 适用于3d打印工艺的芳族聚酰亚胺
US9326373B2 (en) * 2014-04-09 2016-04-26 Finisar Corporation Aluminum nitride substrate
CN104023505A (zh) * 2014-06-13 2014-09-03 江苏悦达新材料科技有限公司 一种高导热石墨膜的制备方法
EP3367402B1 (en) * 2015-10-21 2021-07-07 Toray Industries, Inc. Capacitor, method for manufacturing same, and wireless communication device using same
CN107721189B (zh) * 2017-10-19 2019-09-27 嘉兴学院 高介电常数二氧化锆纳米晶体/聚酰亚胺复合薄膜及其制备方法
CN108912680A (zh) * 2018-06-27 2018-11-30 桂林电器科学研究院有限公司 含有钛白粉的黑色亚光聚酰亚胺薄膜及其制备方法
KR102153506B1 (ko) * 2018-07-18 2020-09-09 피아이첨단소재 주식회사 점토 입자 및 카본 블랙을 포함하는 폴리이미드 필름 및 이의 제조방법
DE102018009686A1 (de) * 2018-11-30 2020-06-04 KlEFEL GmbH Hochfrequenz-Planartransformator mit einem ultrapermittiven Dielektrikum
WO2022126647A1 (zh) * 2020-12-18 2022-06-23 清华大学 一种高温储能杂化聚醚酰亚胺介电薄膜及其制备方法与应用
CN113603887B (zh) * 2021-09-02 2023-01-17 大同共聚(西安)科技有限公司 一种钛酸钡与聚酰亚胺杂化材料的制备方法
CN113831735B (zh) * 2021-11-17 2022-09-16 桂林电器科学研究院有限公司 一种低黑度聚酰亚胺遮光膜及其制备方法
CN114213790A (zh) * 2021-12-31 2022-03-22 南京清研新材料研究院有限公司 一种光配向聚酰亚胺组合物及其制备工艺
CN114989469A (zh) * 2022-05-19 2022-09-02 乌镇实验室 一种具有高温储能性能的三层pei柔性复合薄膜及其制备方法
CN118421084B (zh) * 2024-05-08 2025-03-14 武汉大学 超分子介电聚合物材料、其制备方法及应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4131740A (en) * 1977-04-20 1978-12-26 E. I. Du Pont De Nemours And Company Alkyl perfluoro-ω-fluoroformyl esters and their preparation
US4238528A (en) * 1978-06-26 1980-12-09 International Business Machines Corporation Polyimide coating process and material
EP0048119A3 (en) * 1980-09-12 1982-08-11 I M L Corporation Methods of preparing polyimides and artifacts composed thereof
US5306739A (en) * 1987-12-16 1994-04-26 Mlt/Micro-Lite Technology Corporation Highly filled polymeric compositions
US5078936A (en) * 1989-08-16 1992-01-07 E. I. Dupont De Nemours And Company Method for producing a conductive polyimide structure
US5166308A (en) * 1990-04-30 1992-11-24 E. I. Du Pont De Nemours And Company Copolyimide film with improved properties
DE69115171T2 (de) * 1990-08-27 1996-05-15 Du Pont Flexible Polyimid-Mehrschichtlaminate und ihre Herstellung.
US5264534A (en) * 1991-10-31 1993-11-23 Foster-Miller, Inc. Oriented semicrystalline polymer films
JPH05315366A (ja) * 1992-05-11 1993-11-26 Fujitsu Ltd 半導体装置
JPH08176319A (ja) * 1994-12-26 1996-07-09 Gunze Ltd 円筒状ポリイミドフィルム及びその製造方法
US6797392B2 (en) * 1995-08-01 2004-09-28 Ube Industries, Ltd. Polyimide/metal composite sheet
JP3534151B2 (ja) * 1996-10-29 2004-06-07 宇部興産株式会社 ポリイミド前駆体組成物及びポリイミド膜
EP0902048B1 (en) * 1997-09-11 2005-11-23 E.I. Du Pont De Nemours And Company High dielectric constant flexible polyimide film and process of preparation
US6068782A (en) * 1998-02-11 2000-05-30 Ormet Corporation Individual embedded capacitors for laminated printed circuit boards
JP3530065B2 (ja) * 1999-03-31 2004-05-24 グンゼ株式会社 半導電性ポリアミド酸組成液及びそれを用いた半導電性無端管状ポリイミドフイルム
US6429258B1 (en) * 1999-05-20 2002-08-06 E. I. Du Pont De Nemours & Company Polymerization of fluoromonomers
DE19939483A1 (de) * 1999-08-20 2001-03-08 Philips Corp Intellectual Pty Passives Bauelement mit Verbundwerkstoff
US6489420B1 (en) * 2000-06-27 2002-12-03 Dyneon Llc Fluoropolymers with improved characteristics
US20060124693A1 (en) * 2004-12-15 2006-06-15 Meloni Paul A Thermally conductive polyimide film composites having high mechanical elongation useful as a heat conducting portion of an electronic device

Similar Documents

Publication Publication Date Title
JP2009532521A5 (https=)
JP5357749B2 (ja) 高周波数回路用途において有用なポリイミド系組成物を調製する方法
JP2009532227A (ja) 容量性ポリイミド・ラミネート
TW202233433A (zh) 聚醯亞胺膜、銅張積層板及電路基板
JP2007046054A (ja) 光学的応用分野において有用な低着色ポリイミド樹脂組成物ならびにそれに関連する方法および組成物
WO2012093586A1 (ja) ポリアミド酸樹脂組成物およびその製造方法
JPWO2012011607A1 (ja) ポリイミド膜積層体の製造方法、ポリイミド膜積層体
JP2017069200A (ja) 機能層付ポリイミドフィルムの製造方法
KR102373556B1 (ko) 폴리이미드 전구체 및 그로부터 생성된 폴리이미드
CN112571901B (zh) 聚酰亚胺膜、覆金属层叠板及电路基板
TWI381035B (zh) Adhesive improved by the novel polyimide film
JP2021106248A (ja) 金属張積層板及び回路基板
JP7589156B2 (ja) フレキシブル電子デバイス用金属張積層板及びこれを用いたフレキシブル電子デバイス
JP4768606B2 (ja) 配線基板用積層体
JPWO2021049556A5 (https=)
JP2002053818A (ja) 接着剤組成物
JP7745446B2 (ja) ポリイミドフィルム、金属張積層板、その製造方法及び回路基板
TW202237705A (zh) 聚醯亞胺、金屬包覆層疊板及電路基板
JP7602866B2 (ja) 回路基板及びその製造方法
CN115551949A (zh) 聚酰亚胺前体组合物和聚酰亚胺膜/基材层积体
TWI902848B (zh) 疊層體及疊層體之製造方法
WO2007086550A1 (ja) 配線基板用積層体
JP2008159896A (ja) 配線基板用積層体
TWI553039B (zh) 阻障用板及其製備方法、封裝顯示裝置及其製備方法
JP2023054680A (ja) ポリイミド前駆体樹脂組成物及び、これを用いたフレキシブル表示装置及びその製造方法